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Depletion mode
Vgs==Vt
Inversion mode
Vgs>>Vt
nMOS fabrication
nMOS fabrication
nMOS fabrication
nMOS fabrication
nMOS fabrication
Basic Planar processes
Silicon wafer preparation
Epitaxial growth
Oxidation
Photolithography
Diffusion
Ion implantation
Isolation technique
Metalization
Assembly processing and packaging
Epitaxial Growth
Deposition of a
layer on a substrate Ordered,
which matches the crystalline
growth;
crystalline order of NOT
the substrate epitaxial
Homoepitaxy
Growth of a layer of
the same material
as the substrate
Epitaxial
Si on Si growth:
Heteroepitaxy
Growth of a layer of
a different material
than the substrate
GaAs on Si
CMOS technology
CMOS technology
Complementary metal–oxide–
semiconductor
• N-well process
• Twin-tub process
• Silicon-on-Insulator
CMOS p-Well Process
CMOS p-Well Process
CMOS p-Well Inverter
N-Well Process
Twin Tub process
Starts with a substrate of high
resistivity n-type material
Create both n-well and p-well regions
Separate optimization of n and p
transistors
TWIN TUB inverter
Silicon on Insulator
BiCMOS Technology
npn transistor
npn transistor
BiCMOS Technology
npn transistor is formed in an n-well
Additional p+ base region is located
in the well to form p-base region
Buried n+ sub collector(BCCD) to
reduce resistance of n-well collector
Standard n-well process is extended
to include further masks to add the
two layers
Ids – Vds characteristics
nMOS transistor
(1)
(2)
(3)
(4)
(5)
(6)
Voltage along the channel varies
linearly with distance x from the source
Due to the IR drop in the channel
Average value of this voltage in the
channel is Vds/2
Effective gate voltage is
Vg = Vgs - Vt
Non-Saturated Region Vds < Vgs - Vt
(8)
where
(9)
38
Non-Saturated Region Vds < Vgs - Vt
(10)
(11)
(11 a)
39
Non-Saturated Region Vds < Vgs - Vt
(11 b)
therefore
(11 c)
40
Non-Saturated Region Vds < Vgs - Vt
(11 d)
Saturated Region Vds = Vgs - Vt
(12 a)
(12 b)
(12 c)
(12 d)
42
43
44
Threshold variations
Threshold Variations
Drain Induced Barrier Lowering
Punch Through
Hot carrier effects
Source-Drain resistance
Rc ->Contact resistance