Tribological Investigation Of Tantalum

Thin Films

Guided by:
Prepared by: Dr. Sushant K. Rawal( Associate
Dharmesh Chauhan Professor)
Kamlesh V. Chauhan (Assistant
(ID No: 15PGAMT001) Professor)
Outline of this presentation :
Introduction
Physical Properties

Applications

Overview of Coating

Literature Review

Motivation of Research Work

Objective of Research Work

Future Scope
Introduction :
Tribology is the study of science and engineering
of interacting surfaces in relative motion.

It includes the study and application of the

principles of friction, lubrication and wear.

Tribology is the branch of mechanical

engineering and materials science.
Tantalum :

Name : Tantalum
Symbol : Ta
Appearance : Gray Blue
Atomic Number ( Z ) : 73
Group : 5
Block : d
 Tantalum is a chemical element with symbol Ta
and atomic number 73.

Tantalum is hard, blue gray, and transition metal

that is highly corrosion resistance.

Tantalum is used to manufacture surgical

implants, capacitors, aircraft engines and alloy.
Physical properties :
Tantalum is dark (blue-gray), dense, ductile,
very hard, easily fabricated, and highly
conductive of heat and electricity.

Tantalum exists in two crystalline phases: alpha

and beta.

The alpha phase is relatively ductile and soft and

it has body centered cubic (BCC) structure.
 The beta phase is hard and brittle. The beta phase
usually exists as thin films obtained by
magnetron sputtering, chemical vapour
deposition, and electrochemical deposition.
Properties of Tantalum : -
Applications :
Tantalum capacitors used in electronic
equipments such as mobile phones, DVD
players, video game systems and computers.
Tantalum is used to manufacture surgical
implants, capacitors, aircraft engines, and alloys.
It is used to produce high-temperature devices
because of its high melting point.
 The element also has application in the chemical
industry because of its good corrosion resistance.
It is used to manufacture refractive index glass,
electron tubes, and alloys for missiles,
nuclear reactors, chemical equipment, and jet
engines.
Tantalum is used to manufacture tubes because it
forms oxides and nitrides that create vacuum. In
addition, it is used to manufacture special optical
glasses, non-ferrous alloys for aerospace and
nuclear applications.
Overview of coating :
A coating is a shelter that is applied to the surface
of an object, usually referred to as the substrate.
The purpose of exploiting the coating may be
functional, decorative, or both.
The coating itself may be an only cover parts of
the substrate or it may be an all-over coating,
completely covering the substrate. Functional
coatings may be applied to change the surface
properties of the substrate, such as
wettability, wear resistance, corrosion resistance
or adhesion.
 A major attention may be required for most of the
coating processes is that the coating is to be
applied at a number of different processes are in
use to achieve this control, a controlled thickness,
ranging from a simple brush for painting a wall
and to some very expensive machinery applying
coatings in the electronics industry.
 Coating Processes :

Vapour deposition
Chemical vapour deposition

Physical vapour deposition

Chemical and electrochemical techniques

Spraying

Roll-to-roll coating processes

Types of tantalum coating :
PVD Tantalum Coating

Thermal Spray Tantalum Coating

Molten Salt Tantalum

Cold Spray Tantalum Coating

Tantaline Surface Alloy

Types of sputtering deposition :
Magnetron sputtering source
Ion-beam sputtering

Reactive sputtering

Ion-assisted deposition

High-target-utilization sputtering

High-power impulse magnetron sputtering

(HIPIMS)
Gas flow sputtering
Magnetron sputtering deposition :
 Ar gas which is activated in plasma forms Ar
ions.
The Ar ions sputter out metal atoms from the
target.
Unbalanced magnetic field introduces the Ar ions
around the substrate.
Apply negative voltage on the substrate to attract
Ar ions that induce active energy to the metal
atoms depositing on the substrate.
Solid metal films are formed on the substrate.
 LITERATURE REVIEW
Sr. No Researchers Deposition Parameters Optical Mechanical Tribological
Techniques Studied Properties Properties Properties

1 Lucia High Power Working NIL Hardness- Friction co-

Mendizabal Pulsed Pre 0.6 Pa, 16.7 Gpa, efficient-
et al. Magnetron Temp. 350 Thickness- 0.25
[ 2015 ] Sputtering ,Power 4 2.311 m
kW,
Ar/N2=
0.25

2 Kun-Yuan Liu RF reactive Working NIL Hardness- Friction co-

et al. magnetron Pre 0.6 Pa, 16.7 Gpa, efficient-
[ 2014 ] sputtering Temp. 350 Youngs 0.14
,Power 100 modulus-
W, Ar/N2- 232 GPa
18/2
 LITERATURE REVIEW
Sr. No Researchers Deposition Parameters Optical Mechanical Tribological
Techniques Studied Properties Properties Properties

3 Cristina DC reactive Pre 750 Scratch on Hardness Friction co-

Balagna et magnetron MPa, ~Disc 970 (27 GPa- efficient-
al. sputtering Temp. 970- at 13 N multilayer 0.11,
[ 2014 ] 990 and 25 N 23 GPa- Wear=
~Disc 990 Monolayer) (2 10) 10^
at 5 N and Thickness< -7 mm3/Nm
11 N 10 m

4 D. Cristea et DC reactive Working Optical Thickness- Friction co-

al. magnetron Pre 0.6 Pa, density of 1.13 m efficient
[ 2013 ] sputtering Temp. 100, coating to 1.42 <0.11 ,
N2/O2= decrease m Good wear
17/3, Tar- with resistance @
Sub dis. 70 increasing 4 10^-4
mm pressure mbar
 LITERATURE REVIEW
Sr. No Researchers Deposition Parameters Optical Mechanical Tribological
Techniques Studied Properties Properties Properties

5 D. Bernoulli DC reactive Ta target NIL As per flow NIL

et al. [2013] magnetron Dia 76.20, ratio
sputtering angle set at increasing
35, Base Hardness
pressure @ Grain
1.33*10-8, size 17.5
Power 200 20.7 @ 27
13.

6 Dorrania et DC reactive Temp 350, NIL Film Thick. NIL

al. magnetron Base 150c @
[2011] sputtering pressure 1320.7,
10-2 , 250c @
Working 1146.5,
pressure 350c @
11, Dia 50 1235.5
 LITERATURE REVIEW
Sr. No Researchers Deposition Parameters Optical Mechanical Tribological
Techniques Studied Properties Properties Properties

7 M. Grosser DC reactive Pre 0.3 to NIL Thickness= NIL

[ 2008 ] magnetron 6 Pa, 10 m
sputtering Temp. 150,
Power 100
W, Tar-Sub
dis. 65 mm

8 O. Banakh et DC reactive Working Scratch on Hardness Friction co-

al. magnetron Pre 0.7 Pa, Ta-O-N film. 20 to 27 efficient -
[ 2005 ] sputtering Power 400 Conformal GPa 0.6
W, O2/N2= cracking@
0.08 and 3.6 N load
1.33 , Tar- Cohesive
Sub dis. 80 spallation@
mm 4.1 N load
Motivation of research work :
Tantalum based coatings are extensively
investigated because of their remarkable
properties like hardness, chemical stability,
durability and electronic properties leading to a
wide variation of multiple applications such as
cutting tools, turbine blades, and other highly
abrasive environments, and also those related
with optical applications such as solar collector
devices and many others.
 However, most of the research papers are based
on either Tantalum oxynitride or tantalum oxide
thin films. And more importantly, there are very
less research papers which are based on
wettability properties of tantalum based coatings.

Lets see various objectives of Research Work.

Objectives of research work :
To synthesize tantalum based coatings on various
substrate by using DC reactive magnetron
sputtering using argon as inert gas.

To deposit tantalum based coatings at different

sputtering parameters.

To study wettability properties of tantalum based

coatings.
Future scope :
The effect of various sputtering parameters such
as temperature, deposition time and sputtering
pressure Tantalum based coatings can be studied.

Optical properties of Tantalum based coatings can

be investigated by varying sputtering parameters.
THANK YOU