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Outline
VLSI Design Process
Design domains
Layout layers and design rules
CMOS scaling
Contd
Models are made to achieve maximum reliability in the
design process for minimum cost and design time.
We need to ensure that requirements are clearly
specified and understood, that subsystems are used
correctly and that designs meet the requirements.
A major contributor to excessive cost and delays is
having to revise a design after manufacture to correct
errors.
In VLSI design process, there are three distinct design
domains:
Behavioral domain: specifies the software
implementation of the systems functionality.
Structural domain: specifies how modules of
the system are connected together to affect
the prescribed behavior.
Physical domain: specifies the layout
used to
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Functional
Structural
high level of
abstraction
low level of
abstraction
Geometric
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Gajskis Y-chart
Behavior
Structural
Processors, memories
Sequential programs
Registers, MUXs
Register transfers
Gates, flip-flops
Transistors
Logic equations/FSM
Transfer functions
Behavioral
Structural
Implements behavior by
connecting components with
known behavior
Cell Layout
Modules
Chips
Boards
Physical
Gives size/locations of
components and wires on
chip/board
Physical
Contd
Layout layers of an
inverter cell with external
connections
Inverter Cell
Vdd
Metal2
Contact
Metal1
Via
polysilicon
p/n diffusion
GND
External
Connections
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Contd
Contd
Categories of design rules
Size rules, such as minimum width: The dimensions of
any component (shape), e.g., length of a boundary
edge or area of the shape, cannot be smaller than given
minimum values. These values vary across different
metal layers.
Separation rules, such as minimum separation: Two
shapes, either on the same layer or on adjacent layers,
must be a minimum (rectilinear or Euclidean diagonal)
distance apart.
Overlap rules, such as minimum overlap: Two
connected shapes on adjacent layers must have a
certain amount of overlap due to inaccuracy
of mask
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Contd
a
c
Minimum Width: a
Minimum Separation: b, c, d
e
Minimum Overlap: e
d
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Contd
Types of constraints
Technology constraints enable fabrication for a specific
technology node and are derived from technology
restrictions. Examples include minimum layout widths
and spacing values between layout shapes.
Electrical constraints ensure the desired electrical
behavior of the design. Examples include meeting
maximum timing constraints for signal delay and
staying below maximum coupling capacitances.
Geometry (design methodology) constraints are
introduced to reduce the overall complexity of the
design process. Examples include the use of preferred
wiring directions during routing, and the placement of
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standard cells in rows.
CMOS Scaling
The only constant in VLSI is constant
change
Feature size shrinks by 30% every 2-3
years
Transistors become cheaper
Transistors become faster
Wires do not improve
(and may
get worse)
S 2
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Scale factor S
Typically
Technology nodes
Feature Size ( m)
10
6
3
1.5
0.8
0.6
0.35
0.1
1965
1970
1975
1980
1985
Year
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1990
1995
0.25
0.18
0.13
0.09
2000
2005
Device Scaling
Parameter
L: Length
Sensitivity
Dennard Scaling
1/S
W: Width
1/S
1/S
1/S
1/S
Ion: ON current
R: effective resistance
C: gate capacitance
: gate delay
f: clock frequency
E: switching energy / gate
P: switching power / gate
A: area per gate
Switching power density
Switching current density
W/(Ltox)
(VDD-Vt)2
VDD/Ion
WL/tox
RC
1/
CVDD2
Ef
WL
P/A
Ion/A
S
1/S
1
1/S
1/S
S
1/S3
1/S2
1/S2
1
S
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Interconnect Scaling
Parameter
Sensitivity
Scale Factor
w: width
1/S
s: spacing
1/S
t: thickness
1/S
h: height
1/S
Dc
1/wt
S2
t/s
w/h
Cwf + Cwp
RwCw
S2
sqrt(RCRwCw)
sqrt(S)
Crosstalk noise
w/h
CwVDD2
1/S2
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Contd
Scaling Implications
Improved Performance
Improved Cost
Interconnect Woes
Power Woes
Physical Limits
The basic idea of scaling is to reduce the
dimensions of the MOS transistors and wires
(interconnects) connecting them in the
integrated circuit.
The three most common scaling models are:
Constant field scaling: all the parameters in the
MOSFET are scaled by the factor except supply
voltage VDD and gate oxide thickness tox.
Contd
International Technology Roadmap for
Semiconductors (Semiconductor Industry
Association) forecast
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Functional Design
and Logic Design
Circuit Design
Physical Design
Chip Planning
Placement
Physical Verification
DRC
LVS
Signal Routing
Fabrication
Timing Closure
Packaging and Testing
Chip
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