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Pseudo-nMOS
Saturated-load nMOS
No current flows
from power supply!
Where is power
consumed?
GND
Components of Power
Dynamic
Signal
transitions
Logic
activity
Glitches
Short-circuit
Static
Leakage
(small)
Ptotal =
=
Pdyn + Pstat
Ptran + Psc + Pstat
4
vi (t)
Large
resistance
v(t)
C = CL
Ground
C =
Charging of a Capacitor
R
t=0
i(t)
v(t)
C
C v(t)
Current, i(t)
C dv(t)/dt
dq(t)/dt
Lectures 3, 4: CMOS Circuits
i(t)
C dv(t)/dt =
[V v(t)] /R
dv(t)
=
dt
dv(t)
=
V v(t)
V v(t)
RC
dt
RC
t
ln [V v(t)]
=
+ A
RC
Initial condition, t = 0, v(t) = 0 A = ln V
v(t) =
V [1
exp()]
t
RC
v(t) =
i(t)
t
V [1 exp( )]
RC
dv(t)
C
dt
V
t
exp( )
R
RC
Etrans =
dt
=
V i(t) dt =
V
t
exp( )
CV
RC
V
2t
R exp( )
R2 0
RC
1
2
CV
2
10
t V
t
v(t) i(t) dt = V [1-exp( )] exp( ) dt
0
0
RC R
RC
1
2
= CV
2
11
Transition Power
Gate
Energy
Energy
Energy
Ptrans =
fck
Copyright Agrawal, 2011
Etrans fck =
fck CV /2
=
activity factor
=
clock frequency
Lectures 3, 4: CMOS Circuits
12
Components of Power
Dynamic
Signal
transitions
activity
Glitches
Static
Leakage
2
Delay
=1
Logic
Short-circuit
GLITCH
Delay=2
Ptotal =
=
Pdyn + Pstat
Ptran + Psc + Pstat
13
isc(t)
vo(t)
CL
Ground
14
Vi (t)
Volt
ptransistor
starts
conducting
Vo(t)
VTn
Iscmaxf
isc(t)
Isc
0
n-transistor
cuts-of
tB
tE
Lectures 3, 4: CMOS Circuits
Time (ns)
15
when CL = 0
Reference: M. A. Ortega and J. Figueras,
Short Circuit Power Modeling in Submicron
CMOS, PATMOS 96, Aug. 1996, pp. 147166.
Copyright Agrawal, 2011
16
Escr
Escf
17
Short-Circuit Power
Increases
18
19
Psc
fck Esc
20
VDD
VDD
ic(t)+isc(t)
vo(t)
vo(t)
tf
CL
R = large
tr
Ground
vo(t)
R
21
Isc(t) =
t
VDD[1 exp ()]
vo(t)
R(t) C
=
R(t)
R(t)
22
Small C
vo(t)
Large C
vo(t)
iscmax
R(t)
tf
t
Lectures 3, 4: CMOS Circuits
23
24
25
Components of Power
Dynamic
Signal
transitions
Logic
activity
Glitches
Short-circuit
Static
Leakage
26
Leakage Power
Ground
Gate
IG
VDD
R
Source
Drain
n+
Bulk Si (p)
Isub
IPT
IGIDL
n+
ID
nMOS Transistor
27
conduction, Isub
Gate
28
29
30
L =
31
32
33
Scaled device
Ic
Isub
0 VTH VTH
Gate voltage
34
35
V
i(t)
vi (t)
Large
resistance
v(t)
v(t)
C
isc(t)
i(t)
isc(t)
Ground
Leakage
current
time
36
Technology Scaling
Scaling
37
38
Bulk nMOSFET
Polysilicon
Gate
W
Source
Drain
n+
n+
L
p-type body (bulk)
SiO2
Thickness = tox
Copyright Agrawal, 2011
39
Technology Scaling
A scaling
1/S.
Successive generations of technology have used a
scaling S = 2, doubling the number of transistors
per unit area. This produced 0.25, 0.18, 0.13,
90nm and 65nm technologies, continuing on to
45nm, 32nm and 22nm.
A 5% gate shrink (S = 1.05) is commonly applied to
boost speed as the process matures.
40
Scaling
Length, L
1/S
Width, W
1/S
1/S
1/S
1/S
Substrate doping, NA
Copyright Agrawal, 2011
S
41
Scaling
W / (L tox)
(VDD Vt ) 2
1/S
Resistance, R
VDD / Ids
Gate capacitance, C
W L / tox
1/S
Gate delay,
RC
1/S
Clock frequency, f
1/
CV 2 f
1/S 2
Current, Ids
1/S 2
Power density
P/A
Current density
Ids /A
42
43
44
45
Voltage
V/2
Clock Frequency
F/2
F/2
Task Duration
2T
2T
Power
2P
1.5P
0.225P
Energy
2PT
3PT
0.45PT
46