Documenti di Didattica
Documenti di Professioni
Documenti di Cultura
\
|
= '
) 1 (
/
2
=
=
kT qV
B
iB
B
B
E
B E C
BE
e
N
n
W
D
q A
dx
dn
qD A I
) 1 (
/
=
kT qV
S C
BE
e I I
}
=
B
BE
W
B iB
i
B
kT qV
B
i
E C
dx
D
p
n
n
G
e
G
qn
A I
0
2
2
/
2
) 1 (
It can be shown
G
B
(s cm
4
) is the base Gummel number
8.2 Collector Current
n
i
2
N
B
-------e
qV
BE
kT
1
()
n '
n ' 0 ()
-------------
) 0 ( / ) ( n x n ' '
0
1
1
) 1 ( ) (
/
2
= '
kT qV
B
iB
BE
e
N
n
x n
x/
x / W
B
) / 1 )( 1 (
) / 1 )( 0 ( ) (
/
2
B
kT qV
B
iB
B
W x e
N
n
W x n x n
BE
=
' = '
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-6
At low-level injection,
inverse slope is 60 mV/decade
High-level injection effect :
8.2.1 High Level I njection Effect
0 0.2 0.4 0.6 0.8 1.0
10
-12
10
-10
10
-8
10
-6
10
-4
10
-2
V
BE
I
C
(
A
)
I
kF
60 mV/decade
At large V
BE,
B
N p n >>
'
=
'
p n p n = = ' = '
kT qV
i
BE
e n p n
2 /
~ ~
kT qV
i B
BE
e n p G
2 /
= kT qV
i
BE
e n I
2 /
C
When p > N
B
, inverse slope is 120mV/decade.
kT qV
i
kT E E q
i
BE
Fp Fn
e n e n np
/
2 / ) ( 2
= =
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-7
8.3 Base Current
Some holes are injected from the P-type base into the N
+
emitter.
The holes are provided by the base current, I
B
.
p
E
' n
B
'
W
E
W
B
(b)
emitter base collector contact
I
E
I
C
electron flow
+
hole flow
I
B
( a )
contact
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-8
}
=
E
BE
W
E iE
i
E
kT qV
E
i
E B
dx
D
n
n
n
G
e
G
qn
A I
0
2
2
/
2
) 1 (
Is a large I
B
desirable? Why?
8.3 Base Current
emitter base collector
contact
I
E
I
C
electron flow
+
hole flow
I
B
( a ) contact
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
) 1 (
/
2
=
kT qV
E E
iE E
E B
BE
e
N W
n D
q A I
For a uniform emitter,
Slide 8-9
8.4 Current Gain
B
C
F
I
I
|
How can |
F
be maximized?
Common-emitter current gain, |
F
:
Common-base current gain:
F
F
B C
B C
C B
C
E
C
F
E F C
I I
I I
I I
I
I
I
I I
|
|
o
o
+
=
+
=
+
=
=
1 / 1
/
It can be shown that
F
F
F
o
o
|
=
1
2
2
iE B B E
iB E E B
B
E
F
n N W D
n N W D
G
G
= = |
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-10
EXAMPLE: Current Gain
A BJT has I
C
= 1 mA and I
B
= 10 A. What are I
E
, |
F
and o
F
?
Solution:
9901 . 0 mA 01 . 1 / mA 1 /
100 A 10 / mA 1 /
mA 01 . 1 A 10 mA 1
= = =
= = =
= + = + =
E C F
B C F
B C E
I I
I I
I I I
o
|
We can confirm
F
F
F
|
|
o
+
=
1
F
F
F
o
o
|
=
1
and
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-11
8.4.1 Emitter Bandgap Narrowing
Emitter bandgap narrowing makes it difficult to raise |
F
by
doping the emitter very heavily.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
2
2
iE
iB
B
E
n
n
N
N
|
To raise |
F
, N
E
is typically very large.
Unfortunately, large N
E
makes
2 2
i iE
n n >
(heavy doping effect).
kT E
V C i
g
e N N n
/
2
=
Since n
i
is related to E
g
, this effect is
also known as band-gap
narrowing.
kT E
i iE
gE
e n n
/
2 2
A
=
AE
gE
is negligible for N
E
< 10
18
cm
-3
,
is 50 meV at 10
19
cm
-3
, 95 meV at 10
20
cm
-3
,
and 140 meV at 10
21
cm
-3
.
Slide 8-12
2
2
iE
iB
B
E
n
n
N
N
|
To further elevate |
F
, we can raise n
iB
by
using an epitaxial Si
1-q
Ge
q
base.
With q = 0.2, E
gB
is reduced by 0.1eV and n
iE
2
by 30x.
8.4.2 Narrow-Bandgap Base and Heterojuncion BJT
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-13
Assume D
B
= 3D
E
, W
E
= 3W
B
, N
B
= 10
18
cm
-3
, and n
iB
2
= n
i
2
. What is
|
F
for (a) N
E
= 10
19
cm
-3
, (b) N
E
= 10
20
cm
-3,
and (c) N
E
= 10
20
cm
-3
and a SiGe base with AE
gB
= 60 meV ?
(a) At N
E
= 10
19
cm
-3
, AE
gE
~ 50 meV,
(b) At N
E
= 10
20
cm
-3
, AE
gE
~ 95 meV
(c)
2 92 . 1 2 meV 26 / meV 50 2
/
2 2
8 . 6
i i i
kT E
i iE
n e n e n e n n
gE
= = = =
A
13
8 . 6 10
10 9
2 18
2 19
2
2
=
= =
i
i
iE B
i E
B E
E B
F
n
n
n N
n N
W D
W D
|
2 2
38
i iE
n n = 24 =
F
|
2 meV 26 / meV 60 2
/
2 2
10
i i
kT E
i iB
n e n e n n
gB
= = =
A
237 =
F
|
EXAMPLE: Emitter Bandgap Narrowing and SiGe Base
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-14
A high-performance BJT typically has a layer of As-doped N
+
poly-silicon film in the emitter.
|
F
is larger due to the large W
E
, mostly made of the N
+
poly-
silicon. (A deep diffused emitter junction tends to cause emitter-
collector shorts.)
N-collector
P-base
SiO
2
emitter
N
+
-poly-Si
8.4.3 Poly-Silicon Emitter
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-15
Why does one want to operate BJTs at low I
C
and high I
C
?
Why is |
F
a function of V
BC
in the right figure?
|
F
From top to bottom:
V
BC
= 2V, 1V, 0V
8.4.4 Gummel Plot and |
F
Fall-off at High and Low I
c
Hint: See Sec. 8.5 and Sec. 8.9.
SCR BE current
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-16
8.5 Base-Width Modulation by Collector Voltage
Output resistance :
C
A
CE
C
I
V
V
I
r =
|
|
.
|
\
|
c
c
1
0
Large V
A
(large r
o
)
is desirable for a
large voltage gain
I
B3
I
C
V
CE
0
V
A
V
A
: Early Voltage
I
B2
I
B1
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-17
How can we reduce the base-width modulation effect?
8.5 Base-Width Modulation by Collector Voltage
N
+
P
N
emitter
base collector
V
CE
W
B 3
W
B 2
W
B 1
x
n'
}
V
CE 1
< V
CE 2
< V
CE 3
V
BE
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-18
The base-width modulation
effect is reduced if we
(A) Increase the base width,
(B) Increase the base doping
concentration, N
B
, or
(C) Decrease the collector doping
concentration, N
C
.
Which of the above is the most acceptable action?
8.5 Base-Width Modulation by Collector Voltage
N
+
P
N
emitter
base collector
V
CE
W
B 3
W
B 2
W
B 1
x
n'
}
V
CE 1
< V
CE 2
< V
CE 3
V
BE
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-19
8.6 Ebers-Moll Model
The Ebers-Moll model describes both the active
and the saturation regions of BJT operation.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
I
B
I
C
0
V
CE
saturation
region
active region
Slide 8-20
I
C
is driven by two two forces, V
BE
and V
BC
.
When only V
BE
is present :
) 1 (
) 1 (
/
/
=
=
kT qV
F
S
B
kT qV
S C
BE
BE
e
I
I
e I I
|
Now reverse the roles of emitter and collector.
When only V
BC
is present :
) 1 )(
1
1 (
) 1 (
) 1 (
/
/
/
+ = =
=
=
kT qV
R
S B E C
kT qV
R
S
B
kT qV
S E
BC
BC
BC
e I I I I
e
I
I
e I I
|
|
|
R
: reverse current gain
|
F
: forward current gain
8.6 Ebers-Moll Model
I
C
V
BC
V
BE
I
B
E
B C
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-21
) 1 ( ) 1 (
) 1 )(
1
1 ( ) 1 (
/ /
/ /
+ =
+ =
kT qV
F
S
kT qV
F
S
B
kT qV
R
S
kT qV
S C
BC BE
BC BE
e
I
e
I
I
e I e I I
| |
|
In general, both V
BE
and V
BC
are present :
In saturation, the BC junction becomes forward-biased, too.
V
BC
causes a lot of holes to be injected
into the collector. This uses up much
of I
B
. As a result, I
C
drops.
V
CE
(V)
8.6 Ebers-Moll Model
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-22
8.7 Transit Time and Charge Storage
C
F
F
I
Q
t
When the BE junction is forward-biased, excess holes are stored
in the emitter, the base, and even in the depletion layers.
Q
F
is all the stored excess hole charge
t
F
determines the high-frequency limit of BJ T operation.
t
F
is difficult to be predicted accurately but can be measured.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-23
8.7.1 Base Charge Storage and Base Transit Time
Lets analyze the excess hole charge and transit time in
the base only.
W
B
0
n
'
0
( )
n
iB
2
N
B
------- e
qV
BE
kT
1
( )
=
x
p' = n'
) 1 ( ) 0 (
/
2
=
'
kT qV
B
iB
BE
e
N
n
n
p n ' = '
B
B
FB
C
FB
B E FB
D
W
I
Q
W n qA Q
2
2 / ) 0 (
2
=
'
=
t
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-24
What is t
FB
if W
B
= 70 nm and D
B
= 10 cm
2
/s?
Answer:
2.5 ps is a very short time. Since light speed is
310
8
m/s, light travels only 1.5 mm in 5 ps.
EXAMPLE: Base Transit Time
ps 5 . 2 s 10 5 . 2
/s cm 10 2
) cm 10 7 (
2
12
2
2 6 2
= =
= =
B
B
FB
D
W
t
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-25
The base transit time can be reduced by building into the base
a drift field that aids the flow of electrons. Two methods:
Fixed E
gB
, N
B
decreases from emitter end to collector end.
Fixed N
B
, E
gB
decreases from emitter end to collector end.
dx
dE
q
c
1
= E
8.7.2 Drift TransistorBuilt-in Base Field
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
-
E B C
E
c
E
v
E
f
-
E
B
C
E
c
E
v
E
f
Slide 8-26
8.7.3 Emitter-to-Collector Transit Time and Kirk Effect
Top to bottom :
V
CE
= 0.5V, 0.8V,
1.5V, 3V.
To reduce the total transit time, emitter and depletion layers must be thin, too.
Kirk effect or base widening: At high I
C
the base widens into the collector. Wider
base means larger t
F
.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-27
Base Widening at Large I
c
sat E C
qnv A I =
sat E
C
C
C
v A
I
qN
qn qN
=
=
s
dx
dE
c
/
=
x
E
base
N
collector
N
+
collector
base
width
depletion
layer
x
E
base
N
N
+
collector
base
width
depletion
layer
collector
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-28
8.8 Small-Signal Model
kT qV
S C
BE
e I I
/
=
Transconductance:
) / /(
) (
/
/
q kT I e I
kT
q
e I
dV
d
dV
dI
g
C
kT qV
S
kT qV
S
BE BE
C
m
BE
BE
= =
=
At 300 K, for example, g
m
=I
C
/26mV.
) / /( q kT I g
C m
=
v
be
r
t
g
m
v
be
C
E
B
E
C
t
+
= =
=
What is ? ) ( )? 0 ( ? ) (
F F B
Q Q I
I
B
(t)
I
C
(t)
I
C
(t)
t
t
I
B
I
B0
E B C
n
t
Q
F
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-38
8.11 Model for Large-Signal Circuit Simulation
Compact (SPICE) model contains dozens of parameters,
mostly determined from measured BJT data.
Circuits containing tens of thousands of transistors can
be simulated.
Compact model is a contract between
device/manufacturing engineers and
circuit designers.
) 1 ( 1 ) (
/ / /
|
|
.
|
\
|
+
'
=
kT qV
F
S
A
CB
kT qV kT qV
S C
BC BC BE
e
I
V
V
e e I I
|
C
B
E
Q
F
C
CS
r
B
r
C
r
E
C
BE
Q
R
C
BC
I
C
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-39
A commonly used BJT compact model is the Gummel-Poon
model, consisting of
Ebers-Moll model
Current-dependent beta
Early effect
Transit times
Kirk effect
Voltage-dependent capacitances
Parasitic resistances
Other effects
8.11 Model for Large-Signal Circuit Simulation
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-40
8.12 Chapter Summary
The base-emitter junction is usually forward-biased while
the base-collector is reverse-biased. V
BE
determines the
collector current, I
C
.
}
=
B
BE
W
B iB
i
B
kT qV
B
i
E C
dx
D
p
n
n
G
e
G
qn
A I
0
2
2
/
2
) 1 (
G
B
is the base Gummel number, which represents all the
subtleties of BJT design that affect I
C
.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-41
8.12 Chapter Summary
The base (input) current, I
B
, is related to I
C
by the
common-emitter current gain, |
F
. This can be related to
the common-base current gain, o
F
.
B
E
B
C
F
G
G
I
I
~ = |
The Gummel plot shows that |
F
falls off in the high I
C
region due to high-level injection in the base. It also falls
off in the low I
C
region due to excess base current.
F
F
E
C
F
I
I
|
|
o
+
= =
1
Base-width modulation by V
CB
results in a significant slope
of the I
C
vs. V
CE
curve in the active region (known as the
Early effect).
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-42
8.12 Chapter Summary
Due to the forward bias V
BE
, a BJT stores a certain amount
of excess carrier charge Q
F
which is proportional to I
C
.
F C F
I Q t
t
F
is the forward transit time. If no excess carriers are stored
outside the base, then
The charge-control model first calculates Q
F
(t) from I
B
(t)
and then calculates I
C
(t).
B
B
FB F
D
W
2
2
= =t t
F F
F
B
F
Q
t I
dt
dQ
| t
= ) (
F F C
t Q t I t / ) ( ) ( =
, the base transit time.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-43
8.12 Chapter Summary
The small-signal models employ parameters such as
transconductance,
q
kT
I
dV
dI
g
C
BE
C
m
/ =
input capacitance,
and input resistance.
m F
BE
F
g
dV
dQ
C t
t
= =
m F
B
BE
g
dI
dV
r / |
t
= =
Modern Semiconductor Devices for Integrated Circuits (C. Hu)