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Slide 8-1

Chapter 8 Bipolar J unction Transistors


Since 1970, the high density and low-power advantage of
the MOS technology steadily eroded the BJTs early dominance.

BJTs are still preferred in some high-frequency and analog
applications because of their high speed and high power output.
Question: What is the meaning of bipolar ?
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-2
8.1 I ntroduction to the BJ T
I
C
is an exponential
function of forward
V
BE
and independent
of reverse V
CB
.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
N
+
P N
emitter collector base
V
BE
V
CB
-
-
E
f n
E
f p
V
CB
V
BE
(a)
(b)
(c)
V
BE
I
C
0
V
CB
B
C E
E
c
E
v
E
f n
NPN BJT:
N
+
P N
E C
B
V
BE
V
CB

Emitter Base
Collector
Slide 8-3
Common-Emitter Configuration
Question: Why is I
B
often preferred as a parameter over V
BE
?
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-4
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
8.2 Collector Current
B B B
B
D L
L
n
dx
n d
t
'
=
'
2 2
2
t
B
: base recombination lifetime
D
B
: base minority carrier (electron)
diffusion constant
Boundary conditions :
) 1 ( ) 0 (
/
0
=
'
kT qV
B
BE
e n n
0 ) 1 ( ) (
0
/
0
~ ~ =
'
B
kT qV
B B
n e n W n
BC
N
+
P
N
emitter base collector
x
0

W
depletion layers
B
Slide 8-5
( )
B B
B
B
kT qV
B
L W
L
x W
e n x n
BE
/ sinh
sinh
) 1 ( ) (
/
0
|
|
.
|

\
|
= '
) 1 (
/
2
=
=
kT qV
B
iB
B
B
E
B E C
BE
e
N
n
W
D
q A
dx
dn
qD A I
) 1 (
/
=
kT qV
S C
BE
e I I
}

=
B
BE
W
B iB
i
B
kT qV
B
i
E C
dx
D
p
n
n
G
e
G
qn
A I
0
2
2
/
2
) 1 (
It can be shown
G
B
(s cm
4
) is the base Gummel number
8.2 Collector Current
n
i
2
N
B
-------e
qV
BE
kT
1
()
n '
n ' 0 ()
-------------
) 0 ( / ) ( n x n ' '
0
1
1
) 1 ( ) (
/
2
= '
kT qV
B
iB
BE
e
N
n
x n
x/
x / W
B
) / 1 )( 1 (
) / 1 )( 0 ( ) (
/
2
B
kT qV
B
iB
B
W x e
N
n
W x n x n
BE
=
' = '
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-6
At low-level injection,
inverse slope is 60 mV/decade
High-level injection effect :
8.2.1 High Level I njection Effect
0 0.2 0.4 0.6 0.8 1.0
10
-12

10
-10

10
-8

10
-6

10
-4

10
-2

V
BE
I
C

(
A
)

I
kF

60 mV/decade
At large V
BE,

B
N p n >>
'
=
'
p n p n = = ' = '
kT qV
i
BE
e n p n
2 /
~ ~
kT qV
i B
BE
e n p G
2 /
= kT qV
i
BE
e n I
2 /
C

When p > N
B
, inverse slope is 120mV/decade.

kT qV
i
kT E E q
i
BE
Fp Fn
e n e n np
/
2 / ) ( 2
= =

Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-7
8.3 Base Current
Some holes are injected from the P-type base into the N
+
emitter.
The holes are provided by the base current, I
B
.
p
E
' n
B
'
W
E
W
B
(b)
emitter base collector contact
I
E

I
C
electron flow

+
hole flow
I
B
( a )
contact
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-8
}

=
E
BE
W
E iE
i
E
kT qV
E
i
E B
dx
D
n
n
n
G
e
G
qn
A I
0
2
2
/
2
) 1 (
Is a large I
B
desirable? Why?
8.3 Base Current
emitter base collector
contact
I
E

I
C
electron flow

+
hole flow
I
B
( a ) contact
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
) 1 (
/
2
=
kT qV
E E
iE E
E B
BE
e
N W
n D
q A I
For a uniform emitter,
Slide 8-9
8.4 Current Gain
B
C
F
I
I
|
How can |
F
be maximized?
Common-emitter current gain, |
F
:

Common-base current gain:

F
F
B C
B C
C B
C
E
C
F
E F C
I I
I I
I I
I
I
I
I I
|
|
o
o
+
=
+
=
+
=
=
1 / 1
/
It can be shown that
F
F
F
o
o
|

=
1
2
2
iE B B E
iB E E B
B
E
F
n N W D
n N W D
G
G
= = |
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-10
EXAMPLE: Current Gain
A BJT has I
C
= 1 mA and I
B
= 10 A. What are I
E
, |
F
and o
F
?
Solution:


9901 . 0 mA 01 . 1 / mA 1 /
100 A 10 / mA 1 /
mA 01 . 1 A 10 mA 1
= = =
= = =
= + = + =
E C F
B C F
B C E
I I
I I
I I I
o
|
We can confirm
F
F
F
|
|
o
+
=
1
F
F
F
o
o
|

=
1
and
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-11
8.4.1 Emitter Bandgap Narrowing
Emitter bandgap narrowing makes it difficult to raise |
F
by
doping the emitter very heavily.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
2
2
iE
iB
B
E
n
n
N
N
|
To raise |
F
, N
E
is typically very large.
Unfortunately, large N
E
makes
2 2
i iE
n n >
(heavy doping effect).
kT E
V C i
g
e N N n
/
2

=
Since n
i
is related to E
g
, this effect is
also known as band-gap
narrowing.
kT E
i iE
gE
e n n
/
2 2
A
=
AE
gE
is negligible for N
E
< 10
18
cm
-3
,
is 50 meV at 10
19
cm
-3
, 95 meV at 10
20
cm
-3
,
and 140 meV at 10
21
cm
-3
.
Slide 8-12
2
2
iE
iB
B
E
n
n
N
N
|
To further elevate |
F
, we can raise n
iB
by
using an epitaxial Si
1-q
Ge
q
base.
With q = 0.2, E
gB
is reduced by 0.1eV and n
iE
2
by 30x.
8.4.2 Narrow-Bandgap Base and Heterojuncion BJT
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-13
Assume D
B
= 3D
E
, W
E
= 3W
B
, N
B
= 10
18
cm
-3
, and n
iB
2
= n
i
2
. What is
|
F
for (a) N
E
= 10
19
cm
-3
, (b) N
E
= 10
20
cm
-3,
and (c) N
E
= 10
20
cm
-3

and a SiGe base with AE
gB
= 60 meV ?
(a) At N
E
= 10
19
cm
-3
, AE
gE
~ 50 meV,



(b) At N
E
= 10
20
cm
-3
, AE
gE
~ 95 meV

(c)

2 92 . 1 2 meV 26 / meV 50 2
/
2 2
8 . 6
i i i
kT E
i iE
n e n e n e n n
gE
= = = =
A
13
8 . 6 10
10 9
2 18
2 19
2
2
=


= =
i
i
iE B
i E
B E
E B
F
n
n
n N
n N
W D
W D
|
2 2
38
i iE
n n = 24 =
F
|
2 meV 26 / meV 60 2
/
2 2
10
i i
kT E
i iB
n e n e n n
gB
= = =
A
237 =
F
|
EXAMPLE: Emitter Bandgap Narrowing and SiGe Base
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-14
A high-performance BJT typically has a layer of As-doped N
+

poly-silicon film in the emitter.
|
F
is larger due to the large W
E
, mostly made of the N
+
poly-
silicon. (A deep diffused emitter junction tends to cause emitter-
collector shorts.)
N-collector
P-base
SiO
2
emitter
N
+
-poly-Si
8.4.3 Poly-Silicon Emitter
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-15
Why does one want to operate BJTs at low I
C
and high I
C
?
Why is |
F
a function of V
BC
in the right figure?
|
F

From top to bottom:
V
BC
= 2V, 1V, 0V
8.4.4 Gummel Plot and |
F
Fall-off at High and Low I
c

Hint: See Sec. 8.5 and Sec. 8.9.
SCR BE current
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-16
8.5 Base-Width Modulation by Collector Voltage
Output resistance :
C
A
CE
C
I
V
V
I
r =
|
|
.
|

\
|
c
c

1
0
Large V
A
(large r
o
)
is desirable for a
large voltage gain
I
B3
I
C

V
CE
0
V
A
V
A
: Early Voltage
I
B2

I
B1

Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-17
How can we reduce the base-width modulation effect?
8.5 Base-Width Modulation by Collector Voltage
N
+
P
N
emitter
base collector

V
CE


W
B 3
W
B 2
W
B 1
x
n'
}

V
CE 1
< V
CE 2
< V
CE 3
V
BE
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-18
The base-width modulation
effect is reduced if we

(A) Increase the base width,
(B) Increase the base doping
concentration, N
B
, or
(C) Decrease the collector doping
concentration, N
C
.



Which of the above is the most acceptable action?
8.5 Base-Width Modulation by Collector Voltage
N
+
P
N
emitter
base collector

V
CE


W
B 3
W
B 2
W
B 1

x
n'
}

V
CE 1
< V
CE 2
< V
CE 3
V
BE
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-19
8.6 Ebers-Moll Model
The Ebers-Moll model describes both the active
and the saturation regions of BJT operation.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
I
B
I
C
0
V
CE
saturation
region
active region
Slide 8-20
I
C
is driven by two two forces, V
BE
and V
BC
.
When only V
BE
is present :
) 1 (
) 1 (
/
/
=
=
kT qV
F
S
B
kT qV
S C
BE
BE
e
I
I
e I I
|
Now reverse the roles of emitter and collector.
When only V
BC
is present :
) 1 )(
1
1 (
) 1 (
) 1 (
/
/
/
+ = =
=
=
kT qV
R
S B E C
kT qV
R
S
B
kT qV
S E
BC
BC
BC
e I I I I
e
I
I
e I I
|
|
|
R
: reverse current gain
|
F
: forward current gain
8.6 Ebers-Moll Model
I
C
V
BC
V
BE
I
B

E

B C
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-21
) 1 ( ) 1 (
) 1 )(
1
1 ( ) 1 (
/ /
/ /
+ =
+ =
kT qV
F
S
kT qV
F
S
B
kT qV
R
S
kT qV
S C
BC BE
BC BE
e
I
e
I
I
e I e I I
| |
|
In general, both V
BE
and V
BC
are present :
In saturation, the BC junction becomes forward-biased, too.
V
BC
causes a lot of holes to be injected
into the collector. This uses up much
of I
B
. As a result, I
C
drops.
V
CE
(V)
8.6 Ebers-Moll Model
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-22
8.7 Transit Time and Charge Storage

C
F
F
I
Q
t
When the BE junction is forward-biased, excess holes are stored
in the emitter, the base, and even in the depletion layers.
Q
F
is all the stored excess hole charge

t
F
determines the high-frequency limit of BJ T operation.
t
F
is difficult to be predicted accurately but can be measured.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-23
8.7.1 Base Charge Storage and Base Transit Time

Lets analyze the excess hole charge and transit time in
the base only.
W
B
0
n
'
0
( )
n
iB
2
N
B
------- e
qV
BE
kT

1
( )
=

x
p' = n'
) 1 ( ) 0 (
/
2
=
'
kT qV
B
iB
BE
e
N
n
n
p n ' = '
B
B
FB
C
FB
B E FB
D
W
I
Q
W n qA Q
2
2 / ) 0 (
2
=
'
=
t
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-24
What is t
FB
if W
B
= 70 nm and D
B
= 10 cm
2
/s?
Answer:


2.5 ps is a very short time. Since light speed is
310
8
m/s, light travels only 1.5 mm in 5 ps.
EXAMPLE: Base Transit Time
ps 5 . 2 s 10 5 . 2
/s cm 10 2
) cm 10 7 (
2
12
2
2 6 2
= =

= =

B
B
FB
D
W
t
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-25
The base transit time can be reduced by building into the base
a drift field that aids the flow of electrons. Two methods:
Fixed E
gB
, N
B
decreases from emitter end to collector end.
Fixed N
B
, E
gB
decreases from emitter end to collector end.
dx
dE
q
c
1
= E
8.7.2 Drift TransistorBuilt-in Base Field

Modern Semiconductor Devices for Integrated Circuits (C. Hu)
-
E B C
E
c

E
v

E
f

-
E
B
C
E
c

E
v

E
f

Slide 8-26
8.7.3 Emitter-to-Collector Transit Time and Kirk Effect



Top to bottom :
V
CE
= 0.5V, 0.8V,
1.5V, 3V.
To reduce the total transit time, emitter and depletion layers must be thin, too.
Kirk effect or base widening: At high I
C
the base widens into the collector. Wider
base means larger t
F
.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-27


Base Widening at Large I
c
sat E C
qnv A I =
sat E
C
C
C
v A
I
qN
qn qN
=
=
s
dx
dE
c
/
=

x

E
base
N
collector
N
+
collector

base
width
depletion
layer
x

E
base
N
N
+
collector
base
width
depletion
layer
collector
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-28
8.8 Small-Signal Model

kT qV
S C
BE
e I I
/
=
Transconductance:
) / /(
) (
/
/
q kT I e I
kT
q
e I
dV
d
dV
dI
g
C
kT qV
S
kT qV
S
BE BE
C
m
BE
BE
= =
=
At 300 K, for example, g
m
=I
C
/26mV.
) / /( q kT I g
C m
=
v
be
r
t
g
m
v
be
C
E
B
E
C
t
+

Modern Semiconductor Devices for Integrated Circuits (C. Hu)


Slide 8-29
F
m
BE
C
F BE
B
g
dV
dI
dV
dI
r | |
t
= = =
1 1
m F C F
BE BE
F
g I
dV
d
dV
dQ
C t t
t
= = =
This is the charge-storage capacitance, better known as the
diffusion capacitance.
Add the depletion-layer capacitance, C
dBE
:

dBE m F
C g C + =t
t
8.8 Small-Signal Model

m F
g r / |
t
=
v
be
r
t
g
m
v
be
C
E
B
E
C
t
+

Modern Semiconductor Devices for Integrated Circuits (C. Hu)


Slide 8-30
EXAMPLE: Small-Signal Model Parameters

A BJT is biased at I
C
= 1 mA and V
CE
= 3 V. |
F
=90, t
F
=5 ps,
and T = 300 K. Find (a) g
m
, (b) r
t
, (c) C
t
.

Solution:

(a)


(b)


(c)


siemens) (milli q kT I g
C m
mS 39
V
mA
39
mV 26
mA 1
) / /( = = = =
k 3 . 2
mS 39
90
/ = = =
m F
g r |
t
ad) (femto far g C
m F
fF 19 F 10 9 . 1 039 . 0 10 5
14 12
= ~ = =

t
t
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-31
Once the model parameters are determined, one can analyze
circuits with arbitrary source and load impedances.
The parameters are routinely
determined through comprehensive
measurement of the BJT AC
and DC characteristics.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-32
8.9 Cutoff Frequency

The load is a short circuit. The signal source is a current source,
i
b
, at frequency, f. At what frequency does the current gain
fall to unity? ) / (
b c
i i |
C dBE F F
m
b
c
be m c
b b
be
qI kT C j j C j r
g
i
i
v g i
C j r
i i
v
/ / 1
1
/ 1
) (
,
/ 1 admittance input
e et | e
e |
e
t t
t t
+ +
=
+
= =
=
+
= =
) / ( 2
1
at 1
C dBE F
T
qI kT C
f
+
= =
t t
|
v
be
r
t g
m
v
be
C
E
B
E
C
t
+
-
Signal
source
Load
dBE m F
C g C + =t
t
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-33
f
T
is commonly used to compare the speed of transistors.
Why does f
T
increase with increasing I
C
?
Why does f
T
fall at high I
C
?
f
T
= 1/2t(t
F
+ C
dBE
kT/qI
C
)
8.9 Cutoff Frequency

Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-34
Poly-Si emitter
Thin base
Self-aligned poly-Si base contact
Narrow emitter opening
Lightly-doped collector
Heavily-doped epitaxial subcollector
Shallow trench and deep trench for electrical isolation
BJ T Structure for Minimum Parasitics and High Speed
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-35
In order to sustain an excess hole charge in the transistor,
holes must be supplied through I
B
to susbtain recombination at
the above rate.
What if I
B
is larger than ?
F F F
Q | t /
F F
F
B
F
Q
t I
dt
dQ
| t
= ) (
Step 1: Solve it for any given I
B
(t) to find Q
F
(t).
8.10 Charge Control Model

For the DC condition,
F F
F
F C B
Q
I I
| t
| = = /
Step 2: Can then find I
C
(t) through I
C
(t) = Q
F
(t)/t
F
.
I
C
(t) = Q
F
(t)/t
F
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-36
Visualization of Q
F
(t)
F F
F
B
F
Q
t I
dt
dQ
| t
= ) (
Q
F
( t )
Q
F
/ t
F
|
F
I
B
( t ) ) (t I
B
F F
F
Q
| t
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-37
EXAMPLE : Find I
C
(t) for a Step I
B
(t)
The solution of is
F F
F
B
F
Q
t I
dt
dQ
| t
= ) (
) 1 ( / ) ( ) (
) 1 (
/
0
/
0
F F
F F
t
B F F F C
t
B F F F
e I t Q t I
e I Q
| t
| t
| t
| t

= =
=
What is ? ) ( )? 0 ( ? ) (
F F B
Q Q I
I
B
(t)
I
C
(t)
I
C
(t)
t
t
I
B
I
B0
E B C
n
t
Q
F

Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-38
8.11 Model for Large-Signal Circuit Simulation
Compact (SPICE) model contains dozens of parameters,
mostly determined from measured BJT data.
Circuits containing tens of thousands of transistors can
be simulated.
Compact model is a contract between
device/manufacturing engineers and
circuit designers.
) 1 ( 1 ) (
/ / /

|
|
.
|

\
|
+
'
=
kT qV
F
S
A
CB
kT qV kT qV
S C
BC BC BE
e
I
V
V
e e I I
|
C
B
E
Q
F
C
CS
r
B
r
C
r
E
C
BE
Q
R
C
BC
I
C
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-39
A commonly used BJT compact model is the Gummel-Poon
model, consisting of
Ebers-Moll model
Current-dependent beta
Early effect
Transit times
Kirk effect
Voltage-dependent capacitances
Parasitic resistances
Other effects

8.11 Model for Large-Signal Circuit Simulation
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-40
8.12 Chapter Summary
The base-emitter junction is usually forward-biased while
the base-collector is reverse-biased. V
BE
determines the
collector current, I
C
.

}

=
B
BE
W
B iB
i
B
kT qV
B
i
E C
dx
D
p
n
n
G
e
G
qn
A I
0
2
2
/
2
) 1 (
G
B
is the base Gummel number, which represents all the
subtleties of BJT design that affect I
C
.

Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-41
8.12 Chapter Summary
The base (input) current, I
B
, is related to I
C
by the
common-emitter current gain, |
F
. This can be related to
the common-base current gain, o
F
.

B
E
B
C
F
G
G
I
I
~ = |
The Gummel plot shows that |
F
falls off in the high I
C

region due to high-level injection in the base. It also falls
off in the low I
C
region due to excess base current.

F
F
E
C
F
I
I
|
|
o
+
= =
1


Base-width modulation by V
CB
results in a significant slope
of the I
C
vs. V
CE
curve in the active region (known as the
Early effect).

Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-42
8.12 Chapter Summary
Due to the forward bias V
BE
, a BJT stores a certain amount
of excess carrier charge Q
F
which is proportional to I
C
.

F C F
I Q t
t
F
is the forward transit time. If no excess carriers are stored
outside the base, then


The charge-control model first calculates Q
F
(t) from I
B
(t)
and then calculates I
C
(t).

B
B
FB F
D
W
2
2
= =t t
F F
F
B
F
Q
t I
dt
dQ
| t
= ) (
F F C
t Q t I t / ) ( ) ( =
, the base transit time.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 8-43
8.12 Chapter Summary
The small-signal models employ parameters such as
transconductance,

q
kT
I
dV
dI
g
C
BE
C
m
/ =
input capacitance,


and input resistance.

m F
BE
F
g
dV
dQ
C t
t
= =
m F
B
BE
g
dI
dV
r / |
t
= =
Modern Semiconductor Devices for Integrated Circuits (C. Hu)

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