SUPERION Ion Implanter Technology for very large OLED FPD

http://superion-implant.com/

SUPERION Ion Implanter Technology for Gen 10 substrates

1.Home | 2.Introduction | 3.Multiple species | 4.High mass resolution | 5.Beam Transmission | 6.Technical Summary Contact_us

Superion Mass Separated Ion Beam Technology for Gen 10 substrates

Superion Multiple Double Beam, Mass Dependent Quadrupole Line Focusing Technology has been developed for the Mass Analyzed Ion Implantation of Gen 6 to Gen 10 (and larger) substrates. Superion is an intellectual property company licensing its technology to implanter manufacturers. This website describes a mass separated ion implantation (or ion doping) system for the implantation of any size substrate (Gen 6 to Gen 10 and larger) for products such as OLED displays and system-on-glass devices. Current mass analyzing magnets for FPD implant use magnets which analyze the ion beam in the plane of beam deflection (x-y plane) and these scale very badly with increasing beam size (and therefore substrate size). The Superion Quadrupole Magnet analyzes the beam in a plane perpendicular to the beam deflection plane by mass dependent focusing; the required beams are selected by focusing them through apertures in a resolving structure. The Superion Quadrupole Analyzing Magnet is a small, low cost, high resolving power design which uses permanent magnets and therefore consumes no power, and where the design of the magnet is the same for all substrate sizes. The scaling with substrate size is better than linear - a 3 metre substrate (Gen 10) magnet is only twice the length (and weight) of a 1 metre substrate (approx. Gen 5) magnet, the magnet cross-section design being identical for all substrate sizes. The construction is modular, the magnet being constructed to the required length from a standard set of components.

Mass separation magnet for very large substrates mass separated implant essential for high yield OLED display and system on glass substrates one analyzing magnet design for any substrate size environmentally friendly zero power consumption low cost, modular construction for any substrate size

high resolution - 11BF+ (mass 30) / P+ (mass 31) high beam current - any number of any size beams

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SUPERION Ion Implanter Technology for very large OLED FPD

http://superion-implant.com/

ion source to substrate distance <1.5m for any substrate size multiple ion species implant capability - 10B+ &
11 +

B ; PHx+

easy conversion of ion shower implanter to a mass separated design (Fig.1-1a & b)

mass separation achieved by mass dependent focusing (Fig.1-1c) Fig.1-1a shows a multiple ribbon beam mass separated ion implanter beamline cross-section viewed along the dimension determined by the size of the substrate to be implanted (z-direction), the direction of the extracted and analyzed beams is in the x-direction with multiple beams stacked at regular intervals along the y-direction. The substrates are mechanically scanned through the ion beams in the y-direction, the substrates shown being Gen 10.

Fig.1-1c shows parallel double ion beams from the ion source entering the quadrupole analyzing magnet; the size of these beams in the z-direction (perpendicular to the plane of this figure) can have any value, depending on the maximum substrate size to be implanted. This cross-section of the magnet and the ion beams is the same at any position along the z-direction. The beams are focused to a cross-over and then further focused to produce parallel, hollow output beams. This cross-over is used to select the required ion species to be transmitted using a resolving structure (not shown in Fig.1-1c) which only allows the transmission of beams having particular cross-over positions. The permanent magnet dipoles D1 & D2 are shown green and the white arrows show the direction of the magnetic fields.

Fig.1-1b shows an ion shower system without an analyzing magnet. The required ions, and also impurity ions, are implanted. The nature and quantity of these impurities will vary from implant to implant. If a precise, stable and predictable ion implant is required, then mass separation is essential.

Fig.1-2a shows an ion shower system viewed along the y-direction. The beams can be multiple ribbon beams or an array of circular beams. The impurity beams can be primary impurity beams from the ion source feed material or secondary impurity beams originating from previous ion species used in the implanter, or from the materials of construction of the ion source, or from

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SUPERION Ion Implanter Technology for very large OLED FPD

http://superion-implant.com/

impurities in, or leaking into, the source feed material.

Fig.1-2b shows a mass separated beamline for a Gen 5 FPD substrate. The beam is deflected to the right in the first set of dipole gaps D1; the beam then passes through the quadrupole region with a substantial velocity component in the z-direction. This z-component of the beam interacts with the curved quadrupole magnetic fields to produce convergent mass dependent focusing (in planes containing the y-direction). The beam is then deflected to the left in the second set of dipole gaps D2 and the beams leave the analyzing magnet parallel to the beams extracted from the ion source.

Fig.1-2c shows a mass separated beamline for a Gen 10 FPD substrate. It can be seen that the magnet design is unchanged; it is simply increased in length in the z-direction by increasing the number of modular components to achieve the required length. It should be noted that the magnet size (volume of permanent magnet material and iron) scaling is better than linear, the length of the magnet for Gen 10 (approx. 3 metre substrate) being double that for Gen 5 (approx. 1.1 metre substrate). The magnet power consumption is zero and expensive power supplies and cooling systems are not required. The next page Introduction to Quadrupole Mass Separation describes how mass separation is achieved.

CLICK HERE for next page ' 2. Introduction '

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SUPERION Ion Implanter Technology for very large OLED FPD

http://superion-implant.com/

Superion Limited, Holly House, 49A Palace Road, East Molesey, Surrey KT8 9DN, UK implant.com

derek_aitken@superion-

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