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Named after Pierre Auger, a French Physicist (discovered Auger effect) Highly sensitive to most elements except H and He
Auger effect:
MNEL
Characterisation Techniques
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Basic Processes:
Three basic steps :
(1) Atomic ionization (by removal of a core electron) (2) Electron emission (the Auger process) (3) Analysis of the emitted Auger electrons Instrumentation:
Electron source has variable energy and capable of producing a very small spot of electrons
Secondary electron detector Backscattered electron detector (optional) produces an image similar to an SEM but it is less surface sensitive
Ion source (optional) clean a surface prior to analysis and to erode the surface of the sample so that concentration depth profiles can be measured
Emitted electrons have energy between 50 eV and 3 keV Ultra high vacuum required to avoid electron scattering off of residual gas atoms and formation of thin gas adsorbate layer
Characterisation Techniques Auger Electron Spectroscopy Page 2 of 5
MNEL
Advantages:
High sensitivity
Spatial resolution Depth profiling possible with Auger peak heights vs sputter time or atomic concentration vs depth plots
Disadvantages:
Charging effects
Characteristic energy losses Higher order atomic ionization events (Satellite peaks) Electrons ejected from a solid generally undergo multiple scattering events They lose energy in the form of collective electron density oscillations called plasmons If plasmon losses have energies near that of an Auger peak, the less intense Auger process becomes dwarfed by the plasmon peak
Characterisation Techniques Auger Electron Spectroscopy Page 3 of 5
MNEL
Combination of SEM and AES Electron beam scanned over the surface Electrons excited from the surface energy analysed to detect Auger peaks Intensity of Auger peaks as a function of the position of the electron beam provides an image of the element to which the Auger peak corresponds
SEM vs SAM:
SAM:
MNEL
Characterisation Techniques
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MNEL
Characterisation Techniques
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