Documenti di Didattica
Documenti di Professioni
Documenti di Cultura
In the class, we derived I-V characteristics for a 1D ballistic MOSFET in the Boltzmann limit. Using the
derived result we were able to explain only the sub-threshold behavior.
a) Re-derive the IDS(VGS, VDS) result considering Fermi-Dirac distribution of electrons in the source
and drain.
b) Assuming, threshold voltage VT = 0.4 V, draw the IDS-VGS (IDS in linear as well as log-scale, VDS
= 1V) and IDS-VDS characteristics of the transistor. Assume VGS and VDS vary from 0-1V.
c) Look online for a paper reporting 1D Ballistic transistor (either theoretical or experimental
paper). Compare your calculations (current levels etc.) to the results given in paper (Give
reference and comparison plots) ?
Consider a 1D semiconductor with potential variation along the length shown in figure below:
1
d) Plot actual T(E) in log-scale for E<V0 and compare the result with T(E) calculated using WKB
approximation.
e) Numerically calculate the tunneling current at low temperature (assuming f(E) as step function)
through the barrier using actual T(E) and WKB T(E). Compare the answers.
f) Repeat the calculation in (e) at 300K (using the corresponding f(E)). Compare your answer with
tunneling currents calculated in part (e).
In the class, we calculated electron flux along +x direction (flux with kx > 0), from a 2D semiconductor whose
conduction band is filled till Fermi-level Ef. The calculation was done assuming low temperature (assuming f(E) as
step function).
(a) Repeat the flux calculation at any temperature T ?
(b) Do you expect the flux to increase or decrease with increase in temperature ? Support your answer with
reasoning.
(a) Consider a 3D semiconductor whose conduction band is filled till Fermi-level Ef. Find the flux of electrons
along +x. Assume low temperature (assuming f(E) as step function).
(b) Consider a Schottky Barrier Diode (Metal-n-type Semiconductor junction) with metal to semiconductor
barrier height = ΦB. Draw the equilibrium band diagram perpendicular to metal-semiconductor junction
(lets call this direction x), labeling all relevant energies. Calculate the flux of electrons injected from
semiconductor to metal (along x). Assuming T(E) = 0, for all electrons whose energy component
along x is less than barrier height and T(E) = 1, for all electrons whose energy component along x
is greater than the barrier height. [Hint: If needed, look in “Physics of Semiconductor Devices”
by S. M. Sze, in the chapter on Metal-Semiconductor contacts for an outline of the derivation].
In the class we discussed transmission coefficient of a square barrier and an RTD with square barriers. In this
problem, lets replace the square barriers with δ barriers.
(a) Find the T-matrix of a single δ barrier ? Find expressions for r, t, R, T ? Plot the transmission coefficient
T(E) ? [Hint: You can derive the results using results of a square barrier by taking V0 ∞ and d 0 so
that S = V0*d remains constant]. For the plot assume S = 2.5 eV-nm, m* = 0.067m0 and energy range from
0-1 eV.
(b) Now consider a RTD made from two δ barriers (each with strength S = 2.5 eV-nm) separated by
distance a = 15 nm. Write a code to plot T(E) of the RTD in linear and log scale. [Hint: Use can
use Eqn. 5.72/5.73 from Davies, Chapter 5]. Assume m* = 0.067m0.