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Article history: In this study, an RF plasma discharge was employed to deposit thin poly(hexafluorobutyl acrylate)
Received 26 May 2015 (PHFBA) polymeric films on expanded perlite. A rotating plasma reactor was used to provide effective agi-
Received in revised form 1 September 2015 tation and mixing of the particles during the depositions. Surface of expanded perlite, a hydrophilic por-
Accepted 3 September 2015
ous material, was successfully transformed into super-hydrophobic due to the highly fluorinated chain of
Available online 8 September 2015
PHFBA. Deposition rates up to 42 nm/min were observed. The influences of plasma discharge conditions
on wettability and water holding capacity of expanded perlite powders were investigated. Chemical and
Keywords:
morphological properties of uncoated and coated expanded perlites were determined by SEM (EDS), FTIR,
Expanded perlite
PECVD
and contact angle measurements analyses. It is observed that the pulsed plasma approach helps to min-
Plasma polymerization imize undesirable monomer fragmentation while providing better film structure. It also should be
Hydrophobic emphasized that PECVD experiments did not change the morphology of the expanded perlite powders.
Coating The water holding capacity of expanded perlite was decreased from 70% down to around 4% upon coating
on pulsing mode.
Ó 2015 Elsevier B.V. All rights reserved.
http://dx.doi.org/10.1016/j.cej.2015.09.007
1385-8947/Ó 2015 Elsevier B.V. All rights reserved.
344 M. Gürsoy, M. Karaman / Chemical Engineering Journal 284 (2016) 343–350
concrete or mortar improves the heat insulation in buildings due to was employed externally to activate the deposition reactions. The
its very high porosity [4–6]. Due to its extremely low density, resultant surface-modified perlite particles were found to be highly
expanded perlite can also be used in lightweight aggregate con- water-repellent. The effects of various deposition conditions on the
crete [7,8]. In addition, expanded perlite is chemically inert, which structure, morphology, and the wetting behavior of the final mate-
makes it environmentally friendly and safe. Owing to its high rials are discussed.
water absorption capacity, it is used in horticultural applications
as a soil conditioner [9]. 2. Materials and methods
These are just a few examples where expanded perlite particles
find themselves useful among a wide range of applications in 2.1. Materials
diverse areas. It is apparent that the surface properties of the par-
ticles play a crucial role in determining the overall function and The expanded perlite was received from Tesar Püskürtme
performance of the final product. For example, high water content Granit (Konya, Turkey). The chemical composition and the physical
of expanded perlite is not desired for the applications requiring properties of expanded perlite are given in Tables 1 and 2, respec-
heat and sound insulations, because it is well known that the tively. The test liquid n-heptane and the monomer 2,2,3,4,4,4-
material moisture content increases the heat and sound transfer hexafluorobutyl acrylate (HFBA) (95%) were purchased from
coefficients [10,11]. Moreover, such a high moisture content in Sigma–Aldrich. They were used as-received without any further
the final structure can cause physical damages [12,13]. These modification and purification. The chemical structure of HFBA is
necessitate good strategies for modification or functionalization shown in Fig. 1.
of perlite particle surfaces with an optimal method.
The main objective of this study is to make expanded perlite 2.2. PECVD polymerization
surfaces hydrophobic through an all-dry encapsulation process,
namely rotating plasma enhanced chemical vapor deposition The experiments were carried out in a rotating-bed PECVD sys-
(rotating-bed PECVD) method. In this way, this modified expanded tem (Fig. 2) designed by Plazmatek, Turkey.
perlite could be more efficient insulating material and that may In this system, a cylindrical Pyrex tube (6 cm inner diameter,
create many more usage areas. The wetting behavior of a material 30 cm length) was used as the vacuum reactor, which was induc-
can be modified by changing the chemistry and/or roughness of its tively coupled by a copper antenna connected to a 13.56 MHz radio
surface [14]. Usually a thin layer of a low-surface energy polymer frequency (RF) plasma generator. The copper antenna was exter-
such as a fluoropolymer, is coated on a surface to obtain sufficient nally wound around the reaction chamber. An LC matching circuit
hydrophobicity [15,16]. Usually liquid-based techniques are uti- was placed between the coil and the generator for impedance
lized to coat or encapsulate particles and such methods rely on matching. The 360° rotation of the reactor chamber under vacuum
applying a polymer coating solution onto the particle surface with conditions was achieved by vacuum compatible ferrofluidic rotary
the subsequent removal of solvent. Another solution based feed throughs placed at both ends of the Pyrex reactor. Rotation of
method, atom transfer radical polymerization (ATRP) was also suc- the expanded perlite particles provided agitation and continuous
cessfully applied to coat polymer onto the surfaces of multiwalled exposure of the particle surfaces to the plasma gases.
carbon nanotubes [17], microspheres [18] and nanoparticles HFBA monomer was vaporized in a glass jar at room tempera-
[19,20]. However, it is very difficult to coat particles uniformly ture. The flow rate of monomer (1.2 sccm) was controlled by a
without agglomeration with liquid-based methods, especially for needle valve. A capacitance pressure gauge is used to measure
particle sizes below 100 lm [21]. Plasma enhanced chemical vapor
deposition (PECVD), on the other hand, is a dry process that is able
to provide uniform solid coatings around particles under a gaseous Table 1
environment. Previously, fluorocarbon coatings have been depos- The main chemical composition of expanded perlite.
ited on micron-sized silica particles by means of atmospheric pres- The main components Weight percentage
sure PECVD [22]. Carbon nanotubes have been encapsulated by Silicon dioxide 71.0–75.0
polymethyl methacrylate using fluidized-bed PECVD [23]. Passiva- Aluminum oxide 12.5–18
tion coatings around aluminum nanoparticles were achieved by Sodium oxide 2.9–4.0
PECVD using organic precursors [24]. Besides, PECVD was also uti- Potassium oxide 4.0–5.0
Calcium oxide 0.5–2.0
lized for encapsulation of drug particles by the formation of thin Iron(III) oxide 0.1–1.5
layer of functional polymers [25,26]. PECVD is advantageous over
other traditional wet coating techniques of particles such as sol–
gel and spin coating. The versatility of CVD and the inherent
plasma polymerization enables solvent-free, conformal, environ- Table 2
mentally friendly and safe depositions at low temperatures The typical physical properties of expanded perlite.
[27,28]. However, plasma-based techniques suffer from drawbacks The physical properties of expanded perlite
of loss of monomer functionality, excessive crosslinking, and other Color White
uncontrolled side reactions [29]. Recently it has been shown that Density 2.2–2.4 g/cm3
Heat conductivity 0.04–0.06 W/mK
pulsing the electric discharge can give rise to high levels of struc-
Melting point 1300 °C
tural retention [30]. Therefore, in this work, we have chosen to Specific heat 837 J/kgK
use pulsed plasma to deposit thin poly(hexafluorobutyl acrylate) Rough density 30–190 kg/m3
(PHFBA) film around expanded perlite particles. A comparison is
made between the surface chemistry of continuous wave plasma
and pulsed plasma PHFBA films. Besides, the use of an electrode-
less rotating-bed PECVD system allowed sufficient mixing of parti-
cles during the depositions, hence the entire surface of the each
expanded perlites is exposed to the reactant gases [31]. As-
received hydrophilic expanded perlite particles were loaded into
a rotary cylindrical reactor vessel for which an RF plasma source Fig. 1. The chemical structure of HFBA.
M. Gürsoy, M. Karaman / Chemical Engineering Journal 284 (2016) 343–350 345
the pressure inside the reactor. The rotation speed of the reactor Table 3
was adjusted at 30 rpm with a stepper motor. During all plasma The deposition rates of PHFBA at different plasma powers.
polymerization experiments, pressure in the vacuum chamber Plasma Deposition rate (continuous Deposition rate (pulsed-
was kept constant at 100 mTorr. The effects of plasma power and powers (W) wave) (nm/min) plasma) (nm/min)
plasma operation mode (either continuous or pulsed) on the final 10 41 42
properties of PHFBA surfaces were investigated. In all experiments 20 40 39
a silicon wafer (100, p-type) was also placed in the reactor for 30 27 28
40 22 23
thickness measurement and characterization purposes.
Fig. 4. C1s XPS spectra of PHFBA deposited onto silicone substrate: (a) 20 W continuous wave plasma polymer, (b) 20 W pulsed plasma polymer.
obtained ex-situ from profilometry measurements. The deposition Fig. 3 shows a comparison of FTIR spectrum of PHFBA deposited
rates of PHFBA at different conditions are given in Table 3. The fas- at different plasma modes (a, b) to that of HFBA monomer (c). The
ter deposition rates of PHFBA were obtained at the low plasma intensities of the peaks were normalized at 1758 cm1 (C@O
powers (10, 20 W) as compared to those deposited at higher stretching). The spectrum of the HFBA monomer can be identified
plasma powers (30, 40 W) for both continuous and pulsed modes. with the following major peak assignments: C@O stretching
On the other hand, in terms of plasma operation modes, the results (1758 cm1), C@C peak (1641 cm1), CAH bending (1500–
are very close at the same plasma powers. Usually, for plasma 1350 cm1), asymmetric ACF2A peak (1297 cm1), symmetric
polymerizations, increasing the plasma power results in higher ACF2A peak 1207 cm1), and ACFHACF3 peak (1114 cm1) [32–
deposition rates at sufficiently low energy inputs. However, as 34]. The spectra of PECVD synthesized polymers do not involve
the power is increased further, ablation caused by energetic glow peak related with C@C bond (1641 cm1) that exists only in the
discharge may compete with deposition, hence decreasing the monomer spectrum, which proves that the polymerization pro-
overall deposition rates. In our case, it can be assumed that abla- ceeded through unsaturated C@C double bonds. Spectral broaden-
tion or plasma etching is an important rate determining factor at ing was observed for the plasma polymer film deposited under
plasma powers of 30 and 40 W. The reported rate data here is continuous wave conditions (Fig. 3b) as a consequence of the
based on film thicknesses on reference silicon wafer because the extensive fragmentation and cross-linking reactions due to the
thickness of the PHFBA coating is difficult to determine directly high and continuous energy inputs supplied to reactor. At contin-
on the expanded perlite surfaces. It should also be kept in mind uous wave plasma conditions, more energy is delivered per chem-
that, coating thicknesses measured on reference silicon wafers ical species inside the reactor. For example, the appearance of a
are probably higher than the thicknesses on the perlite particles new absorption peak at 1845 cm1 in the spectrum of the films
due to the high surface area of the expanded perlite particles. deposited at high plasma powers is most probably due to co-
M. Gürsoy, M. Karaman / Chemical Engineering Journal 284 (2016) 343–350 347
Fig. 5. The SEM images of uncoated (a, c), and PHFBA coated (b, d) expanded perlite.
Fig. 6. Contact angle values at different plasma powers for continuous wave and Fig. 8. The water content value of PHFBA coated expanded perlite produced at
pulse conditions. different PECVD conditions.
M. Gürsoy, M. Karaman / Chemical Engineering Journal 284 (2016) 343–350 349
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This project was supported by the Scientific and Technological
CVD powder technology, Mater. Sci. Eng. R53 (2006) 1–72.
_
Research Council of Turkey (TÜBITAK) with a grant number of [32] D.O.H. Teare, C.G. Spanos, P. Ridley, E.J. Kinmond, V. Roucoules, J.P.S. Badyal,
213M399. The author M. Gürsoy was supported by TÜBITAK- _ Pulsed plasma deposition of super-hydrophobic nanospheres, Chem. Mater. 14
_
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