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Contents lists available at ScienceDirect

Applied Surface Science


journal homepage: www.elsevier.com/locate/apsusc

Effect of annealing upon the structure and adhesion properties of sputtered


bio-glass/titanium coatings
G.E. Stan a,*, C.O. Morosanu a,1, D.A. Marcov a, I. Pasuk a, F. Miculescu b, G. Reumont c
a
National Institute of Materials Physics, P.O. Box MG-7, Bucharest-Magurele, Ilfov 077125, Romania
b
Politehnica University of Bucharest, Faculty of Materials Science and Engineering, Bucharest, Romania
c
University of Lille, Laboratory of Metallurgy, Villeneuve d’Ascq, France

A R T I C L E I N F O A B S T R A C T

Article history: Bio-glass films were deposited by radio-frequency magnetron sputtering technique onto medical grade
Received 4 March 2009 Ti6Al7Nb alloy substrates from prepared silica based bio-glass target. A low deposition temperature was
Received in revised form 15 June 2009 used (150 8C) and three different working pressures, followed by annealing in air at 550 and 750 8C. A
Accepted 26 June 2009
quasi-stoichiometric target to substrate atomic transfer was found for Si, Ca and P, along with strong
Available online xxx
enrichment in Na and depletion in K and Mg, as evidenced by the energy dispersive microanalysis. The
best results, taking into account stoichiometry and surface roughness, were obtained for the BG layers
Keywords:
deposited at 0.3 Pa argon working pressure. The infrared spectroscopy of the as-sputtered and of the
Bio-glass coatings
annealed films evidenced the characteristic molecular vibrations of silicate, phosphate and carbonate
Magnetron sputtering
Adherence functional groups. The as-deposited films are amorphous and became partly crystalline after annealing
Pull-out test at 750 8C, as evidenced by X-ray diffraction. The pull-out measurements, performed with a certified pull-
Annealing test machine, gave very strong film–substrate adhesion strength values. For the non-crystalline layers,
Composition the pull-out strength is higher than 85 MPa, and decreases after annealing at 750 8C to 72.9  7.1 MPa.
Structure The main objective of this work was to establish the influence of the working pressure upon the composition
and morphology of the as-deposited films, and of the annealing temperature upon structure and film–
substrate adhesion.
ß 2009 Elsevier B.V. All rights reserved.

1. Introduction metallic substrates seems to be more difficult to accomplish in case


of the BG ones. There are very few papers referring to BG coating
The first bio-glass (BG), known as 45S5 Bioglass1, was reported deposited by magnetron sputtering [23]. It is widely accepted that
in 1969 [1–5]. After this, various kinds of bioactive glasses and both mechanical properties and chemical composition are
glass-ceramics with different characteristics have been developed important factors in the preliminary physiological bond of such
by melting and glazing methods. Some of them are already implants. Low mechanical properties are the major problem that
commercialized as valuable bone-repairing materials. The pre- prevented the use of BG/Ti structures for load-bearing applications.
requisite for glasses and glass-ceramics to bond to living bone is The purpose of the present work is to prepare adherent magnetron
the formation of bone-like apatite layer on their surfaces in the sputtered (MS) bio-glass films having a structure as much as
body. This takes place for a SiO2 content smaller than 60 wt%, similar with that of the bio-glass target.
high Na2O and CaO content and a high Ca/P ratio (between 1 and 5)
[1]. Unfortunately the coating of titanium substrates with thick BG 2. Materials and methods
films by enameling and plasma spray techniques, usually fail due
to a weak glass/metal interface and rapid dissolution in body fluids 2.1. Materials
when implanted [6–8]. That is why in recent years, chemical [9–
14] and laser [15–22] methods were also investigated in order to The magnetron sputtering target was prepared from a bioactive
prepare adherent micrometric thin films. In comparison with glass ceramic [1,2] powder with micrometric granular size. The glass
hydroxyapatite films the control of composition and adhesion to ceramic powder had the following composition (wt%): SiO2—55,
CaO—15, P2O5—10, K2O—10, MgO—5, Na2O—5. The starting reagents
were: SiO2, CaCO3, (NH4)2HPO4, K2CO3, MgO and NaHCO3. The
* Corresponding author. Tel.: +40 724131131; fax: +40 213690177.
mixture of the desired composition was mechanically homogenized
E-mail address: george_stan@infim.ro (G.E. Stan). and heat treated at 400 8C for 10 min. The heat-treated mixture was
1
Deceased. reground and then melted at 1300 8C for 30 min and under-cooled at

0169-4332/$ – see front matter ß 2009 Elsevier B.V. All rights reserved.
doi:10.1016/j.apsusc.2009.06.117

Please cite this article in press as: G.E. Stan, et al., Effect of annealing upon the structure and adhesion properties of sputtered bio-glass/
titanium coatings, Appl. Surf. Sci. (2009), doi:10.1016/j.apsusc.2009.06.117
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room temperature, and the resulted powder was cold-pressed in Table 1


Deposition pressure and film thickness.
order to obtain a 100-mm diameter MS target. Pieces of 100 mm2,
cut from a commercial 4 mm thick Ti6Al7Nb sheet, were used as Sample Ar pressure [Pa] Thickness [nm]
substrates. In order to estimate the films thickness by a method
BG-a 0.16 980
based on optical transmittance measurement, parallel depositions BG-b 0.22 810
were done on both titanium and Corning glass substrates. Prior to BG-c 0.30 750
deposition the substrates were ultrasonically cleaned successively
in acetone and ethanol for 10 min.
Post deposition, annealing in environmental air at 550 and analyses were performed with a PerkinElmer BX Spectrum
750 8C for 2 h with a low cooling rate (3 8C/min) was done, in order spectrometer, in attenuated total reflection mode (ATR) using a
to promote the crystallization of the films and hereby decrease Pike-MIRacle diamond head of 1.8 mm diameter. The spectra were
their dissolution rate in physiological fluids. A Nabertherm recorded in the range 4000–400 cm 1, with a resolution of 4 cm 1.
furnace—model L3/12/P320 was used. The structure was investigated by X-ray diffraction (XRD) using
a BRUKER D8 ADVANCE diffractometer, in parallel beam setting,
2.2. Deposition procedure with monochromatised Cu Ka1 incident radiation. In order to
enhance the signal coming from the film, the patterns were
The films were deposited by radio-frequency magnetron recorded in grazing incidence geometry at 28 incidence angle.
sputtering (1.78 MHz), in argon atmosphere. The target to The adhesion strength at the substrate–film interface was
substrate distance was set to 30 mm. The working chamber was measured by pull-test method, using a certified adhesion tester—
evacuated to a base pressure of 10 3 Pa, and then back-filled with PAThandy model (maximum pull force = 6.3 kN), equipped with a
high purity (99.9995%) argon at a 40-sccm flow rate. The target 2.8-mm diameter stainless steel test elements (stubs). The test
pre-sputtering was done for more than 30 min, under the same elements were glued onto the film’s surface by a cyanoacrylate
conditions as the deposition. Prior to deposition, the substrates one-component Epoxy adhesive, E1100S. The stub surface was first
were etched for 10 min at a 0.4-kV DC bias voltage in argon plasma polished, ultrasonically degreased in acetone and ethanol and then
produced by a wolfram plasmatron, in order to remove the thin dried in nitrogen flow. After gluing, the samples were placed in an
oxide layers and other impurities which might persist after the oven for thermal curing (130 8C/h). The pull force was smoothly
ultrasonic cleaning. The deposition pressure was varied by increased until fracture occurred.
modifying the diffusion pumping speed, and the influence upon
the films structure was studied. Three deposition pressures were 3. Results and discussions
used: 0.16 Pa (sample indicative—BG-a), 0.22 Pa (sample indica-
tive—BG-b), and 0.3 Pa (sample indicative—BG-c). The depositions The film’s thicknesses decrease as the working pressure
were carried out for 1 h, using a 1.78-MHz generator at a constant increases (Table 1). The decrease of the deposition rate with the
and low RF power (DCbias target value of 44 V) in order to avoid the Ar pressure is due to the shortening of the mean free path of the
overheating of the target surface. The substrates were not heated sputtered particles. Increasing the sputtering pressure, the
during deposition and their temperature (around 150 8C) was only sputtered particles suffer more collisions while traveling from
dependent on plasma self-heating. the target to substrate, and some of the sputtered particles are
back-scattered towards the target. This resulted in a decrease of
2.3. Characterizations the deposition rate due to scattering.
The EDS results reveal a quasi-stoichiometric transfer for Si, Ca
The layer thicknesses were estimated from optical spectroscopy and P, while the concentration strongly increases for Na, and
transmittance in the non-absorbance and low absorption region, decreases for K and Mg. One can notice a monotonous enrichment
by the Swanepoel procedure [24], using the films deposited on in Ca and P, and depletion in K, Na and Mg by increasing the
glass substrates. The transmittance measurements were per- working pressure (Table 2). The elemental percentages obtained by
formed using a PerkinElmer UV-VIS-NIR Lambda 90 spectro- EDS were converted in oxides in order to be compared with the
photometer in the wavelength range from 300 to 800 nm. target composition.
The influence of the deposition pressure upon the surface It is well known that the Ca/P molar ratio is of great interest for
morphology was investigated by scanning electron microscopy the biological reactivity of such structures. As proved by Hench’s
(SEM) using a FEI Quanta-FEG 400 microscope. studies [1–5], the bioactivity of a glass-ceramic is favored by a SiO2
In order to test the stoichiometry of the target to substrate content lower than 60 wt% and a Ca/P molar ratio lying between 1
transfer during the sputtering, chemical composition analysis was and 5. Thus, taking into account the overall composition of the
performed by energy dispersive microanalysis (EDS), with a films versus the working pressure (Table 2) we can conclude that
Princeton Gamma-Tech, Inc., attachment. The heat-treated BG the most promising layer was obtained at the highest working
films were examined for their surface morphology by environ- pressure (0.3 Pa). This is the main reason why we have investigated
mental scanning electron microscopy (ESEM), using a Philips XL30 in the followings the effect of various annealings only upon the BG-
unit, equipped with a Sapphire-UTW EDAX detector. c type films.
Fourier transform infrared spectroscopy (FTIR) was used for An additional reason in favor of the BG-c structure was the
analyzing the functional groups present in the bio-glass film. The observation that the surface morphology becomes rougher with

Table 2
Chemical composition in oxides and Ca/P molar ratios of the BG target powder and of the as-deposited films.

Sample Working pressure [Pa] SiO2 [wt%] CaO [wt%] P2O5 [wt%] K2O [wt%] Na2O [wt%] MgO [wt%] Ca/P molar ratio

Target – 55 15 10 10 5 5 1.89
BG-a 0.16 58.9 8.4 9.6 4.5 15.8 2.8 1.11
BG-b 0.22 58.3 10.5 11.6 2.6 14.4 2.6 1.13
BG-c 0.30 55.5 17.0 12.6 2.0 11.0 1.9 1.70

Please cite this article in press as: G.E. Stan, et al., Effect of annealing upon the structure and adhesion properties of sputtered bio-glass/
titanium coatings, Appl. Surf. Sci. (2009), doi:10.1016/j.apsusc.2009.06.117
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the increase of pressure, as it can be seen in Fig. 1. A rough surface


is preferred to a smooth one in implantology, in order to realize
primary stability. Moreover, the microcavities present on such a
surface could be rapidly colonized by sanguine cells that will
generate the growth of the new osseous tissue [25–27].
The BG-c film was analyzed by ESEM-EDAX, FTIR and XRD. In
Fig. 2, one can observe that the surface morphology of the film
annealed at 550 8C is similar to that of the as-deposited films,
showing a quite homogenous and defect free surface. This strongly
modifies after heat treatment at 750 8C, becoming smoother and
sprinkled with small prominent aggregates of 10–20 mm diameter,
which look in detailed view like agglomerates of small, needle-
shaped crystallites. EDAX investigations showed that these
particles are strongly enriched in titanium compared to the matrix
composition (Fig. 3), and the XRD analysis, presented later herein,
leads to the conclusion that these are rutile crystals. The oxidation
by annealing of the titanium substrate is probably due to the
microcracks and pores which presumably appear during heating
because of the mismatch of the thermal expansion coefficients of
the glass-ceramic layer and titanium substrate. Presumably, the
rutile crystals germinate in micropores and at 750 8C rapidly grow
up towards the more oxygenated layer surface. In Fig. 2, at 750 8C
one can see that besides these aggregates there are also many small
(micron sized), single or agglomerated, smooth-edged, light-
colored particles, which could be associated with the sodium
magnesium phosphate phase identified by XRD.
The FTIR spectra show a very similar absorption envelope for
the target and the BG-c film, as-deposited and annealed at 550 8C,
exhibiting the same broad bands at 912, 1000 and 1100 cm 1
(Fig. 4A). For the BG target, the maximum absorption peak is
shifted to 1026 cm 1. According to previous infrared studies on
silicate glasses the absorption peak at 1075 cm 1 has been
attributed to asymmetric stretch vibrations of Si–O in Q3
tetrahedral units, and the absorption at 950 and 900 cm 1 are
assigned to analogous vibrations of Q2 and Q1 units, respectively.
The peak at 1383 cm 1 might be assigned to a shifted (CO3)2
stretching band. Those from 560, 692 and 792 cm 1, could be
assigned to bending mode of PØP Q3, Q2, Q1 and Q0 units (550–
600 cm 1) and to symmetric stretching bands of PØP Q3, Q2 and Q1
units (650–800 cm 1), respectively. The spectra of the 750 8C
annealed film display also a clear 1100 cm 1 asymmetric stretch-
ing band characteristic to (PO3) present in Q1 units [28–33]. By
increasing the annealing temperature a sharp band at 670 cm 1
was evidenced, very weak at 550 8C and strong at 750 8C. This
might be assigned to TiO2, which has a strong vibration band in
700–660 cm 1 region [33]. At the same time, one can notice a
strong decrease of the overall intensity of the investigated
wavelength region of the IR spectrum reflected by the layer
annealed at 750 8C, compared to the spectra of the samples
annealed at lower temperatures. This can be correlated with the
presence of numerous surface inhomogeneities (crystallites,
possible peeling-off) evidenced by SEM and XRD investigations.
The uniformity of the films surface was tested by a point-to-
point FTIR measurement using a Pike-MIRacle diamond head of
1.8 mm diameter, starting from the central region of the sample. In
Fig. 4B–D one can notice the very good structural homogeneity of
the surface of the as-deposited and of the 550 8C annealed films. In
case of the 750 8C annealed films important differences of FTIR
intensity were obtained between point-to-point measurements,
showing that the particles evidenced by ESEM have a different
composition compared to the matrix.
Besides composition and molecular structure, the crystal Fig. 1. Evolution of surface morphology versus deposition pressure.
structure of the coating might also influence the behavior in
biological environment. A partial crystallization of the BG films is
preferred in order to reduce the dissolution rate in body fluids. A
total crystallization of the BG suppresses its bioactivity [34]. Fig. 5

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titanium coatings, Appl. Surf. Sci. (2009), doi:10.1016/j.apsusc.2009.06.117
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displays the XRD patterns of the BG-c films obtained in grazing


incidence geometry at 28 incidence angle, with the scattered
intensity measured between 208 and 658 (2u). This geometry
provides an incident X-ray path length in the layer about 5–15
times greater than that obtained in conventional (Bragg-Brentano)
measurement performed in the same scattering range.
As stated above, the actual thickness of the BG-c layer is about
750 nm. A simple attenuation calculus gives that in a layer of this
thickness having the chemical composition presented in Table 2,
and a hypothetical density of 3.5 g/cm3, the X-ray beam scattered
at 2u = 208 attenuates around 15%. This means that around 15% of
the total scattered intensity at this angle originates from the layer,
and 85% comes from the substrate. Therefore, despite the grazing
incidence, the most intensive peaks of the patterns presented in
Fig. 5 are the titanium peaks of the substrate. The intensity scales of
the graphical representations are chosen so that to emphasis the
lower intensity lines that arise without any doubt from the layer
structure.
The structure of the as-deposited film is amorphous at the
sensitivity limit of the measurement. The amorphous component
is probably based on amorphous silica, as it can be deduced from
the main hump centered on 2u  228. After heat treatment at
550 8C, several weak TiO2-rutile lines appear, whose intensity
increases by annealing at 750 8C. During heat treatment at 750 8C,
crystallization occurs in the layer, but the amorphous component
only slightly diminishes. The few rather intensive peaks which
appear, were assigned to: Na2Mg(PO3)4—ICDD: 22-477 [35] and
TiO2-rutile. There are also several weak lines that might be
associated with small percents of perovskite (CaTiO3) and oxygen
deficient titanium oxides (Ti2O and TiO).
The formation of calcium titanate and, at least partly, of
titanium oxides in the heat-treated samples, is due to the inter-
diffusion at the film–substrate interface. The presence of
perovskite in heat-treated hydroxyapatite films deposited onto
titanium had already been observed by many authors [36–41].
The integrity of the substrate/coating interface is always
concerned in determining the performance and the reliability of
any implant-type coating. The mechanical quality of the interface
can be evaluated by pull-out strength measurements.
The pull test was performed on the BG-c film with the test
elements fixed on different places of the film surface. A statistical
estimation was performed based on the average of ten adhesion
values on every surface. There were investigated the as-deposited
structures as well as the annealed ones. In case of the as-deposited
and 550 8C annealed structures the failure always occurred in
glue’s volume without damaging the film integrity at an average
value of 85 MPa. This represents the bonding limit of the resin, as
confirmed by the manufacturer. For the structures annealed at
Fig. 2. Evolution of surface morphology (ESEM-secondary electrons) versus
750 8C the adherence was estimated at 72.9  7.1 MPa, the film
annealing temperature. being ruined each time. However, the measured film–substrate

Fig. 3. Detailed view of a crystalline aggregate on the sample heat treated at 750 8C, and EDS results obtained on the particle and on the film matrix.

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titanium coatings, Appl. Surf. Sci. (2009), doi:10.1016/j.apsusc.2009.06.117
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Fig. 4. (A) Comparative spectra for the powder and studied films; (B–D) uniformity of FTIR results in the central region of the BG films (B—as-deposited, C—annealed at 550 8C,
and D—annealed at 750 8C).

adhesion values are much higher than those reported in literature


[6,23,42].
These high values of pull-out strength for the as-deposited
coatings, and those annealed at 550 8C, could be attributed to the
sputter cleaning and ion bombarding processes of the substrate,
done before deposition [43]. As it is known, the poor adhesion of
the coatings could be ascribed to the natural oxide layers present
on the titanium alloy surface prior deposition. Previous works
[44,45] suggested that an optimal solution for removing these
contaminants in order to increase the adherence is an argon
plasma etching pre-treatment of the titanium substrates. The
sputter cleaning process largely removes not only the native oxide
layers, but also the adsorbed gas molecules, to produce a clean,
highly active surface [46]. The argon ion bombarding process
during sputtering might enhance the atomic diffusion and mixing
in the near-interface region. The etching process has been
optimized by tuning plasma power (200 W), surface DC bias
(0.4 kV) and etching time (10 min), based on own experience and
literature [47]. The sputtering time offers a maximum of the
Fig. 5. XRD patterns of the BG-c film; & = Ti, ^ = Na2Mg(PO3)4, ~ = TiO2-rutile, adhesion properties after 10 min, as a result of the removal of
* = CaTiO3. surface oxides and contaminants, which leads to good bonding at

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titanium coatings, Appl. Surf. Sci. (2009), doi:10.1016/j.apsusc.2009.06.117
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Please cite this article in press as: G.E. Stan, et al., Effect of annealing upon the structure and adhesion properties of sputtered bio-glass/
titanium coatings, Appl. Surf. Sci. (2009), doi:10.1016/j.apsusc.2009.06.117
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Please cite this article in press as: G.E. Stan, et al., Effect of annealing upon the structure and adhesion properties of sputtered bio-glass/
titanium coatings, Appl. Surf. Sci. (2009), doi:10.1016/j.apsusc.2009.06.117

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