TECHNICAL/EXECUTIVE REPORT : CHEMICAL ENGINEERING

CHE239 – Process Control and

Lab No. : 1 Subject : Instrumentation

Experiment PC Experiment – Pressure, Temperature,

Mark :
Title : Flow and Level
Date: 3/1/2017
100
Participant Course : CHE239 Semester : 4 Group: EH1104C
*Please cancel which
Signatur
is not necessary. No. Name Matrix No.
e
201585477
1 Nur Farahana bt Hizamnuddin
6
201585190
2 Nur Sabrina bt Nazaruddin
2
201586123
3 Nurul Najihah bt Fadzin
8
201586338
4 Noor Izzah Nadhirah bt Muhamad Zahidi
6
201585717
5 Fatin Natasha bt Nazri
8
Instructor
1.

2.

Objective :
Temperature Process Control System :
1. Understand how temperature process control system works.
2. Study the method of setting PID parameter to achieve the optimum stability.
3. Study the method of setting PID controller to achieve the optimum recovery.

Flow Process Control System :

1. Study the method of setting PID parameter to achieve the optimum stability.
2. Understand how flow process control system works.
3. Study the method of setting PID controller to achieve the optimum recovery.

Level Process Control System :

1. Understands how level process control system works.
2. Study the method of setting PID parameter to achieve the optimum stability.
3. the method of setting PID controller to achieve the optimum recovery.
 Pressure Process Control System :
1. Understands how pressure process control system works.
2. Study the method of setting PID parameter to achieve the optimum stability.
3. The method of setting PID controller to achieve the optimum recovery.

Abstract :

The objectives for the simulation are mainly for obtaining the fundamental concept of
process control system and to perform set point step test and load disturbance test to
observes and determine the P, I and D behavior towards the process response curves.
For the flow process control, the experiment starts by setting the set value to 25m 3/hr
and wait for the manipulated variables and process variables stable. Then, increase the
value of manipulated variables by 10% and wait until the process variable stables.
Using the P controller, set the gain value of 0.5, 1.33, 4.3 . For the PI controller, set the
gain value of 0.5, 3.3, 2.0 and for the PID controller, we set the gain value of 3.0, 2.4,
1.0 with the rate of 2.5, 2.5, 0.4. As for level process, we begin by setting the setpoint
value to 1000mm and wait for manipulated and process variables to stable. Then,
increase the value of manipulated variables by 10% and wait until the process variable
stables. Using the P controller, set the gain value of 0.5, 4.51, 6.26 . For the PI
controller, set the gain value of 5.44, 5.44, 4.25 and for the PID controller, we set the
gain value of 4.25, 4.25, 2.45 with the rate of 0.5, 18.04, 0.5. Next, for the pressure
process control system, the experiment starts by setting the set value to 250 bar and
wait for the manipulated variables and process variables stable. Then, increase the
value of manipulated variables by 10% and wait until the process variable stables.
Using the P controller, set the gain value of 0.5, 1.07, 3.15. For the PI controller, set the
gain value of 0.72, 0.8, 2.5 and for the PID controller, we set the gain value of 0.8, 1.27,
5.45 with the rate of 0.67, 6.6, 2.15. Lastly, for the temperature process control
system, the experiment starts by setting the set value to 80 0C and wait for the
manipulated variables and process variables stable. Then, increase the value of
manipulated variables by 10% and wait until the process variable stables. Using the P
controller, set the gain value of 0.5, 1.34, 3.33. For the PI controller, set the gain value
of 1.0, 43.0, 0.91 and for the PID controller, we set the gain value of 1.60, 15.32, 1.00
with the rate of 30.31, 14.0, 9.44. For all of the process control system, every time
change the gain value, the manipulated have to be increased around 10% and wait for
 few seconds until the process variable is stable. Then , we observe and write down the
respond

The main objective of this laboratory is to get a basic

Introduction:
understanding for how feedback control can be used to modify the
behavior of a dynamic system. In particular, we will consider PID-
control of a simple process consisting of two water tanks. The
letters PID here stand for Proportional, Integral and Derivative
control, respectively. PID controllers are by far the most common
type of controllers used in industrial systems, mainly because they
are relatively simple and still often able to provide good
performance. The laboratory experiments will hopefully confirm
this.
In addition to establish an understanding for the fundamental
principles of feedback control, the laboratory will provide some
experience of manually tuning PID-controllers.
Process control systems provide precise control of liquids and
gases in a wide variety of industrial applications including power
generation, petrochemicals, food processing, and manufacturing.
These systems control liquid and gas variables such as flow rate,
pressure, temperature, liquid level, density, and pH. The T5552
Level and Flow Process Control training system teaches two of the
most common types of process control systems, flow and liquid
level, and the basic concepts on which other systems are based.
Students will learn to calibrate, adjust, install, operate, and
connect process control systems in industrial applications.

The process control simulator includes a bench-top workstation,

process control network, control panel, student learning materials
for both theory and lab, and teacher’s guide. The workstation is
constructed of heavy-duty, welded steel. Industrial quality
components are mounted and plumbed in a closed loop circuit to
control the water flow between two tanks or the liquid level in one
tank. All components are connected to banana jacks on the control
panel to allow students to measure signals and connect the
devices in a wide variety of control configurations.

This training system offers 3 types of controllers: relay control, the

standard, and two options: PID controller and PLC control. This
allows students to study a wide range of process control methods.
The relay control includes manual input switches, control relays,
solenoid valves, and float switches to perform automatic on/off
liquid level control. The PID controller option enables variable
electronic control of either liquid level or flow and the PLC
controller option enables both on/off and PID control of the
 system. Manual valves are used to switch between the PID and
on/off control methods.

The process control training simulator offers a wide variety of

transducers and control valves, enabling students to study a full
range of process instrumentation technology. Optional transducers
and valves can be quickly interchanged with the standard ones via
hand-tightened pipe unions and plug-in electrical connections.

Data/Results FLOW PROCESS CONTROL SYSTEM

/Calculation:
P CONTROLLER:

GAIN RESET RATE RESPOND

0.5 0.0 0.0 Undershoot and
overshoot, stable
1.33 0.0 0.0 Undershoot, stable
4.33 0.0 0.0 Oscillate vigorously,
unstable

PI CONTROLLER:

GAIN RESET RATE RESPOND

0.5 1.66 0.0 Unstable oscillation
3.3 1.66 0.0 Unstable oscillation
2.0 1.43 0.0 Unstable oscillation

PID CONTROLLER:

GAIN RESET RATE RESPOND

3.0 2.0 2.5 Fast response,unstable
2.4 2.0 2.5 Fast response,unstable
1.0 1.43 0.4 Slow response,unstable

PRESSURE PROCESS CONTROL SYSTEM

P CONTROLLER:

GAIN RESET RATE RESPOND

0.5 0.0 0.0 Undershoot and
overshoot, damping
1.07 0.0 0.0 Oscillate, damping
3.15 0.0 0.0 Unstable oscillation

PI CONTROLLER:

GAIN RESET RATE RESPOND

0.72 2.28 0.0 No oscillation
0.80 3.0 0.0 No oscillation
 2.5 0.79 0.0 Sluggish oscillation

PID CONTROLLER:

GAIN RESET RATE RESPOND

0.8 3.0 0.67 No oscillation
1.27 4.0 6.6 Sluggish,unstable
oscillation
5.45 3.62 2.15 Sluggish,unstable
oscillation

TEMPERATURE PROCESS CONTROL SYSTEM

P CONTROLLER:

GAIN RESET RATE RESPOND

0.5 0.0 0.0 Stable oscillatory
1.34 0.0 0.0 Stable oscillatory
3.33 0.0 0.0 Stable oscillatory

PI CONTROLLER:

GAIN RESET RATE RESPOND

1.0 32.54 0.0 Match the set point and
stable
43.0 5.0 0.0 Continuous oscillatory
0.91 92.40 0.0 Match set point slowly

PID CONTROLLER:

GAIN RESET RATE RESPOND

1.60 51.06 30.31 Unstable oscillatory
15.32 9.45 14.0 Continuous oscillatory
1.00 43.0 9.44 Match set point slowly

LEVEL PROCESS CONTROL SYSTEM

P CONTROLLER:

GAIN RESET RATE RESPOND

0.5 0.0 0.0 Slower respond
4.51 0.0 0.0 Fast respond
6.26 0.0 0.0 Fastest respond

PI CONTROLLER:
 GAIN RESET RATE RESPOND
5.44 3.3 0.0 Slow-oscillatory
respond
5.44 2.7 0.0 Fast-oscillatory respond
4.25 9.5 0.0 Medium-non-oscillatory
respond

PID CONTROLLER:

GAIN RESET RATE RESPOND

4.25 9.5 0.5 Unstable-oscillatory
4.25 9.5 18.04 Unstable-oscillatory
2.45 9.5 0.5 Fast-non-oscillatory
 Pressure, P

Discussion:

Pressure, PI

Pressure, PID
Temperature, P

Temperature, PI
Flow, P

Flow, PI

Flow, PID
Conclusion: In this experiment, we learned to control a pressure, level, flow, temperature loop
using three different control modes: P, PI, and On-off. We experimented with the
trial and error method of tuning a controller and developed a feel for the behavior of
the control schemes for various values of the control parameters. The next exercise
will cover a different method of optimizing a PID controller and will allow us to test
our control skills on a flow process.

1. http://fluidic-ltd.co.uk/
References:
2. https://www.labvolt.com/solutions/1_mechatronics/98-3531-
00_pressure_flow_level_and_temperature_process_training_systems

3. http://www.wikipedia.com

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Submission
 Allocated Marks for Technical/Executive report

Criteria Full Marks

Abstract 10
Objective 10
Data/Results/Calculation 20
Discussion 30
Conclusion 10
References 10
Overall structure/organization and Quality 10
TOTAL 100

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