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    4 visualizzazioni16 pagine

    Nanolitografia - Parte 1 PDF

    Caricato da

    Jorge De Jesus Torres Reyes

    Copyright:

    © All Rights Reserved
    Scarica in formato PDF o leggi online su Scribd
    Segnala contenuti inappropriati
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    5 Status of UV Imprint Lithography for Nanoscale Manufacturing J Choi, P Schumaker, 1d F Xu, Molecular Imprints, Inc., Austin, TX, USA. SV Sreenivasan, Molecular Imprints, Inc., Austin, TX, USA, University of Texas at Austin, Austin, TX, USA © 2010 Elsevier B.V. Allrights reserved. 5.1. Introduction The ability to pattesn materials atthe nanoscale over large areas is known to be valuable in a variety of applications [1], In photonics applications, patterning materials with a resolution of about one-tenth of the wavelength of light can lead to photonic erystals for high-brightness (IIB) light-emitting diodes (LEDs) for solid-state lighting applications (Figure 1) (2). In mag- netic storage, patterning magnetic materials in the sub- 20m regime (see Figure 2) [3] is expected to extend the areal density growth in hard-disk drives to well above a terabit per square inch. In complimentary metal oxide silicon (CMOS) integrated circuit (IC) fabrication, devices are being fabricated today at about S0.nm hall-pitch resolution. For CMOS memory end logic devices, the patterning roadmap extends well below 1Snm halfpitch as published in the 2007 Intemational Technology Roadmap —_ for Semiconductors [4]. An example of a sub-40.nm mem- ory gate pattem using ultraviolet (UV) imprint lithography is shown in Figure 3 [5]. In the area of nanoelectronics, recent literature in nanowire molec lar memory indicates that ultra-high-density memory can be fabricated using patterning 2¢ the sub-20nm scale (6). Finally, novel biomedical application of nano- patterning are being reported, including a recent study that created nanoparticles of controlled size and shape for targeted drug delivery using UV nanoimprint litho- raphy [7], Figure 4 shows pillar structures fabricated directly in a biomaterial using UV nanoimprin: ltho- graphy. ‘These pillar structures are harvested as monodispersed nanoparticles using a lift-off process. All the above applications require cost-effective nano- patterning with long-range order over large areas. A more detailed discussion of their nanomanufacturing. requirements is provided in the next section 5.1.1 Nanoscale Manufacturing Requirements It is desirable to have a general purpose nanopattern- ing approach that can manufacture a variety of nanoscale devices such as those discussed above since the research and development of such an approach can benefit from the collective efforts of researchers in the various device areas. While several nanofabrication techniques are reported in the litera- ture, only a small percentage of them have the potential to be visble in volume manufacturing since manufacturing viability requires that the pat terning approach have the following actributes: © Long-range order in nanostructures: this includes control of size of patterns and the location of the patterns with respect to an ideal grid. For example, in applications such as patterned media and CMOS devices, itis desirable that the nanoscale features have size control that is ~10% of the feature size over large areas (10-100 em’), Similarly, if the placement of the pattern is distorted significantly from an ideal grid, it can affect read-write head dynamics in patterned media and overlay of rnultple lithography layers in CMOS ICs © Patterning of arbitrary structures with varying pattern densities: a general-purpose lithography approach should be able to print varying types of features with varying pattern densities, For exam= ple, the photonic crystal structure shown in Figure 1 is very difficult to pattern using photon- based techniques when the wavelength of the source is substantially larger than the minimum feature size. Also, varying pattern densities are, in general, required for applications such as CMOS. logic circuits (Figure 5) and patterned media (Figure 6) (8 © Suited for fabricating highly integrated (multi- ties) devices: many nanoscale devices, including electronic circuits and thin film heads for hard-disk applications, require fabrication of multilayered stcuctures with nanoscale overlay. The overlay requirement is typically from one-half to one-fourth of the minimum feacure size © Low process defectivity to achieve high overall product yield: itis important to ensure that the defect requirements of nanoscale devices are well 149 150_Status of UV Imprint Lithography for Nanoscale Manufacturing jure 1 Arepresentative application of nanopatterning in photonics isthe use of photonic crystals for improved light ‘extraction and control of directionality in HB LEDs. The figure on the right shows sub-100"m dense photonic crystals arranged in complex patterns (2) Figure 2 Sub-20nm patteming of a hard-

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