S P E C T R O S C O P Y

Model U-4100
UV-Visible-NIR
Spectrophotometer
The Pinnacle of Hitachi’s Success in Spectrophotometer
Implementation — — system
system configurable
configurable to
to meet specific analytical demand.

The needs for evaluation and Polarization Characteristics Accurate Measurement

quality control of optical Accurately Measurable Achievable Free from Stepping
materials such as glass, lens due to Detector Switching
and prism are increasingly Exact determination of polarization charac-
diversified due to shortening teristics is very important for optical parts This absorption spectrum is free from a step-
of exposure wavelength in manufacturing technologies. This chart ping due to detector switching inevitable in
etching process in parallel shows the reflection characteristics of the S a spectrophotometer whose measuring
with the advance of semiconductor integra- and P-polarized light waves on a reflecting wavelength spans the visible region and near
tion, enlargement of liquid crystal display, mirror for micro-lithographic equipment. infrared region.
etc.. To meet such needs, the Model U-4100
can be offered in various system configura- Detector
tions as represented by the combination of Rs switching wavelength 850 nm

a high-sensitivity integrating sphere, which

ensures an accurate measurement within a Rp

broad wavelength range from ultra-violet to

near infrared, and an ultra-large sample com-
partment which allows a nondestructive mea-
surement of large samples.

Features
1 Highly accurate measurement is ensured up to 175 nm with a
high-sensitivity integrating sphere.
Short-Wavelength Region up to 190 nm Measurable
with Integrating Sphere
Suitable for the measurement in short-wavelength region, which is under growing demand.
2 A large-size sample compartment enables the spectrophotome-
ter to measure large samples (max. 430 × 430 mm) in a nonde-
structive way.
Standard integrating sphere High-sensitivity integrating sphere

The newest user interface is equipped to present a comfortable

3 operating environment.
Report generator (available at option) is usable for generating
4 reports in formats unique to each user.
A rich variety of optional accessories are available to meet a
5 particular purpose of analysis.

1 2
 Software is Designed for Responding Flexibly to any Flow of Analysis to
Ensure a Friendly Operating Environment.
Basic operational flow — Example of waveleng th scan —

Analytical Sample/ Baseline Start of Results of mea-

method comment measure- measure- surement saved Data processing
setting input ment ment automatically

Analysis method setting Data processing window Examples of data processing

Data processing functions such as area calculation
and spectral calculation are incorporated.

Measu rement Area calculation

Initial window
Wavelength scan

A peak table can be displayed on the same window. Spectral arithmetic

Time series measurement

The result of rate calculation can be displayed on the same window.

Measure-
ment

Photometric measurement

3 4
 Report Generation is Supportable. Reports Can be Generated as Desired.
Report Generator (option: P/N 134-0322 *Microsoft® Excel is needed.)

DDE (Dynamic Data Exchange) Report output of measurement result can be customized freely.
Not only are reported items, size/position of comment characters/graph, etc. settable,
but the conventionall manual calculations can be automated by using the spreadsheet
function.
In addition, report formats (templates) can be easily edited and saved to allow selec-
tion according to the analytical purpose.
After measurement, the report can be automatically printed in the specified format.

Features
1 The position and size of a graph are
freely specifiable.
Template editing is easy.
Multiple templates can be saved and
2 optimum one can be singled out accord-
Measurement result data can be exported to the spreadsheet program Microsoft® Excel just by clicking the mouse.
ing to the purpose of analysis.
OLE (Object Linkage Embedding) For output in the specified format, the
3 entire process from measurement to
printout can be automated.
Report can be saved in a file.
Reediting is acceptable. Using a saved
4 file, generation of a table/graph and
recalculation can be carried out.

User selects the Report tab and

After copying spectral data to such commercial software as Microsoft® Word, the scale, ruled line, line type, color, etc. are enters “MS Excel Sheet” for Print
changeable on that software. Method.
Print Preview Function

Report is now printed.

Output is saved as a report file.
Before printout, reediting such as recal-
culation is acceptable.

You can check in an image how the data will be printed.

Spectrum display color, type of line, character font/size and printing direction (vertical or horizontal) can be selected.

5 6
 Optimum System Configurable for Routine Samples and Analytical Purpose.

Sample System configuration and part No.

compartment Part No. Voltage Part name Configuration
134-0003 100, 115 Model U-4100 Solid sample
Large-size or standard Detector 134-0004 220, 230, 240 spectrophotometer measurement system

High sensitivity 134-0007 100,115 Model U-4100 Large sample

134-0008 220, 230, 240 spectrophotometer measurement system
integrating sphere
or 134-0012 100, 115 Model U-4100 Ultraviolet region
134-0013 220, 230, 240 spectrophotometer measurement system
standard integrating
sphere Model U-4100 Liquid sample
134-0017 100, 115 Spectrophotometer measurement system
or (U-4100L)
direct incidence Model U-4100 Liquid sample
134-0018 220, 230, 240 Spectrophotometer measurement system
(U-4100L)

Monochromator
Prism-Grating
or
Grating-Grating Sample
Solid
or
liquid (U-4100L)

Solid sample measurement system Large sample measurement system Ultraviolet region sample measurement Liquid sample measurement system
Sample compartment for the liquid sample measurement
Most suited for transmittance/reflectance measurement of Transmittance and reflectance of large glass plate, silicon system has been optimized, and 10mm rectangular cell has been
solid samples. In combination with a rich variety of option- wafer, liquid crystal plate and many other optics/electronics A high-sensitivity integrating sphere ensures low-noise mea- standard equipped.
al accessories such as specular reflectance accessory, the materials can be measured in a nondestructive way. surement within a broad wavelength range from 175 nm to By the photometric system of a direct incidence to the
configuration of this system can be optimized for a particu- near infrared region. This system is suitable for transmit- detector, absorption and transmittance measurement for a
System configuration
lar purpose of measurement. tance/reflectance measurement of the optical parts to be various sample are possible with a wide wavelength range
Monochromator Prism-grating
System configuration used in the ultraviolet region such as excimer laser equip- and a wide dynamic range.
Sample compartment Large size ment parts.
Monochromator Prism-grating System configuration
Detector Standard integrating sphere
Sample compartment Standard System configuration Monochromator Prism-grating
Measuring wavelength range 240 to 2,600 nm
Detector Standard integrating sphere Monochromator Grating-grating Sample compartment 10 mm rectangular cell holder
Sample size Max. 430 × 430 mm
Measuring wavelength range 240 to 2,600 nm Sample compartment Standard Detector Photomultiplier (UV-Vis)
Sample size Max. 200 × 200 mm Detector High-sensitivity integrating sphere Cooled Pbs (NIR)
Measuring wavelength range 175 to 2,600 nm Measuring wavelength range 180 to 3,300 nm
Sample size Max. 200 × 200 mm Sample size 10 mm rectangular cell

Note: Once each system above is delivered, it cannot be modified into another
system.
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 A Complete
A Complete Provision
Provision of
of Op
Optional
tional Accessories
Accessories Selectable
Selectable
for More
for More Sophisti
Sophisticated
cated Application.
Application.
● Reflectance measurement ● Transmittance measurement
5° specular reflectance accessory Vertical 5° specular reflectance Variable angle absolute Glass filter holder 134-0207 Rectangular cell holder 134-0209 Film holder 134-0208
(relative) 134-0100 accessory (relative) 134-0101 reflectance accessory (10° to 60°)
134-0116 Used for transmittance/absorbance mea- Mounts a 10 mm rectangular cell for mea- Convenient for measurement of film-
5° specular reflectance accessory surement of such a solid sheet sample as suring the transmittance/absorbance of a shaped samples.
134-0102 a glass filter. liquid sample.
Variable angle absolute ■ Specifications
12° specular reflectance accessory ■ Specifications ■ Specifications Film frame Width 25 mm, height 30 to 55 mm
134-0104 Diameter
reflectance accessory (15° to 65°)
Sample thickness 0.5 to 5 mm Beam aperture Width 10 mm, height 20 mm
Sample size
25 to 60 mm 134-0117 12 × 12 mm to 55 × 100 mm
30° specular reflectance accessory Sample size
Measuring
134-0105 wavelength 240 to 2,600 nm Absolute reflectance of a sample is mea-
45° specular reflectance accessory range sured by the V-N method with the mirror
134-0106 relocated to the specified position. Option package 134-0321
Polarizer holder (holder alone) Top-mount transmittance ■ Specifications 780 780 5 Spectrum Correction Program
/reflectance measurement unit Color Analysis ΣDλ · Vλ · τ (λ) ΣDλ · Vλ · ρ (λ)
132-0325 Incident angle 134-0116: 10° to 60° (10°-step)
A photometric value at each wavelength is multi-
134-0107 134-0117: 15° to 65° (10°-step) To define a color of light or any object, it is helpful τv = 380 ρv = 380 plied by correction coefficient Ro (λ), and the
Sample size 8 × 8 to 90 × 100 mm to provide conventions concerning light sources, 780 780
Used for measuring the absolute ΣDλ · Vλ ΣDλ · Vλ result of multiplication is displayed and recorded
reflectance of a sample by the V-N method Wavelength range 240 to 2,600 nm objects and eyes. CIE standard illuminants for mea-
Top-mount transmittance 380 380 in graph. A correction count value can be speci-
surement is specified in JIS Z 8720, and CIE 1931
in order to determine the reflection char- /reflectance measurement unit standard colormetric system is specified in JIS Z Dλ: Spectral distribution of standard illuminant D65
fied arbitrarily by the user. This program is partic-
acteristics of metal film and glass surface ø60 full-sphere integrating Vλ: Spectral luminous efficiency of CIE light
ularly useful for absolute reflectance spectral mea-
with respect to incident angle, for exam- 134-0108 8701. The color analysis program is designed for
surement.
sphere accessory 134-0205 diffuse reflectance measurement of a solid sample adaptation.
R (λ) = r (λ) · Ro (λ)
ple. The 30° and 45° specular reflectance Optical path is switched so that the trans- surface, making it possible to carry out high-accura-
accessories must always be used in combi- R (λ): Corrected data
mittance and reflectance of a large sam- Transmittance of a solid/liquid sample is cy color measurement analysis. Its measurement 2 Solar Radiation Transmittance r (λ): Measured data (%)
nation with a polarizer. Sample is to be ple are measurable. accurately measurable. Effective particu- method conforms to JIS Z 8722.
(Reflectance) Measurement Ro(λ): Correction coefficient data
mounted on the side face. larly for measurement of diffuse transmit- A photometric value ranging from 780 to 380 nm is
■ Specifications tance. taken in, and calculations are performed on tristim- Program
Incident angle 134-0107:Transmittance··· 0° ulus values (X, Y, Z), psychometric lightness values As for the radiant flux of the solar radiation inci- 6 Correction Coefficient Input
Reflectance··· 5° (relative) ■ Specifications (L*, L), psychometric chromaticness indices (a*, b*, dent on sheet glass, the transmitted radiant flux Program
134-0108:Transmittance··· 0° Wavelength range 240 to 2,600 nm a, b), and chromaticity coordinates (x, y). (reflected radiant flux) is measured, and solar radi- This program is designed for input of correction
Reflectance··· 12° (absolute) 100%T line flatness ±0.5%T (340 to 2,000 nm) With input of tristimulus values (X, Y, Z) of a stan- ation transmittance τe and solar radiation coefficient data. Up to 500 points can be speci-
Sample size 50 × 50 to 300 × 300 mm ±2.0%T (other wavelengths) dard sample, color difference is performed (∆Eab, reflectance ρe are automatically calculated. fied.
Wavelength range 240 × 2,600 nm ∆E*uv, ∆E*ab). 2100 2100
■ Specifications τe = Σ Eλ·∆λ·τ(λ) ρe = Σ Eλ·∆λ·ρ (λ)
Relative reflectance measurement:
In addition, holders for a variety of samples (such as photo High-sensitivity integrating 300 300 7 Film Thickness Calculation
mask) are available. 1 Color calculation
Sample size Diameter 25 to 50 mm sphere accessory 134-0206 Standard Illuminant
Tristimulus values τ (λ): Spectral transmittance (measured value) Program
Absolute reflectance measurement: A X, Y, Z ρ (λ): Spectral reflectance (measured value) In use with the reflectance accessory, this pro-
25 × 25 mm to 100 × 150 mm Variable angle absolute An integrating sphere having a high sensi- Chromaticity
E λ: Standard spectral distribution of directly
coordinates (x,y) gram allows the following measurements:
Wavelength range 240 to 2,600 nm ● A thickness of a filmy object is calculated
reflectance accessory 134-0115 tivity in the ultraviolet region. Effective
2° visual field B
L*, a*, b* color
specification values
irradiated relative solar radiation value
for evaluating the transmittance/ L*, u*, v* color according to the measured interference spec-
specification values
Prism measurement unit Absolute reflectance and transmittance reflectance of an excimer laser equipment Reflectance correction 3 Sum-of-Products Calculation trum. The results of calculation are displayed
are measurable at a desired angle with part or like optical component to be used 10° visual field C Dominant wavelength: on the CRT monitor and output onto the print-
134-0110 HVC yellow Index Program er for recording.
the detector (full-sphere integrating in the ultraviolet region. 2 Color difference
sphere) and sample stage rotating inde- calculation
The above-mentioned visible light transmittance ● Photometric values of measured interference
Used for measuring the transmittance and D65
reflectance of various prisms at incident pendently of each other. ■ Specifications ∆E, ab
∆E, uv
(reflectance) and solar radiation transmittance spectral peaks and valleys can be printed out
∆E, ab
(reflectance) conform to JIS R 3106. This program is automatically.
Wavelength range 190 to 2,600 nm
angle 45°. ■ Specifications formulated as a general form for calculation of these ● A difference between standard film thickness
Detector Full sphere
values. For each wavelength, a measured value is
■ Specifications Incident angle 20° to 60° (with R955 photomultiplier) Application Measurement multiplied by coefficient τ (λ), and a total sum value
and measured film thickness is calculated, and
the resultant data can be displayed on the CRT
Incident angle 45° Flat plate: 30 × 30 to 40 × 140 mm 100%T line flatness ±0.5%T (195 to 850 nm)
is determined for normalization. A weight factor
Sample size
Prism: Max. 85 mm cube ±2.0%T (190 to 195 nm) Conforming to the test method for sheet glass monitor and output onto the printer for record-
Sample size 16 mm to 60 mm cube α(λ), wavelength range, and normalization factor ing.
Wavelength range 300 to 2,000 nm transmittance and reflectance, specified in the JIS
Measurement point Center can be set up arbitrarily in use of this program. N–1 1
(Japanese Industrial Standards). × —--—--— × 10—3
Wavelength range 240 to 2,600 nm Large lens measurement unit λ2 d = ———————
2√ n2 — sin2θ 1 1
Variable angle reflectance 134-0203 Σα (λ) · τ (λ) —–—
1 Visible Transmittance (Reflectance) λ 1 λ2 λ1 λ2
Small prism measurement unit accessory (relative) 134-0118 S= 1 = — Σαλ · τ (λ) d : Film thickness (µm)
Used for measuring the transmittance of a Measurement Program λ2 K λ1
134-0111 ... Value to be calculated
Using mirror reflection of a sample, rela- large lens with a V-bench. Spectral transmittance τv and spectral reflectance Σα (λ) λ2
N : Number of interference peaks
ρv of sheet glass are measured in the visible wave- λ1 Where, K = Σα (λ)
Used for measuring the transmittance and tive reflectance is measured with respect ■ Specifications length range. Using these measured values, visible λ1
... Counted automatically
reflectance of small prisms. to the standard reflection plate (alu- light transmittance τv and visible light reflectance ρv
n : Reflection factor ... Manually entered value
minum-evaporated mirror). Sample size
ø50 to ø200 mm 4 Weight Factor Input Program θ : Angle of incidence ... Manually entered value
based on relative luminous efficiency of CIE light
■ Specifications length 300 mm max.
With this program, a correction value (weight fac- λ1: First peak wavelength in spectrum (nm)
Incident angle 45°
■ Specifications adaptation are automatically calculated with respect
tor) for each wavelength interval ∆λ can be input λ2: Last peak wavelength in spectrum (nm)
to the standard light D65 specified by CIE.
5 to 6 mm cube Incident angle 20° to 60° (CIE: Commission International ale de r’Eclairage) in a wavelength range of λ1 to λ2. Using the input
Sample size Sample size 25 × 25 to 50 × 100 mm values, the sum-of-products program is carried
7 to 20 mm cube
Wavelength range 240 to 2,600 nm Wavelength range 240 to 2,600 nm out. Up to five wavelength intervals can be
assigned individually, and up to 500 data points
can be specified.

9 10
 ● SPECIFICATIONS
Wavelength range
Monochromator
Detector
Sample compartment
Wavelength indication
Slit width indication
Wavelength accuracy
Wavelength
setting repeatability
Wavelength scan speed
Light source
Light source switching
Photometric system
Photometric mode
Photometric range
Photometric accuracy
Photometric repeatability
Response
Baseline memory
Baseline flatness
Baseline stability
Data processing section
Operating temperature
Operating humidity
Power consumption
Physical size
(spectrophotometer main unit)
Weight
NOTICE: For proper operation, follow the instruction manual when using the instrument.
Specifications in this catalog are subject to change with or without notice, as Hitachi High-Technologies Corporation continues to develop the latest
technologies and products for our customers.
Tokyo, Japan
http://www.hitachi-hitec.com
24-14 Nishi-Shimbashi 1-chome, Minato-ku, Tokyo, 105-8717, Japan
Tel: +81-3-3504-7211 Fax: +81-3-3504-7302
Printed with soy ink on 100% recycled paper.
」 印刷 ます
● FUNCTIONS
175 to 2,600 nm Wavelength/time series Quantitative
Prism-grating or grating-grating type measurement functions calculation functions
Double monochromator and processing functions
Pre-monochromator: Littrow monochromator using ● Wavelength drive (Go To λ)
Spectrophotometer
diffraction grating or prism ● 100%T adjustment (auto zero)
control
Main monochromator: Diffraction grating monochro- ● Automatic wavelength calibration
mator (2 diffraction gratings switchable) ● Measurement condition setting
Czerny-Turner monochromator ● Condition readout
Photomultiplier (UV-VIS): Cooling type, PbS (NIR) ● Condition saving
ø 60 mm integrating sphere: Inner face coated with (Number of files, file rewriting/deletion: Arbitrary)
BaSO4 or Spectralon ● Automatic start function (Measurement conditions are
Measurement
Incident angle on reflective sample: automatically set up when the power switch is turned on.)
conditions
10° on both standard and reference sides ● Calibration curve condition
Equipped at head of table-top section, capable of setting (first to third order,
accommodating very large samples — polygonal line)
Inner dimensions: ● Standard data setting (20 std,
480 (W) × 470 (D) × 200 (H) mm (standard type) 20 points in average)
680 (W) × 470 (D) × 300 (H) mm (large type) ● Spectral/time-series measure- ● Calibration curve
Optical path length: 200 mm ment Repetitive spectral re-measurement
In 0.01 nm step measurement
Measurement
Ultraviolet and visible region: Automatic control and ● S/N user-selectable function
execution
switching in 0.01 nm step from 0.01 to 2.4 nm (Sampling interval setting)
(Switching in 0.02 nm step from 2.4 to 8.0 nm) ● Baseline measurement: 3 ch
Near infrared region: Automatic control and switching (System baseline: 1 ch, user baseline: 2 ch)
in 0.1 nm step from 0.1 to 20.0 nm ● Sample name
Ultraviolet and visible region: ±0.2 nm ● Comment input
Near infrared region: ±1.0 nm ● Ruled-line recording ON/OFF
Automatic wavelength calibration function incorporated ● Measurement condition recording ON/OFF
Ultraviolet and visible region: ±0.1 nm ● Spectral/time-series ● Calibration curve
Recording/display
Near infrared region:±0.5 nm recording/display recording/display
Automatic control scan plus 0.3 (0.75), 3 (7.5), 15 (37.5), ● Spectral data readout ● Data deletion
30 (75), 60 (150), 120 (300), 300 (750), 600 (1,500), ● Spectral data saving ● Data readout
1,200 (3,000) and 2,400 (6,000) nm/min ● Data saving
● Data list printing
* The parenthesized values correspond to wavelength
scan speeds in the near infrared region. ● Scale change (numeric value ● Calibration curve trace
G to λ: 3,600 (9,000) nm/min input, cursor input) ● Data printing
Ultraviolet region: Deuterium lamp (mountable by one touch) ● Spectrum trace ● Sample data deletion
Visible and near infrared region: 50 W halogen lamp ● Smoothing ● Statistical calculation
(long-life 1,000 h) ● Data printout ● Coefficient-of-determina-
Automatic changeover interlinked with wavelength ● Graph axis conversion tion calculation
Abscissa: nm, kcm , eV, THz
–1
Wavelength freely selectable within 325 to 370 nm
Double beam direct ratio photometry (Negative absorbance Ordinate: Abs, %T, %R, E(S),
or over-100% transmittance/reflectance measurable due E(R), ε, log ε
to Hitachi’s original differential feedback system) Data processing ● Spectral calculation (4-rule
arithmetic calculation
Ultraviolet and visible region: Negative voltage control and
slit control system /coefficient calculation)
Near infrared region: Slit control and fixed slit system ● Differentiation
(first to fourth order)
Absorbance (Abs), transmittance (%T), reflectance (%R) ● Area calculation
Energy on reference side (E(R))/sample side (E(S)) ● Data resetting
Absorbance: –2 to +5.0 Abs (in 0.001 Abs step) ● Rate calculation (only for
Transmittance/reflectance: 0 to 999.99 (in 0.01% step) time-series measurement)
±0.002 Abs (0 to 0.5 Abs), ±0.004 Abs (0.5 to 1.0 Abs), ±0.3%T ● Spectrum selection
Qualified according to NIST SRM 930 ● File conversion (ASCII/JCAMP)
±0.001 Abs (0 to 0.5 Abs), ±0.002 Abs (0.5 to 1.0 Abs), ±0.1%T ● Lamp ON time control
Qualified according to NIST SRM 930 ● Display format setting
Automatic setting of optimum level interlinked with slit ● Cell length conversion
Others
width and wavelength scan speed ● Data export to Microsoft® Excel
3 channels (system baseline: 1 ch, user baseline: 2 ch) ● Graph copying
< ±0.002 Abs (240 to 850 nm, slit 6 nm) ● Windows meta-file saving
< ±0.004 Abs (850 to 2,200 nm, slit automatically controlled) ● Print preview function
< (0.008 Abs (2,200 to 2,600 nm, slit automatically controlled)
Within 0.0004 Abs/h (at 340 nm), 2 hours after power-on * Microsoft, Windows, Microsoft Excel, Microsoft Word and Windows XP are registered
PC with OS Windows® XP Professional trademarks, trademarks or trade names of Microsoft Corp., USA, while other company
names and product names are those of respective companies.
15 to 35°C
45 to 80% (condensation unallowable, within 70%
at 30°C or higher)
100, 115, 220, 230, 240 V AC, 50/60 Hz, 500 VA
730 (W) × 800 (D) × 880 (H) mm (standard sample
compartment type)
930 (W) × 800 (D) × 980 (H) mm (large sample
compartment type)
120 kg
For further information, please contact
your nearest sales representative.
Printed in Japan(H) HTB-E013R 2006.2