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Development of Sulphurized SnS Thin Film


Solar Cells

Article in Current Applied Physics February 2015


DOI: 10.1016/j.cap.2015.01.022

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Current Applied Physics 15 (2015) 588e598

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Current Applied Physics


journal homepage: www.elsevier.com/locate/cap

Development of sulphurized SnS thin lm solar cells


Vasudeva Reddy Minnam Reddy a, b, *, Sreedevi Gedi a, b, **, Chinho Park b, Miles R.W c,
Ramakrishna Reddy K.T a
a
Solar Photovoltaic Laboratory, Department of Physics, Sri Venkateswasra University, Tirupati 517 502, India
b
School of Chemical Engineering, Yeungnam University, 280 Daehak-ro, Gyeongsan 712-749, Republic of Korea
c
School of Technology and Environment, Northumbria University, Newcastle NE1 8ST, UK

a r t i c l e i n f o a b s t r a c t

Article history: Thin lms of tin sulphide (SnS) have been grown by sulphurization of sputtered tin precursor layers in a
Received 13 July 2014 closed chamber. The effect of sulphurization temperature (Ts) that varied in the range of 150e450  C for a
Received in revised form xed sulphurization time of 120 min on SnS lm was studied through various characterization tech-
19 January 2015
niques. X-ray photoelectron spectroscopy analysis demonstrated the transformation of metallic tin layers
Accepted 20 January 2015
Available online 3 February 2015
into SnS single phase for Ts between 300  C and 350  C. The X-ray diffraction measurements indicated
that all the grown lms had the (111) crystal plane as the preferred orientation and exhibited ortho-
rhombic crystal structure. Raman analysis showed modes at 95 cm1, 189 cm1 and 218 cm1 are related
Keywords:
Tin sulphide
to the Ag mode of SnS. AFM images revealed a granular change in the grain growth with the increase of
Sulphurization Ts. The optical energy band gap values were estimated using the transmittance spectra and found to be
Structural properties varied from 1.2 eV to 1.6 eV with Ts. The Hall effect measurements showed that all the lms were p-type
Optical properties conducting nature and the layers grown at 350  C showed a low electrical resistivity of 64 U-cm, a net
Solar cell carrier concentration of 2  1016 cm3 and mobility of 41 cm2 V1 s1. With the use of sprayed
Zn0.76Mg0.24O as a buffer layer and the sputtered ZnO:Al as window layer, the SnS based thin lm solar
cell was developed that showed a conversion efciency of 2.02%.
2015 Elsevier B.V. All rights reserved.

1. Introduction lies between the band gap values of Si and GaAs with high optical
absorption coefcient of 105 cm1and quantum yield for the exited
The challenge of the present photovoltaic market is to produce carrier and low recombination velocity [6,11]. It has the ionization
electricity at very low cost using environmental friendly materials. energy of 4.7 eV [1,12], work function of 4.2 eV [12,13,14] and an
It has been proved recently that one such material system is the IV electron afnity of 3.59 eV [1]. The selection of ohmic contact for
e VI group of SneS semiconductors [1,2]. The SneS phase diagram SnS lms is easy because of its lower work function and electron
reported by Bletskan et al. [3] revealed different binary forms such afnity compared to the other conventional absorber layers like
as SnS, SnS2 and Sn2S3. Among these phases, SnS and SnS2 played CdTe, CIGS and CIS [12].
promising role in the development of solar cells, electronic and Tin sulphide have been prepared using a variety of deposition
display devices [1,2,4e9]. techniques, such as spray pyrolysis [6,10,15], thermal evaporation
SnS exhibits both p- and n-type conductivity depending on the [13,16], electronbeam evaporation [17], hot wall deposition [18],
concentration of tin [10]. It has the advantage that the constituent chemical bath deposition [19], successive ionic layer adsorption
elements are abundant in nature and do not cause any health and and reaction [20], RF sputtering [21], atomic layer deposition [22],
environmental hazards. It has an energy band gap of ~1.35 eV that chemical vapor deposition [23], electrochemical deposition [4,24]
and sulphurization [25,26]. Among them, sulphurization is one of
the simple method that can be used to prepare SnS lms over large
* Corresponding author. Present address: School of Chemical Engineering, area deposition at low cost with well controlled composition and it
Yeungnam University, 280 Daehak-ro, Gyeongsan 712-749, Republic of Korea. has proved as a most promising method for producing high quality
** Corresponding author. School of Chemical Engineering, Yeungnam University, CIGS and CIS thin lms for solar cell fabrication. In this method, the
280 Daehak-ro, Gyeongsan 712-749, Republic of Korea. metal precursors were sulphurized using sulphur vapor in a closed
E-mail addresses: drmvasudr@gmail.com, drmvasudr9@gmail.com
chamber by reaction solid phase growth mechanism. Although, few
(V.R. Minnam Reddy), drsrvi9@gmail.com (S. Gedi).

http://dx.doi.org/10.1016/j.cap.2015.01.022
1567-1739/ 2015 Elsevier B.V. All rights reserved.
V.R. Minnam Reddy et al. / Current Applied Physics 15 (2015) 588e598 589

research groups were grown SnS layers using sulphurization


method [25,26], a detailed investigation on the properties of grown
layers using different growth conditions are meager. Therefore, a
systematic study on the suphurization conditions is required to
obtain a good quality lms as the process depends on the number
of factors such as precursor thickness, sulphurization pressure,
temperature, time and carrier gas ow rate in the sulphurization
system.
Loferski et al. [27] theoretical studies and Chandrasekharan et al.
[28] stimulations showed that solar conversion efciencies >20%
could be achieved for SnS based solar cells. Therefore, it is a po-
tential candidate that can be used as a solar absorber in thin lm
solar cells. But experimentally these cells currently demonstrated a
conversion efciency of 1.95% in homojunction type [29] and 4.4%
in inorganic heterojunction conguration [22] while organic het-
erojunction exhibited an efciency of 2.8% [30]. The reported lower Fig. 2. Wide scan XPS spectrum of SnS lms grown at a sulphurization temperature of
350  C.
efciencies for these cells might be poor crystallinity, lower thick-
ness of the lm, insufcient diffusion lengths, lattice and electron
afnity mismatches. Among these, the mismatch in the electron rotary pump and then ushed with argon gas for a few minutes to
afnity mainly inuences the cell efciency, which causes energy avoid the presence of impurities in the chamber. Thereafter, sul-
spikes to occur in the conduction band that limits the carrier phurization was performed in the temperature range of
transport across the junction. In this context, we are investigating 150e450  C for a xed time period of 120 min and then the lms
on various buffer layers to SnS in our laboratory and Zn0.76Mg0.24O were allowed to cool down naturally to room temperature. The
[31,32] is found to be suitable nontoxic buffer layer where the initial thickness of sputtered tin metal is 300 nm and after sulfu-
electron afnity could be tunable to a value close to that of SnS [33]. rization it attempts the values as follows, 150  C 386 nm,
Hence, in the present work, SnS layers were grown using sulphu- 200  C 420 nm, 250  C 480 nm, 300  C 590 nm,
rization of tin layers and the properties of the layers were analyzed 350  C 610 nm, 400  C 556 nm and 450  C 400 nm. The
and discussed. Finally, the optimized SnS layers were used for the Zn0.76Mg0.24O buffer layer of 100 nm thickness were deposited by
development of SnS based solar cell with the conguration of Mo/ chemical spray pyrolysis using at previously optimized conditions
SnS/Zn0.76Mg0.24O/ZnO:Al/Ag and initial results are reported. [32] and ZnO:Al window layer of 380 nm formed by DC reactive
magnetron sputtering. Finally, Ag was deposited by thermal evap-
2. Experimental details oration technique as the top contact.

2.1. Preparation of SnS lms 2.2. Characterization techniques

Metallic tin precursor layers of 300 nm were deposited on ul- The chemical stoichiometry and the valance state of constituent
trasonically cleaned Mo-coated soda lime glass substrate by DC elements of SnS layers were explored by X-ray photoelectron
magnetron sputtering process using VRSU048 sputtering system spectroscopy (XPS) (Model: VG Multilab 2000). The XPS spectra
(4N Tin target Kurt J. Lesker). The tin precursors were sulphurized were recorded in the binding energy range of 0e1000 eV using Al
by a sulphurization system and the setup is shown in Fig. 1. The tin target as the source of X-ray and the binding energies in the
layers were kept inside a graphite box together with 99.998% pure
sulphur akes (Sigma Aldrich) and then placed onto the heater in
the closed chamber. The chamber was initially evacuated using a

Fig. 1. Experimental setup of the sulphurization. Fig. 3. Scheme of relative positions of the core level Sn3d5/2 and S2p3/2 peaks.
590 V.R. Minnam Reddy et al. / Current Applied Physics 15 (2015) 588e598

spectrometer were calibrated using carbon 1s line. The XPS spectra surface of the lm owing to its high vapor pressure at such tem-
of the layers were taken repeatedly at different time intervals by Ar- peratures. Hence, there might be an optimum temperature for the
ion etching to check the compositional uniformity across the sulphurization of the lms with desired properties. In order to
thickness of the layers. The crystal structure of the deposited lms understand the formation mechanism of SnS and to optimize the
was identied using X-ray diffractometer (XRD) (Model: Seifert sulphurization temperature, the lms were analyzed using appro-
3003 TT with monochromatic high intensity CuKa radiation priate characterization techniques.
l 0.1546 nm). Raman spectroscopy measurements were per-
formed with Horiba Jobin Yvon spectrophotometer in backscat- 3.1. XPS analysis
tering conguration with an excitation wavelength of 632 nm. The
surface topography of the lms was observed by atomic force mi- In the present study, XPS was used to investigate the valence
croscope (AFM) (Model: SPA 400). The optical properties were states of the constituent elements as well as binding energies of the
studied using Perkin Elmer Lambda 950 UVeViseNIR spectrom- SneS system. Fig. 2 showed the wide scan XPS spectrum of SnS
eter. The electrical properties were carried out by Ecopia Hall effect lms sulphurized at Ts of 350  C. The XPS spectrum conrmed the
measurement system (Model: HMS-3000VER 3.51.3). The illumi- presence of Sn, S, O and C components. The peak present at a
nated current density-voltage (J-V) characteristics of the pre- binding energy value of 284.8 eV and 531.3 eV are assigned to the
liminary unoptimized solar cell device were measured using a characteristic peak of C1s. These two peaks were present in the XPS
Keithley 2400. A Xenon ash lamp (USHIO, ash type, UA-DF1, spectrum of the as-grown layers due to surface oxidation/
1000 W, 400 V) with AM 1.5 lter was used as a source of light. contamination that disappeared when the layers were Ar-ion
etched at regular time intervals, indicating the compositional uni-
3. Results and discussion formity across the layer thickness. The peak observed at 164.3 eV
indicates the presence of elemental sulphur [33,34]. However it
All the sulphurized SnS lms appeared smooth, homogeneous was not observed in the layers after Ts of 250  C. Generally, the
and pinhole free by visual observation, and had good adherence to difference between the binding energies of elemental sulphur and
the substrate as revealed by scratch tape test. The sulphurization sulphur bonded with different oxidation states of tin are shown in
temperature had shown signicant inuence on the properties of Fig. 3. If sulphur is bonded with Sn2 and Sn4 simultaneously, then
SnS lms, since it inuences the reaction kinetics between tin layer the difference between the binding energies is only 1 eV and hence
and sulphur vapor. In general, if the temperature is too low no re- the XPS yields a broad peak for S2. Similarly, the difference in
action will takes place between the metal layer and sulphur vapor. binding energies of Sn0, Sn2 and Sn4 varied between 0.7 eV and
On the other hand, if the temperature is higher than the melting 2.0 eV thereby overlapping of the peak occur, resulting in a broad
point of sulphur then reevaporation may takes place from the tin peak in the XPS spectra. Therefore, the inuence of Ts on the

Fig. 4. Deconvoluted XPS spectra of Sn3d5/2, Sn3d3/2 and Sp3/2 peaks in the lms sulphurized at different temperatures.
V.R. Minnam Reddy et al. / Current Applied Physics 15 (2015) 588e598 591

existence of different states of tin and sulphur in SnS lm was those layers were 352.0 eV and 325.1 eV respectively that corre-
analyzed through the deconvolution of core level Sn3d5/2 and S2p3/ spond to Sn2S3 or SnS2 phases. As the energy difference between
2 peak and are shown in Fig. 4(a) and (b). these two peaks is very small, it is difcult to identify these phases
At lower Ts, the Sn3d3/2 peak was broad because of the presence using XPS and therefore Raman analysis was carried out and dis-
of mixed states and is shown in Fig. 4(a). It can be deconvoluted into cussed in the further section. The XPS analysis thus demonstrated
three peaks that were related to Sn0, Sn2 and Sn4, indicating that that the Sn precursor layers transformed into SnS phase
the existence of different phases of SneS in addition to metallic tin. completely without any secondary phases only in the Ts range of
With the increase of Ts, the width of the Sn3d5/2 peak was 300e350  C. The possible change in the oxidation state of Sn
decreased and became narrow in the Ts range, 300e350  C and during the whole procedure is as follows. Usually, the reaction of
further increase of Ts, the peak was slightly shifted towards higher metallic tin with sulphur might depend on the oxidation state of tin
binding energy side and also it became broad again. The decon- at that particular temperature in the reaction chamber apart from
volution of Sn3d5/2 peak at these Ts indicated the presence of two the energy formation of different phases. The metallic tin might be
peaks that are related to Sn2 and Sn4, corresponding to SnS and present in 4 oxidation state with the raise of Ts. With further rise
SnS2 phases, respectively. Similarly, the deconvolution of S2p3/2 of Ts, it could be changed from 4 to 2 oxidation state by
peak at lower Ts in the range, 150e250  C resulted in two main capturing the electrons from the lone pair state of Sn [38]. There-
peaks related to SeSn2 and SeSn4 and is shown in Fig. 4(b). With fore, at lower Ts various binary phases such as SnS and Sn2S3 were
the increase of Ts, the width of S2p3/2 peak was decreased and present corresponding to 4 and 2 oxidation state of Sn. But,
became narrow between 300  C and 350  C and further increase of when the Ts was in the range of 300e350  C. Sn might be present
Ts, the peak was slightly shifted towards the lower binding energy only in the 2 oxidation state, leading to the formation of single
side and made it broad. The deconvolution of S2p3/2 peak at these Ts phase SnS [39,40]. However, at Ts  400  C disproportionation re-
results in two peaks corresponding to SeSn2 and SneSn4. action of Sn2 resulted with the existence on Sn4 and Sn0 states as
Therefore, in the Ts range of 300e350  C, the narrow peaks noticed the nearest neighbor distance between Sn4 and S2 is shorter than
at 485.6 eV and 161.2 eV of Sn3d5/2 and S2p3/2 were related to Sn2 the nearest neighbor distance between Sn2 and S2 due to lattice
and S2 in SnS [35] respectively. In addition, the Sn4 peak (at relaxation that depends upon the growth conditions. Hence, this
486.3 eV) was not detected in the Sn3d5/2 peak of this Ts range, might be the cause for the observed additional phase of SnS2 along
indicating the formation of pure SnS phase with a binding energy with SnS at higher temperatures [41e45].
difference of 324.6 eV between Sn3d5/2 and Sp3/2 peaks.
For the Ts  250  C and 400  C, the peaks noticed at 486.3 eV 3.2. Structural properties
and 162.2 eV of Sn3d5/2 and S2p3/2 were related to Sn4 [36,37] and
S2 in Sn2S3 or SnS2 [36] respectively. Further, with the presence of The XRD patterns of SnS lms sulphurized at different sulphu-
Sn2 peak (at 485.6 eV) detected in the Sn3d5/2 and Sp3/2 peaks in rization temperatures are shown in Fig. 5. The diffraction patterns
showed that all the lms are polycrystalline in nature, exhibited
several orientations such as (111), (101), (101), (112) and (042)

Fig. 5. XRD spectra of SnS lms sulphurized at different temperatures. Fig. 6. Raman spectra of SnS lms grown at different sulphurization temperatures.
592 V.R. Minnam Reddy et al. / Current Applied Physics 15 (2015) 588e598

Fig. 7. AFM images of SnS lms grown at different suphurization temperatures.

corresponding to that orthorhombic SnS with the (111) peak as the those for secondary phases. Therefore, nucleation of secondary
predominant orientation at 2q 31.5 . However, the layers showed phases occurs relatively easily compared to that of SnS at lower Ts.
various phases of Sn and S depending upon the Ts. The lms According to the thermodynamic analysis, the tendency of easy to
grown at 150  C showed trace amount of tin and sulphur along with formation of secondary phases at low Ts is well consistent with the
SnS and Sn2S3 phases. But with the raise of Ts to 250  C, only SnS degree of stabilization of compounds in their Ts. However, forma-
and Sn2S3 phases were identied, which revealed that this tem- tion and growth of SnS nuclei becomes dominant with increasing Ts
perature could accelerate the reaction to form SnS. On further in- because enough thermal energy can be provided. The detection of
crease of Ts to 300  C, single phase SnS was observed which tin sulphide secondary phases by XRD was slightly complicated due
indicates the completion of the reaction between tin, sulphur and to overlapping of SnS, SnS2 and Sn2S3 peaks. Hence, for further
the intermediate Sn2S3 phases. This type of reaction is also called as phase conrmation of sulphurized SnS lms, Raman analysis was
comproportion reaction, which was also observed by Price et al. carried out as it is more sensitive to structural and compositional
[46]. At Ts of 350  C, the recrystallization of grains was increased change of the material.
resulting in an intense narrow peak that correspond to the (111) Fig. 6 shows the room temperature Raman spectra of SnS lms
plane of SnS. that indicated distinct modes, corresponding to sulphur and
Our XRD results implied that the crystallinity of the lms could different phases of SneS. For all sulphurization temperatures, the
be improved by increasing the sulfurization temperature which is lms had SnS modes at 95 cm1, 189 cm1 and 218 cm1, which
due to the acceleration of diffusion process of sulfur atoms into Sn related to the Ag mode. Normally, the appearance of various modes
layer. It means higher sulfurization temperature accounts for depends on the incident and scattered direction of radiation
releasing of more sulfur atoms with sufcient thermal energy to
diffuse into Sn layer, hence more diffusion of sulfur into Sn layer is
possible. That results an improvement in the crystallite size with
temperature (up to 350  C) without affecting the polycrystalline
nature of the lm. This might have enhanced a high order oriented
growth for SnS along the (111) plane due to the suppression of other
lattice planes. Further, the secondary phases such as SnS2 and Sn2S3
that had low formation energies would dissociate with sulfuriza-
tion temperature, leading to the growth of SnS. Coming to device
performance, if the crystal orientation change for a material, the
surface conduction-band position is also changed. This causes the
variation in the work function, ionization potential and electron
afnity in polycrystalline thin lms, which creates a mismatch
between present SnS [47,48] absorber and ZnMgO buffer leading to
the development of energy band offset.
At higher Ts of 400  C, the SnS2 phase is also noticed, in addition
to SnS, which was due to the reevaporation of SnS and tin from the
substrate surface as vapors. For further increase in Ts  450  C, the
peak intensities of both SnS and SnS2 phases found to decrease due
to the reevaporation of either sulphur or tin or both that results in a
decrease of lm thickness. This is also evident from the thickness as
well as optical measurements.
The formation of secondary phases at lower Ts can be attributed
to the high nucleation of formation energy for SnS compared to Fig. 8. Transmittance spectra of SnS lms formed at various temperatures.
V.R. Minnam Reddy et al. / Current Applied Physics 15 (2015) 588e598 593

paralleled to any one of the three axis (a, b, c) and the direction of
electrical polarization vector of the incident and scattered photons
[49,50]. In the present case, the appearance of Ag mode alone might
be due to the fact that incident and scattered direction of radiation
was parallel to the c-axis and the polarization of the incident and
scattered photons must be along the a-axis [50].
Among the detected modes, peak presented at 189 cm1 and
218 cm1 were assigned to the longitudinal optical (LO) mode
whereas the other at 95 cm1 to transverse optical (TO) mode. The
TO mode is due to the deviation from the rigid backscattering ge-
ometry [51]. Along with SnS mode, the modes related to Sx
(150 cm1 and 490 cm1) [52] and Sn2S3 (304 cm1) [53] phases
were also noticed upto a temperature of 200  C. When the tem-
perature is raised to 250  C, the modes related to Sx were sup-
pressed and for further increase of temperature to 300  C even the
mode corresponding to Sn2S3 phase was also absent. Thus, the
modes corresponding to SnS alone were present in the temperature
range, 300e350  C because of the reaction of tin with (S and) Sn2S3,
which led to the formation of SnS phase. Secondly, the intensity of
Raman lines were found to be high and sharp in this temperatures
range that emphasizes good crystallinity in these lms. However,
for Ts  400  C, a mode related to SnS2 phase present at 312 cm1

Fig. 9. Plot of (ahy)2 versus hy of SnS lms sulphurized at various temperatures.


[54] was noticed in addition to SnS. The appearance of various
phases in the lms sulphurized at different temperature was in
good agreement with the XRD and XPS results.

3.3. Topographical analysis

The topographical analysis was carried out using atomic force


microscope (AFM) scanned over an area of 3 mm  3 mm and is
shown in Fig. 7. The evaluated grain size is varied in the range,
90e180 nm and the lms grown at 350  C had the highest grain size
of 180 nm. These images clearly showed that the change in the
surface topography of SnS lms grown at different Ts. The lms
grown at lower Ts  200  C, showed voids between the grains
because of lower mobility of ad-atoms due to their lack of sufcient
surface thermal energy, however they were covered later by sec-
ondary nucleation at higher Ts. When the Ts was increased to
350  C, the ad-atoms move over the surface, join together and get
enlarged form subgrain collection resulting in the formation of
bigger grains with good compactness. But on further increasing in
the Ts  400  C, the generation of pinholes in the lm was observed
resulting from reevaporation of sulphur/tin atoms will form the
surface of the lm. The high surface roughness at lower Ts was
attributed to kinetic roughening. And with increase of Ts, the lm
surface tends to be smooth which lead to lower roughness, because
of high surface diffusion.

3.4. Optical properties

The wavelength dependence of optical transmittance was


studied in the wavelength range, 300e2500 nm at room temper-
ature. Fig. 8 shows the transmittance spectra of the sulphurized
lms grown at different sulphurization temperatures. The spectra
clearly showed that a signicant change in transmittance with Ts.
The lms grown at Ts of 150  C had lower transmittance (20%) and
relatively small band gap (1.2 eV) due to unreacted tin metal in the
lack of SnS lm [55]. With the increase of Ts to 200  C, the trans-
mittance also increased upto 40% with a little blue shift of the ab-
sorption edge. Further increase of Ts to 300  C resulted in sharp fall
of the absorption edge with a transmittance of 60% due to good
crystallinity and internal morphology of the lm. This implied that
the complete conversions of tin to form single phase of SnS. When
the Ts  400  C, the absorption edge started to shift towards the
lower wavelength side with a marginal change in the transmittance
594 V.R. Minnam Reddy et al. / Current Applied Physics 15 (2015) 588e598

Fig. 10. Variation of electrical resistivity, mobility and carrier concentration of SnS lms with sulphurization temperatures.

due to the formation of secondary phases and reevaporation of tin/ behavior whereas the carrier mobility varied in the range of
sulphur and SnS. This behavior was also supported by the XRD and 41e10 cm2 V1 s1with increasing Ts from 200  C to 400  C. The
Raman analysis. single phase, nearly stiochiometric SnS lms grown at the tem-
The absorption coefcient a is related to transmittance, T by the perature of 350  C had an electrical resistivity of 64 U-cm, a net
relation ln(T) at, where t is the thickness of the lm. It was carrier concentration of 2  1016 cm3 and mobility of
found that all the lms had high absorption coefcient (105 cm1). 41 cm2 V1 s1.
The dependence of the absorption coefcient (a) on the photon
energy (hy) was used for the determination of energy band gap (Eg)
3.6. Characteristics of SnS based solar cell
of SnS lms [42].
In order to demonstrate the quality of suphurized SnS layers of
ahy Bhy  Eg1=2 thickness 610 nm (grown using a tin metal thickness of 300 nm and
sulurization temperature of 350  C for a time duration of 150 min)
where B is the constant. The plot of (ahy)2 versus hy for SnS lms is
for photovoltaic conversion, SnS based thin lm solar cells with the
shown in Fig. 9. The linear nature of the curve indicates the pres-
conguration, glass/Mo/SnS/Zn0.76Mg0.24O/ZnO:Al/Ag were fabri-
ence of direct optical transition in the layers. The energy band gap
cated and the current density-voltage (JeV) measurements were
was determined by extrapolating the straight portion of the plot on
the energy axis.
The estimated band gap was increased with the increase of
sulphurization temperature from 1.2 eV to 1.6 eV. The lower and
higher band gaps are noticed might be due to the presence of Sn2S3
and SnS2 phases along with SnS respectively. The layers formed at
temperature in the range, 300e350  C had an energy band gap of
1.36 eV.

3.5. Electrical properties

Hall effect measurements were performed on the sulphurized


lms that indicated the p-type electrical conductivity. The electrical
resistivity of the lms was varied in the range, 64e210 U-cm with
the increase of sulphurization temperature and is shown in Fig. 10.
The low resistivity was observed at lower Ts (200  C) might be due
to the presence of metallic tin in the lms. When the Ts is raised to
250  C, an increase in the resistivity was observed due to the
presence of secondary phases of Sn2S3 apart the small size of the
grains. Further increase of Ts in the range, 300e350  C led to the
formation of single phase SnS in addition to improvement in the
crystallity and grain size that resulted in a decrease of resistivity in
the lms. For Ts  400  C, the resistivity was increased again due to
the reduction of the lm thickness and formation of SnS2 phase in
addition to SnS which is highly resistive. The change of carrier
concentration with Ts is opposite to that of the resistivity variation Fig. 11. JeV characteristics of SnS based solar cell.
V.R. Minnam Reddy et al. / Current Applied Physics 15 (2015) 588e598 595

Table 1
Reported experimental and simulation efciencies of SnS based solar cells with different cell structures.

Cell conguration Voc (mV) Jsc (mA/cm2) FF (%) h (%) Ref

Experimental cell parameter


ITO/CdS/SnS/Ag 120 7.000 35 0.29 [56] 1994
Al/CdS/SnS/Ag 140 8.400 38 0.50 [57] 1997
CdO/SnS/Ag 200 5.000 [58] 2001
Cd2SnO4/SnS/Ag 230 3.900 [58] 2001
SnO2:F/SnS/Ag 133 1.230 [58] 2001
CTO/SnS/Fe2/Pt 370 7.80 e 0.63 [5] 2003
SnS/CdS 500 10.00 50 2.50 [57] 2005
TCO/SnS2/SnS/Al 350 1.500 e e [59] 2006
SnO2/SnS/CdS/In 260 9.600 50 1.30 [6] 2006
ITO/Cd1 e xZnxS/SnS/In 280 4.82 34 e [60] 2007
In/ZnS/SnS/ITO 135 9.50 e e [61] 2007
ITO/CdS/SnS/In 220 2.360 35 0.22 [62] 2007
ITO/ZnCdS/SnS/In 288 9.160 50 0.71 [62] 2007
SnO2:F/CdS/SnS/Ag 380 0.170 [63] 2007
SnO2:F/CdS/SnS/CuS/Ag 310 1.000 [63] 2007
SnO2:F/CdS/SnS/Cu2SnS3/Ag 340 6.000 [63] 2007
ITO/SnS/ZnO/In 135 0.150 50 0.01 [64] 2008
ITO/CdS/SnS/Ag 274 0.301 40 0.08 [65] 2008
SnO2:F/CdS/SnS(R)/Ag 340 0.019 e [66] 2008
SnO2:F/CdS/SnS(Z)/Ag 400 0.085 [66] 2008
SnO2:F/CdS/SnS(R-Z)/Ag 400 0.016 [66] 2008
SnO2:F/CdS/SnS(Z)/SnS/Ag 560 e [66] 2008
SnO2:F/CdS/SnS(R-Z)/Ag 370 1.230 44 0.20 [67] 2009
ITO/ZnO/SnS/In 120 0.400 33 0.03 [68] 2009
ITO/PEDOT:PSS/PO/SnS/Al 940 0.055 40 2.05 [69] 2009
SnS/Si 480 8.76 50 0.7 [57] 2009
SnS/ZnO 380 0.08 40 e [57] 2009
ITO/MDMO-PPV/SnS/SnO 740 0.34 41 0.10 [70] 2010
FTO/Pt ele SnS/TiO2/FTO 471 0.300 71 0.10 [71] 2010
Mo/SnxSy/CdS/ZnO:Ga 183 2.70 34 0.17 [72] 2011
ITO/CdS/SnS/In 280 0.34 27 0.01 [73] 2011
Mo/SnS/Si/ITO 289 1.550 37 0.17 [26] 2012
Al/SnS/SnS/ITO/Ti/Al 650 7.640 39 1.95 [29] 2012
ITO/SnO2/SnS/In 40e90 1.5e9.7 e e [74] 2012
FTO/TiO2/SnS/ITO/Pt 504 2.300 15 0.20 [75] 2012
Mo/SnS/CdS/ZnO 132 3.600 29 0.5 [18] 2012
FTO/TiO2/SnS/P3HT/Ag 850 7.350 45 2.81 [30] 2012
AZO/CdS/SnS/Au 217 19.000 e 1.60 [16] 2013
Mo/SnS/In2S3/ZnO:Al/Cu/Al 110 1.980 26 0.6 [76] 2013
Mo/SnS/Si/Si/NieAl 370 2.400 e e [77] 2013
Mo/SnS/CdS/ZnO/Al:ZnO/NieAl 155 3.420 32 0.17 [78] 2013
Mo/SnS/Zn(O,S)/Al:ZnO/ITO 244 19.420 43 2.04 [79] 2013
ITO/ZnMgO/SnS/Cu 270 12.100 64 2.10 [33] 2013
CdS/SnS 400 0.061 81 1.49 [81] 2014
Mo/SnS/Si/Si/NieAl 362 2.400 e 0.42 [82] 2014
Si/SiO2/Mo/SnS/Zn(O,S)/ZnO/ITO/Ag 261 24.900 44 2.90 [84] 2014
Mo/SnS/SnO2/Zn(O,S):N/Al:ZnO/ITO 390 22.600 53 4.63 [22] 2014
Si/SiO2/Mo/SnS/Zn(O,S):N/ZnO/ITO/Ag 344 20.645 56 3.88 [47] 2014
TiO2/SnS 342 0.740 38 0.01 [86] 2014
Pt ele SnS/TiO2/FTO 462 e e e [87] 2014
Mo/SnS/Zn0.76Mg0.24O/ZnO:Al/Ag 575 9.96 36.4 2.02 Present study
Simulation cell parameter
Cu/SnS/ZnO/FTO 749 26.868 85 17.03 [80] 2014
SnS/CdS/ZnO 920 13.400 86 10.6 [83] 2014
CdS/SnS 896 26.650 25 6.03 [85] 2014
ZnS/SnS 894 31.880 57 16.26 [85] 2014
ZnO/SnS 897 31.010 27 7.53 [85] 2014
Si/SnS 893 30.670 52 14.30 [85] 2014

Values in bold indicate experimentally obtained highest values of inorganic heterojunction solar cell parameters.
596 V.R. Minnam Reddy et al. / Current Applied Physics 15 (2015) 588e598

performed. Fig. 11 shows the JeV characteristics of the cell that temperature (<300  C) and SnS2 phase at higher temperature
shows the highest conversion efciency of 2.02% with the open (400  C). But, the lms sulphurized between 300  C and 350  C
circuit voltage (Voc) 575 mV, short-circuit current density had single phase with stoichiometry and good crystallinity. The
(Jcs) 9.96 mA/cm2 and ll factor (FF) 36.4%. The obtained results lms showed a low electrical resistivity of 64 U-cm grown at the
were compared with reported experimental and simulation values temperature of 350  C with an energy band gap of 1.36 eV. The
using Table 1, which shows device parameters such as Voc, Jsc, FF conversion efciency achieved in our study was 2.02%. Further
and efciency of SnS-based solar cells in year wise pattern. The simple sulphurization technique used to grow the layers might be
value of Jsc acquired in the present work is low compare to the advantageous for large scale production of SnS lms at low cost.
reported value by Sinsermsuksakul et al. [22] and Steinmann et al.
[48]. This indicates a reduction in the recombination (low Jsc) levels, Acknowledgments
which could lead to high Voc. A more detailed analysis of the
junction behavior is required to assess the performance of the de- The authors wish to acknowledge the nancial support from the
vice, which is under progress. From the table it was also noticed University Grants Commission (UGC), New Delhi (No.F.5-99/
that SnS-based solar cells in different form of junctions exhibited 2007(BSR)) in the form of a Research Fellowships in Science for
high Voc values such as 650 mV; unstable 560 mV, stable 500 mV; Meritorious Students. This work was also supported by the New &
simulated 897 mV and 850 mV in the form of homo, hetero and Renewable Energy Program (No. 20143030011950) and the Human
bulk junctions respectively. The following lines gave the reasons Resources Development Program (No. 20124030200100) of the
with supporting references for getting high Voc. Further, by Korea Institute of Energy Technology Evaluation and Planning
considering the highest inorganic heterojunction solar cell pa- (KETEP) grant funded by the Korean Ministry of Trade, Industry and
rameters (Voc 575 mV, Jsc 24.9 mA/cm2 and FF 81% from the Energy (MOTIE). The authors also wish to thank the DST-UKIERI,
Table 1) that were achieved using different window/buffer layers New Delhi for the award of collaborative project that provides
with SnS as an absorber, it will be possible to realize a SnS-based travel assistance to carry out some of the measurements at
solar cell with solar conversion efciencies around 12%. An opti- Northumbria University, Newcastle NE1 8ST, UK.
mization of the device parameter will denitely led to efciencies
close to 15% in the future. References
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