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  • Choosing Process Vacuum Pumps, CEP, Aug-12

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    Sanjay Gupta
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    Choosing Process Vacuum Pumps

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    © All Rights Reserved
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    Segnala contenuti inappropriati
    144 visualizzazioni8 pagine

    Choosing Process Vacuum Pumps, CEP, Aug-12

    Caricato da

    Sanjay Gupta
    Choosing Process Vacuum Pumps

    Copyright:

    © All Rights Reserved
    Scarica in formato PDF o leggi online su Scribd
    Segnala contenuti inappropriati
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    Sage Back to Basics Choosing Process Vacuum Pumps Don Couuns: Epwaabs Lt. Vacuum pumps are an integral part of many industrial facilities. Both processing objectives and budget constraints must be considered when ‘acaum, or sub-atmospherie pressure, is used in a \ ] wide range of chemical processing and manufactur- ing applications. This article is an introduction to ‘the main vacuum pump technologies suitable for use in the chemical process industries (CPI). It offers basic selection ‘guidance for wet and dry vacuum systems, and discusses system design, safety issues, and typical applications. Use of vacuum in chemical processing ‘A vacuum system can affect every aspect of process, such as utility consumption, processing times, quality, safety, and environmental impact. The benefits of vacuum include: + reduced energy consumption and reduced risk of heat damage to sensitive products by lowering processing temperatures. + enhanced product quality through impurity removal + safer operating atmospheres through oxygen exclusion + inereased yield by shifting reaction equilibrium + simplified product transfer in pneumatic conveying and ‘iting The design of the vacuum system, including pumps, piping, controls, and other aecessories, is determined by process parameters and evacuation requirements. Correct sizing is vital to ensure thatthe processing objectives, such as vacuum pressure, pumping speed, and budgets, are met Vacuum technologies CPI vacuum technologies include wet and dry mechani- cal pumps. Wet technologies require lubrication fis, such as oil or water. The lubrication fluid must be changed regu- larly and disposed of appropriately, as it frequently becomes contaminated with process fluid selecting a specific pump. Dry vacuum pumps do not use any lubricant in the swept volume. They havea lower environmental impact, require less maintenance, and are often more reliable than oil-sealed, ‘pumps in the CPI, For these reasons, dry vacuum is used to pump some of the most aggressive and problematic gases in abroad range of chemical processes. Pumps that discharge to atmospheric pressure are referred to as primary pumps, These may be used alone or with a secondary pump that creates a higher vacuum or more pumping speed, recess Gas niet Cold Guard Ring Cooling fr Body =< Ejector Stage eee To Backing Condenser ‘and Primary Pump Eso “A Figure. Vapor boosters equice a primary pump and generate medium tobigh vacuum, CEP Agesi2012 weuscrocmiep CB Back to Basics Wet vacuum technologies ‘The traditional wet process vacuum technologies used in the CPI include vapor boostrs, steam ejeetors liquid- ring pumps, and oil-sealed pumps such as rotary-piston and. rotary-vane types. Vapor boosters can provide high pumping speeds at very low pressures of 107 to 10-* mbar more economically than other vacuum technologies ‘A vapor booster (Figure 1) is a secondary pump, and requires initial pumpdown by 2 primary pump. During pampdown, a mechanical primary pump evacuates the vapor booster to below its critical backing pressure (ie, the vapor booster’s maximum allowable exhaust pressure, typically below 1 mbar) The pump id is vaporized by the boilertheater: As the vapor rises and passes through the eone- shaped jet stages, it generates a pressure of about § mbar within he jet assembly. Vapor streams exit the jet assembly av ahigh velocity, then condense onthe cooled walls ofthe {jot and ejector stage cones and drain into the base of the ‘pump for recirculation The process gas enters the vapor booster through the ppump's inlet port. A portion ofthe gas becomes trapped in the vapor steam leaving the top jetstage. The gas is compressed asi travels from one stage to the next, and exits the pump by passing through the ejector stage and into a backing condenser. The gas is then removed by the backing pump (Le. a type of vacuum pump that increases the pres- sure fo an intermediate value orto atmospheric pressure). The cooled surface of the guard rng above the first jt stage traps and condenses pump fuid vapor and minimizes its backstreaming into the vacuum system. ‘Steam ejects have three basic parts: a nozzle, a suction chamber, and a mixing diffuser (Figure 2). A high-pressure motive fuid (usually steam) passing through the nozzle enirains low-pressure vapor from the suction chamber and discharges it at an intermediate pressure to another ejector or condenser, orto the atmosphere. Unless the process vapor is the same as the motive Suid, a large amount of effluent is usually generated, Additional effluent i generated if spray condensers are used to condense the combined steam and process vapor between ejectors or atthe system exhaust. Steam ejectors are known fortheic high reliability and robustness in arduous and corrosive environments, and provide rough to medium vacuum with high suction eapa~ VACUUM PRESSURES AND TERMINOLOGY + Rough vacuum: 1,013 to 1 mbar (760 to 1 tor) * Medium vacuum: 1 to 10°? mbar (1 to 10° ton) ‘* High vacuum: 10-* to 10°F mbar (10° to 10°? tor) “* Uttrahigh vacuum: 107 mbar and below (=107 tort) BE wowscheowgienp Augst2012 CRP bilities. However, they can be very sensitive to variations in process conditions and pressure, and they tend to suffer from low thermal efficiency, making them expensive to operate. ‘A single-stage ejector cannot provide a low enough ‘vacuum for some processing applications, such as active pharmaceutical ingredient (APD) production and refinery service. Multistage ejectors with director indirect interstage condensation are an alternative, but these require very large ‘quaottes of steam and cooling water. This makes for high energy and water bills, and it usually creates a condensate contaminated with process vapor that requires appropriate, costly disposal. Although steam is widely used in the CPI, ejector sys- tems that use fluids other than steam are also available (eg airejectors). J one rue soe exson cot vrai su Oma ‘A Figure 2. Te stam ejector const of tree basic pars nzze, a suction chamber, anda mixing citser, Suction Discharge ee | Qutlet Port Direction of Rotation ‘A Figure 3. The vertically oft rotor of iquld-ing pump eats @ Diston-ike action a the rng rises and fal ae ff ‘4 Figure ume af then esta Inet St ing 00 wate ‘a Figur staioron Lig athe li set roto ring is LRI singles the proj ccapacit (water) dry met pressun LR) (ie..up 1. Induction I PE om 4, Exhaust YS \ 3. Compression a ‘4 Figure 4 sealed rtary-pston ad rotary-vane pumps draw a ‘volume of gas ito the pum, isolate it in an encased camber, compres, then edaust the gas to crea a vacuum Splash Fitter Inet Straner. | Beraust valve ‘and Cover Hinge Pin Stator Drive Shaft Cam tary Piston Cooling Water Col ‘A Figure 5. na rtary-pston pur, he pston moves around a circular stalor ona otating cam Liquid-ring vacuum pumps (LRPs) use water, oil, ot other liquids as a sealing fluid (Figure 3). The vertically off set rotor creates a pumping action (ike a piston) asthe liquid ring rises and falls. TERPS can have compression ratios of up to 10:1 ina single stage and up to 30:1 in two stages, depending on ‘the properties of the liquid used, They are available with capacities up to 50,000 m'/h and pressures down to 33 mbar (vater) oF 10 mbar (oil). LRPs may be combined with dry mechanical booster pumps or steam ejector for low- pressure operations ERPS can handle high vapor temperaiures and loads (e,, up to a 10°C temperature rise inthe seal Fi), have Exhaust Outlet ; | A Ol VS) D wi A ~ Pump oilin Oi Reservoir ‘4 Figure 6, Arotary-vane pump has two blades that force ges eround a Cireular stator; asthe rotor tums, the tps of the blades aren contact with ‘he ol-ubrcaed stator wal ow noise and vibration levels, and can be built in a variety cof materials for wide chemical compatibility ‘Traditional once-through LRPs require a large amount of | sealing fluid, which can become contaminated with process ‘materials, making it difficult or costly to dispose of, Partal- ‘recirculation oF total-reciroulation systems help to mitigate this problem. Furthermore, LRPS tend to cavitate when the seal fluid vapor pressure approaches the system pressure: this can cause severe damage to the pump. Oileseated rotary-piston and rotary-vane pumps dif fer slightly in design but operate on the same principle, As shown in Figure 4, a volume of gas is drawn into the pump (induction), trapped in an enclosed chamber (isolation), pushed around the pump (compression), and forced out of | the pump (exhaust) In arotary-piston pump, the piston moves around a circular stator on a rotating, eccentrically mounted cam (Figure 5). A thin film of oil is maintained between the ratat- ing components for lubrication The rotary-vane design consists of an eccentrically ‘mounted rotor in a cylindical-bore stator (Figure 6). The rotor has two blades that slide in opposite slots, and as the rotor turns, the tips of the blades are in contact with the oil-lubricated stator walls. These pumps can have one- or two-stage designs, Introduced to reduce the costs associated with the dis- posal of contaminated wastewater from steam cjectors and liquid-ring pumps, oil-sealed pumps initially were a reliable and popular alternative. These pumps offer a high ultimate vacuum to 10 mbar and neat-constant volumetric capacity. However, as environmental standards have become more CEP fagsi2012 wonsdteowiop CF ——— | = |) it fb "i inin Back to Basics sttict around the world, the intensive maintenance associ ated with oil changes and disposal has become a significant disadvantage of the technology. Backstreaming of oil — the migration of oil vapor from. the pump back into the process — ean occur in normal operation, which can reduce process cleanliness. For this reason, oi-sealed pumps are usually not the best choice for ‘chemical processing applications, Mechanical dry vacuum pump technologies ‘Modern dry vacuum pumps have nonlubricated, non- contacting mechanical impeller designs; the most common types are screw, claw, and roots. The key advantage of al dry pump technologies is tha they do not use water or oil for sealing ot lubrication of the vacuum stages, This eliminates ‘the risk of process contamination and the expense of effluent

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