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Introduction
When a solution or a particle containing suspension
droplet dries, the solute is often distributed on the
substrate in interesting ring patterns, usually in the
vicinity of a (pinned) contact line. The mesoscopic structures thus produced have been extensively studied due to
their potential importance in mesopatterning by organization of particles and other solutes, surface cleaning and
coating technologies, preparation of polymer films, optical
elements, surface-adhered proteins assays, data storage,
microelectronics, and other applications requiring smallscale soft patterns. Since patterns are formed only in the
immediate vicinity of the contact line, it is possible to
greatly downsize the printed features relative to the size
of the solution droplet, leading to novel soft lithography
schemes. Some interesting examples of evaporationassisted patterning are the formation of micron-sized
copper lines from a ribbon of copper hexanoate solution,1
long-range ordering of diblock copolymers by strong droplet
pinning,2 and nanostructuring of conjugate molecules by
a stamp-assisted pinning.3
Much of the effort has been directed toward patterns
formed by evaporation of colloidal particle dispersions.
The coffee-stain problem studied by Deegan et al.4-6
reported the formation of ring deposit of particles by drying
of a suspension drop. Adachi et al.7 reported the formation
of concentric multiple rings of particles attributed to
repeated pinning/depinning of the contact line.
* To whom correspondence should be addressed. E-mail:
ashutos@iitk.ac.in.
(1) Cuk, T.; Troian, S. M.; Hong, C. M.; Wagner, S. Appl. Phys. Lett.
2000, 77, 2063.
(2) Kimura, M.; Misner, M. J.; Xu, T.; Kim, S. H.; Russell, T. P.
Langmuir 2003, 19, 9910.
(3) Cavallini, M.; Biscarini, F. Nano Lett. 2003, 3, 1269.
(4) Deegan, R. D.; Bakajin, O.; Dupont, T. F.; Huber, G.; Nagel, S.
R.; Witten, T. A. Nature (London) 1997, 389, 827.
(5) Deegan, R. D. Phys. Rev. E 2000, 61, 475.
(6) Deegan, R. D.; Bakajin, O.; Dupont, T. F.; Huber, G.; Nagel, S.
R.; Witten, T. A. Phys. Rev. E 2000, 62, 756.
(7) Adachi, E.; Dimitrov, A. S.; Nagayama, K. Langmuir 1995, 11,
1057.
vapor pressure
at 25 C (Pa)
Hildebrand
parameter (p - s)
dichloromethane
chloroform
ethyl acetate
toluene
1.69 (LS)
0.09 (MS1)
0.0 (HS)
0.16 (MS2)
3458
3460
3462
Figure 12. Pattern formed after evaporation of dichloromethane drop in the ambient (high vapor pressure and low
solubility). The images show the absence of spaghetti features,
the ring width is much smaller, and multiple rings indicative
of macroscopic stick slip are formed. The undulation frequency
of the contact line is also larger. The scale bar corresponds to
50 m.
Figure 13. Development of spatially periodic flows in the contact zone during evaporation of a toluene drop in ambient on a 20
nm thick PMMA film. The images are at various time intervals: (a) 5, (b) 12, and (c) 20 s. Flow along the contact line could be
discerned from thinner regions A to thicker regions B, where polymer deposition in the form of fingers finally occurs. The scale
bar corresponds to 100 m. Finger structures are seen in this case on complete evaporation (c).