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IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, VOL. 58, NO. 9, SEPTEMBER 2010
I. INTRODUCTION
HE ever-increasing demand of high RF/microwave (MW)
power capabilities in telecommunication and/or tracking
systems raised the need for high-performance protection devices, which are able to limit the power densities or high-power
transient signals incoming on low-power components of communication receiver front-ends (e.g., low-noise amplifiers that
withstand no more that 20 dBm). The most common protection
components for the RF/MWs domain are semiconductor power
limiter devices that are limiting the input power to a specific designed value and for a specific frequency domain [1]. The most
widely used solid-state passive power limiters (PPL) are based
on semiconductor components like p-i-n diodes or MESFET
transistors or combinations of the two [2]. However, the rapid
development of advanced RF/MW components and systems in
Manuscript received September 09, 2009; revised April 02, 2010; accepted
June 03, 2010. Date of publication August 09, 2010; date of current version
September 10, 2010. This work was supported by the French National Research
Agency (ANR) under Research Grant Admos-VO2 ANR-07-JCJC-0047.
J. Givernaud, A. Crunteanu, J.-C. Orlianges, A. Pothier, and P. Blondy
are with the XLIM Laboratory, Unit Mixte de Recherche (UMR) 6172
University of Limoges/Centre National de la Recherche Scientifique
(CNRS), 87060 Limoges, France (e-mail: julien.givernaud@xlim.fr; aurelian.crunteanu@xlim.fr;
orlianges@xlim.fr;
arnaud.pothier@xlim.fr;
pierre.blondy@xlim.fr).
C. Champeaux and A. Catherinot are with the Sciences des Procds
Cramiques et de Traitements de Surface (SPCTS) Laboratory, Unit
Mixte de Recherche (UMR) 6638, University of Limoges/Centre National
de la Recherche Scientifique (CNRS), 87060 Limoges, France (e-mail:
corinne.champeaux@unilim.fr; alain.catherinot@unilim.fr).
Color versions of one or more of the figures in this paper are available online
at http://ieeexplore.ieee.org.
Digital Object Identifier 10.1109/TMTT.2010.2057172
terms of power and agility adds new demands for these control devices in terms of low power consumption, higher incident
power control, high reliability, etc. Alternative promising solutions based on superconductor thin-film integration in coplanar
MW waveguides have already been proposed [3], but these devices required supplementary cryogenic equipments.
Our approach for fabrication of high-reliability/high-repeatability power limiter devices on a broadband frequency domain is
based on the integration of vanadiumdioxide VO thin films
in a coplanar waveguide (CPW) transmission line. Vanadium
dioxide is one of the most interesting and studied members of
the vanadates family performing a semiconductormetal transition (SMT) phase [4]. Thus, at room temperature (low temperature state), VO is a highly resistive semiconductor with
a bandgap of 1 eV. At temperatures higher than 68 C (341
K) the VO undergoes an abrupt transformation to a metallic
state (low resistive phase), which is reversible when lowering
the temperature below 65 C (the material again becomes a
semiconductor) [4][7]. The phase transition is accompanied
by a large modification of its electrical and optical properties:
the electrical resistivity decreases by 35 orders of magnitude
between the semiconductor and metallic states while the reflectivity in the optical domain increases. The reversible SMT can
be rapidly triggered by different external excitations: temperature, optically, electricallyby charge injection, and even pressure [4][6]. Recent studies showed that the optically and electrically induced transitions can be very fast (in the range of hundreds of femtoseconds) and that the transition is more typical of
a rearrangement of the electrons in the solid (electronelectron
correlations) than an atomic rearrangement (crystalline phase
transition from semiconductor monoclinic to a metallic rutile
structure) [4], [5]. The transition temperature of the VO s SMT
can be increased or decreased by doping with metals like W, Cr,
Ta, or Al [8].
VO thin films also have a high voltage breakdown, which can
be exploited for transmission of high power levels in MW devices. We used this characteristic for designing simple RF/MW
passive power limiting components, which may be further developed as more complex devices.
II. FABRICATION OF A POWER-INDUCE SWITCHING DEVICE
A. Deposition of the VO Thin Layers
VO layers of almost 250 nm in thickness were deposited
on 500- m-thick C-type sapphire substrates by using the reactive pulsed laser deposition (PLD) technique. This technique
GIVERNAUD et al.: MW POWER LIMITING DEVICES BASED ON SMT IN VANADIUMDIOXIDE THIN FILMS
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Fig. 3. Measurements of transmission parameter S21 at 23 C of a CPW waveguide loaded with different VO patterns lengths (100 m: curve 1, 200 m:
curve 2, 450 m: curve 3) and reflection parameter S11 (100 m: curve 1 ,
200 m: curve 2 , 450 m: curve 3 ).
C.
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IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, VOL. 58, NO. 9, SEPTEMBER 2010
GIVERNAUD et al.: MW POWER LIMITING DEVICES BASED ON SMT IN VANADIUMDIOXIDE THIN FILMS
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Fig. 10. Transmitted 10-GHz RF power versus the incident power through a
CPW line loaded with a 400-m-long VO pattern for four different dc-bias
voltages 10, 15, 20, and 22 V.
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IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, VOL. 58, NO. 9, SEPTEMBER 2010
the incident signal along the transmission line. They act like
small attenuators distributed along the CPW line.
Although the transmitted power level is not constant, as with
an ideal power limiter, the design can be improved by combining
VO patterns having different lengths (and thus, different incident power attenuation capabilities).
Yet an improved approach for realizing a true VO -based
MW power limiter device is presented in Section III. It is based
on a transmission line design including power dividers and combiners.
III. FABRICATION AND MEASUREMENT OF VO -BASED POWER
LIMITERS INCLUDING POWER DIVIDERS AND COMBINERS
GIVERNAUD et al.: MW POWER LIMITING DEVICES BASED ON SMT IN VANADIUMDIOXIDE THIN FILMS
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Fig. 15. Simulated (dashed curves 1 and 4) and measurements (full-line curves
2 and 3) of transmission parameters of the power limiter when VO is in a semiconductor state (curves 1 and 2) and in a metallic state (curves 3 and 4).
When
(VO highly reVO
sistive, in semiconducting state), the signal passes through
.
the two branches with low losses
When VO transforms to the metallic state,
will match the characteristic
VO
impedance of the active branch
, the power
impedance branch
is reflected (part of the
in the
signal may be dissipated in the resistance ). The only
signal coming out from the divider/combiner ring is the
characteristic impedance branch with a
signal in the
. The output power of
value of
the device is thus limited with a ratio of . If the value
would be much more lower than the characteristic
of
impedance
, the incoming signal
would
.
be completely reflected and
We designed the VO -based power-limiter devices based on
dividers/combiners rings using an ADS Momentum simulator
by following the methodology presented in [13] for different
models of ring couplers. Our design does not take into account
the phase shifting of the signal in the devices [13] since we are
not interested by this characteristic in our study. The ADS Momentum simulations show that the use of ground bridges in these
CPW impedance transformer rings (for a uniform ground plane)
does not significantly modify their -parameter responses. For
keeping the fabrication process as simple as possible, we decided to avoid the use of such structures.
An example of a fabricated device is presented in Fig. 14.
The device presented in Fig. 14 (fabricated in a similar
manner as described above for the power-induce switching devices) is composed of a 50- central linear transmission line and
two rings (divider/combiner components). Each signal-dividing
component has a 100- characteristic impedance branch (
with a smaller linewidth) and a 50- characteristic impedance
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IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, VOL. 58, NO. 9, SEPTEMBER 2010
Fig. 16. Simulated (curves 1 and 4) and measurements (curves 2 and 3) of the
S 11 reflection parameters of the power limiter in Fig. 13 when VO is in the
semiconductor state (curves 1 and 2) and in the metallic state (curves 3 and 4).
Fig. 17. Measurements of the transmitted power versus the incident power (at
10 GHz) for a two-dividers/combiners-based power limiter (at 340 K).
from the resonance of the rings itself. The diameter of the rings
and the inter-ring lines dimensions have been chosen in order
to shift away these resonance peaks towards frequencies higher
than 19 GHz while preserving device compactness. The characterization under incident power of the fabricated broadband
power limiter device is presented in Fig. 17.
As observed in the figure, at low incident power signals, when
the power increases (the red curve in online version), the transmitted power increases proportionately until a threshold value
(point 1 in Fig. 17). This threshold corresponds to a first VO
pattern actuation in the first ring, attenuating a part of the incident signal. The VO patterns actuation behavior is the same
as the one described in the previous section (switching power
device). By further increasing the incident power, the transmitted power increases proportionately again until reaching a
second threshold power value (point 2 in Fig. 17). This second
threshold point corresponds to the VO pattern actuation in the
second ring that attenuates a part of the incident signal. When
Fig. 18. Measurements of the transmitted power versus the incident power (at
10 GHz) for a two-dividers-based power limiter at different dc-bias voltages
(40, 42, and 43.5 V) at room temperature.
GIVERNAUD et al.: MW POWER LIMITING DEVICES BASED ON SMT IN VANADIUMDIOXIDE THIN FILMS
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Fig. 20. Simulated (dashed curves 1 and 4) and measurements (full-line curves
2 and 3) of S 21 transmission parameters of the power limiter presented in
Fig. 18, when VO is in a semiconductor state (curves 1 and 2) and in the
metallic state (curves 3 and 4).
Fig. 22. Measurements of the transmitted power versus the incident power (at
10 GHz) for a three-dividers based power limiter device (shown in the insert) at
340 K.
IV. CONCLUSION
We have designed and fabricated new passive RF/MW power
limiters based on semiconductor to metal transition in vanadiumdioxide thin films on CPW transmission lines. Firstly, we
proposed a simple design composed of a CPW line loaded with
VO patterns, which fill the gap between the signal line and
the grounds lines of the CPW. This power-induced switching
device behaves like an MW fuse on a very broad frequency
band, from 100 MHz to 40 GHz. It can be used either in a passive or in an active way by changing external parameters like
temperature or by applying a dc-bias voltage across the VO
pattern to modify the threshold power values. We also proposed
a more complex device based on a CPW line on which are implemented power dividers/combiners associated with VO and
Ni-doped carbon patterns. These simple PPL devices can limit
the RF/MW incident power on a large band of frequency and
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IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, VOL. 58, NO. 9, SEPTEMBER 2010
GIVERNAUD et al.: MW POWER LIMITING DEVICES BASED ON SMT IN VANADIUMDIOXIDE THIN FILMS
Pierre Blondy (M00) received the Ph.D. and Habilitation degrees from the University of Limoges,
Limoges, France, in 1998 and 2003, respectively.
From 1998 to 2006, he was with the Centre
National de la Recherche Scientifique (CNRS), as
a Research Engineer with the XLIM Laboratory,
where he began research on RF MEMS technology
and applications to MW circuits. He is currently a
Professor with the University of Limoges, where
he leads a research group on RF MEMS. He was a
Visiting Researcher with The University of Michigan
at Ann Arbor (1997) and the University of California at San Diego, La Jolla
(2006 and 2008).
Dr. Blondy was an associate editor for the IEEE MICROWAVE AND WIRELESS
COMPONENTS LETTERS in 2006. He has been a member of the IEEE International Microwave Conference Technical Program Committee since 2003.
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