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phys. stat. sol. (c) 5, No. 12, 36813685 (2008) / DOI 10.1002/pssc.200780121
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High-frequency scalable
compact modelling of Si RF-CMOS technology
Antonios Bazigos1, Matthias Bucher*, 2, Paulius Sakalas3, 4, Michael Schroter4, 5, and Wolfgang Kraus6
1
Corresponding author: e-mail bucher@electronics.tuc.gr, Phone: +30 28210 37210, Fax: +30 28210 37542
The aggressive downscaling of CMOS technologies offers record transit frequencies well above 100 GHz. Efficient RF
circuit design, employing such technologies, demands nonlinear, scalable compact models with high accuracy up to
high frequencies. EKV3 is an advanced MOSFET model,
1 Introduction Modern deep submicron CMOS technologies offer record transit frequencies, while using ever
lower supply voltages. Efficient RF circuit design, employing such technologies, is based on ever more complex
compact models for circuit simulation, that describe precisely the nonlinear, analogue behaviour of the MOSFETs
up to high frequencies. EKV3 [1, 2] is an advanced,
scalable non-linear MOSFET compact model based on the
charge-sheet theory, which uses a unified equation set
to describe static to high-frequency behaviour in all operating regions. The model has been verified [3, 4] against
several advanced CMOS technologies with drawn gate
lengths down to 65 nm and has shown excellent fitting results.
The paper provides an extended RF validation of
EKV3 for a 180 nm CMOS process, which is currently a
preferred length for analog production design in industry.
An extended number of RF devices were fabricated in a
180 nm RF CMOS technology by Atmel. DC characteristics and S-parameters up to 30 GHz were measured over a
wide range of geometries bias conditions. Scalability issues of the multi-finger RF device structure are addressed.
The EKV3 model is validated for DC and RF performance.
Evaluation of RF IC design-relevant quantities, such as Yparameters, transit frequency, unilateral gain and maximum oscillation frequency versus bias current, is presented.
2 Experimental Within this work, a study on RF devices from a modern Si CMOS technology is conducted.
The process is a double-poly, twin-well process with 4
metal layers, rated at 1.8 V. The process offers many analog options such as analog metals, additional well etc. The
gate length L of the RF devices fabricated ranges from the
minimum of 180 nm to 360 nm. The width Wf of each finger ranges between 1 m and 4 m while the number of
fingers NF from 1 to 9. Both NMOS and PMOS devices
were studied. DC and RF measurements were performed
on all devices.
Two port S-parameter measurements were performed
on-wafer with an HP8510C vector network analyzer from
50 MHz to 30 GHz, with CW input power of -5 dBm and
attenuation of 10 dB on Port 1 (gate), and an averaging
factor of 256. CW power overdrive was controlled and was
not present due to large pad parasitics in comparison to the
tiny DUT. S-Parameters of a DUT were obtained after a
careful OPEN and SHORT de-embedding procedure. On 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
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(a)
(b)
Figure 1 (a) A chip microphotograph showing the MOSFET device, the Ground-Signal-Ground pads and the RF probes after
they have made contact. (b) Layout of a typical multi-finger MOS
transistor for HF applications (NMOS; NF = 9).
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phys. stat. sol. (c) 5, No. 12 (2008)
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Figure 6 H21, unilateral gain, fT, fmax, Re(Y21), Re(Y22) vs. ID,
evaluated at 5 GHz, of an NMOS (same as in Fig. 4). Markers
represent measurements (VDS = 0.5 (), 1.2 (o), 1.3 () V, with
VSB = 0 V) and lines the EKV3 model.
fT =
f
Im (Y11 Y21 )
U=
H 21 H12
,
4 (Re( H11 ) Re( H 22 ) + Im( H11 ) Im( H 22 ))
(1)
2
f max = U ( f ) f .
(2)
(3)
Figure 7 H21, unilateral gain, fT, fmax, Re(Y21), Re(Y22) vs. ID,
evaluated at 5 GHz, of a PMOS device (same as in Fig. 5). Markers represent measurements (VDS = -0.5 (), -1.2 (o), -1.3 () V,
with VSB = 0 V) and lines the EKV3 model.
References
[1] C. C. Enz and E. A. Vittoz, Charge-based MOS Transistor
Modeling (Wiley, 2006); ISBN 978-0-470-85541-6.
[2] M. Bucher, A. Bazigos, F. Krummenacher, J.-M. Sallese, and
C. Enz, EKV3.0: An Advanced Charge Based MOS Transistor Model, in: Transistor Level Modeling for Analog/RF IC
Design, edited by W. Grabinski, B. Nauwelaers, and D.
Schreurs, Chap. 3 (Springer, 2006), pp. 67-95.
[3] A. Bazigos, M. Bucher, and S. Yoshitomi, Benchmarking the
EKV3 MOSFET Model in Verilog-A and 0.14 m CMOS,
Proc. 11th Int. Conf. MIXDES, pp. 104-109, June 2004.
[4] S. Yoshitomi, A. Bazigos, and M. Bucher, EKV3 Parameter
Extraction and Characterization of 90 nm RF-CMOS, Proc.
14th Int. Conf. MIXDES, pp. 74-79, June 2007.
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Contributed
Article
phys. stat. sol. (c) 5, No. 12 (2008)
3685
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