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Design and fabrication techniques for lumped-element circuits at microwave frequencies. A1.0-Gc, two-stage
transistor amplifier illustrates the design procedure. Thin films and bonded transistor chips are used.
March, 1968
The latest microelectronic techniques now make possible the design of lumped-constant circuits at microwave
frequencies. Whereas a few hundred megacycles appeared to be the limit for lumped-constant conventional
circuits in the past, new methods extend this to over 1 Gc.
The usual criteria for the use of lumped components is that the largest linear dimensions of such components
should not exceed 1/100 wavelength. So-called conventional components usually fail this test at less than 300
Mc.
At 1.0 Gc, the free-space wavelength is 30 cm. For a medium with a dielectric constant of four, the wavelength
reduces to 15 cm. In this medium, the maximum linear dimension of a component (based on 1/100 ) is 1.5 mm,
or about 0.060 in.
Fortunately, the new thin-film components meet the spatial requirement in the lower microwave region.
Although tin-film inductors, for instance, are only practical into the nanohenry range, needed inductance above
300 Mc is usually low enough to make such inductance useful.
Criteria for thin-film components
By imposing the spatial restrictions on thin-film components, attainable values at microwave frequencies are as
follows:
Resistors: The value of a thin-film resistor is
where
RS = specific resistance of a film in ohms per square,
L = resistor length, and
W = resistor width.
The specific resistances generally used are in the order of a few hundred ohms per square (e.g., 200), and usable
line widths can be as small as 0.001 in. Thus, thin-film resistors for use at microwaves can be fabricated in the
range from 4 to 400,000 ohms.
where
L = inductance in microhenries,
N = number of turns,
g = mean coil diameter in inches, and
c = the radial coil depth in inches, assuming the conductor width equals the conductor spacing.
In a 0.050-in. dia circle, the maximum inductance obtainable is 125 nH. The specific resistivity of thin-film
conductors is normally about 0.05 ohms per square, from which it follows that the inductors will have Qs of
about 20. The minimum inductance for a 0.050-in. conductor pad is on the order of 0.2 nH.
The advantage of using lumped constants at the lower microwave frequencies is essentially one of size. If a
distributed technique is used (such as microstrip on alumina) each distributed element will be about a quarterwavelength on a side. Alumina has a dielectric constant of nine; thus, a quarter wavelength at 1.0 Gc is about 1.0
in. A single-stage microstrip amplifier will consequently occupy an area of about 2 in.2. If thin-film lumped
components on a glass substrate are used, a two-stage amplifier occupies an area of only about 0.08 in.2. Thus
the reduction in size is appreciable.
Transistor parameters
Transistors are obtainable in all types of packages ranging from TO-18 cans to bare uncased chips. Several
manufacturers supply units in TO-50 cans or other packages compatible with strip-line or microstrip circuitry.
Data on such transistors for use at microwave frequencies are often minimal. Although some manufacturers
supply y-parameter curves over an extended frequency range, such parameters are generally given for cased
units only and do not reflet the characteristics of the bare chips. The packaged transistor parameters, however,
are not bad approximations to determine device performance when wire bonding the bare chips to substrates,
because wire lengths are uncased or in a can.
Design example
A two-stage transistor amplifier, using lumped-constant passive components was designed to illustrate the
techniques involved.
A type TI 2N3570 transistor was selected on the basis of cost and availability, and good datasheet information
covering pertinent characteristics at the frequency of interest, 1.0 Gc. Parameters for a TO-18 cased transistor
are given on the data sheet, but an assumption was made that the chip bonded to a thin-film substrate exhibits
similar y parameters.
The amplifier design is considered an extension to the microwave region of lower frequency design techniques.
Thus, the Linvill method was chosen as a starting point. This design technique consists basically of using
transistor two-port parameters (in this case, the y or admittance parameters) to determine values of gain for
different input and output terminations. After determining the terminations required for a specific gain,
matching networks are designed to conjugately match the transistor with its input source and output load
impedance.
By calculations, the maximum available gain for this
transistor at 1.0 Gc is 8.8 dB; the load termination required
for this gain is (2.15 j7.83) x 10-3 mho. A matching network
is designed to transform a 50-ohm load to this admittance.
The input source is then conjugately matched to the input
admittance of the transistor, which is determined on the
basis of the transistor y parameters and the load admittance.
Two stages of gain are used to obtain a maximum theoretical
gain of about 17 dB. The interstage matching network is
designed to match the output admittance of the first stage to
the input admittance of the second stage using a 50-ohm
load and source.
The completed circuit of the two-stage amplifier is shown in
Fig. 1. The power-supply by-pass capacitors are the largest
possible for the available space on the thin-film substrate.
In packaging the amplifier, the holder or box was designed
with the following criteria in mind:
small size,
adequate grounding of the thin-film substrate,
minimum length of signal leads, and
reduction of stray capacity.
A cut-away view of the brass case is shown in Fig. 2. Notice
that the area directly under the substrate is machined to
separate the ground plane from the bottom of the substrate.
This is done to minimize capacitive coupling that could
significantly alter the performance of the amplifier due to the
small values of capacitances used in the design.
The box is machined from solid brass and accepts the rf
connectors directly. The thin-film substrate rests on