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(Received 1 March 2015; accepted 28 April 2015; published online 2 June 2015)
Negative hydrogen/deuterium ions can be formed by processes occurring in the plasma volume and
on surfaces facing the plasma. The principal mechanisms leading to the formation of these negative
ions are dissociative electron attachment to ro-vibrationally excited hydrogen/deuterium molecules
when the reaction takes place in the plasma volume, and the direct electron transfer from the low
work function metal surface to the hydrogen/deuterium atoms when formation occurs on the surface. The existing theoretical models and reported experimental results on these two mechanisms
are summarized. Performance of the negative hydrogen/deuterium ion sources that emerged from
studies of these mechanisms is reviewed. Contemporary negative ion sources do not have negative
ion production electrodes of original surface type sources but are operated with caesium with their
structures nearly identical to volume production type sources. Reasons for enhanced negative ion
C 2015 AIP Publishing LLC.
current due to caesium addition to these sources are discussed. V
[http://dx.doi.org/10.1063/1.4921298]
TABLE OF CONTENTS
I. INTRODUCTION . . . . . . . . . . . . . . . . . . . . . . . . . . . .
A. Need of D negative ion beams for
magnetic confinement fusion . . . . . . . . . . . . .
B. Need of H negative ion beams for high
energy accelerators . . . . . . . . . . . . . . . . . . . . . .
II. THE VOLUME PRODUCTION MECHANISM. .
A. Early direct extraction negative ion sources
(before 1980) . . . . . . . . . . . . . . . . . . . . . . . . . . .
B. Observation of a new H ion formation
mechanism in the plasma volume. . . . . . . . . .
C. Theoretical and experimental work on H
formation by DA to excited H2 molecules . .
D. Rovibrationally excited H2 molecule
populations in low temperature plasmas . . . .
E. Experimental validation of the volume
production mechanism . . . . . . . . . . . . . . . . . . .
F. Effect of wall material . . . . . . . . . . . . . . . . . . .
G. Isotope effect in negative ion production in
H2 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .
III. VOLUME PRODUCTION H ION SOURCES .
A. The Penning volume negative ion source . . .
B. The magnetically filtered multicusp volume
negative ion source . . . . . . . . . . . . . . . . . . . . . .
1. Role of the magnetic filter . . . . . . . . . . . . .
2. Role of the plasma electrode . . . . . . . . . . .
C. Volume negative ion sources for fusion
applications. . . . . . . . . . . . . . . . . . . . . . . . . . . . .
D. Volume negative ion sources for accelerator
applications . . . . . . . . . . . . . . . . . . . . . . . . . . . .
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in the plasma volume, H/D ions are formed by dissociative attachment (DA) of electrons to ro-vibrationally
excited hydrogen/deuterium molecules
on surfaces, H/D ions are formed by the interaction
between hydrogen/deuterium plasma and low work function surface facing the plasma.
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In 1977, Nicolopoulou et al.19 calculated the equilibrium density of hydrogen negative ions in a low pressure
hydrogen plasma by taking the known production and
destruction processes into account. At that time, the known
production processes due to low energy electrons were dissociative electron attachment to hydrogen molecules in their
ground state and dissociative recombination of molecular
positive ions H2. Measurement of the negative ion density
in a plasma produced in a magnetic multipole using a probe
diagnostic technique indicated that the measured H ion
density was higher by a factor of 100 than the equilibrium
density predicted from the calculation based upon the data of
known formation and destruction processes. This result was
confirmed in 1979 by Bacal and Hamilton20 using a photodetachment diagnostic technique for the measurement of the
H ion density. They also extended the measurements to a
deuterium plasma. Figure 2 shows the dependence of the
negative ion density n upon the electron density ne in H2
and D2 plasmas confined only by their ambipolar potential.
The neutral gas density was 2 1014 cm3. Figure 2 indicates that the negative-ion density is not isotope dependent
but increases approximately in proportion to ne3 in the studied range of electron density. In H2, the electron temperature
varied in the range from 0.10 to 0.40 eV, while at maximum
density the ratio of n/ne was 0.35.
FIG. 2. Dependence of the negative ion density n- upon the electron density
ne in H2 and D2. Reproduced with permission from M. Bacal and G. W.
Hamilton, Phys. Rev. Lett. 42, 1538 (1979). Copyright 1979 American
Physical Society.
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Two mechanisms, unknown at that time, involving intermediate states to form H were proposed19,20 in order to
explain the observed nonlinear dependence of the H density
upon the plasma density and the high H density: (1) DA of
electrons to vibrationally excited hydrogen molecules,2628
and (2) DA to electronically excited long-lived states of
hydrogen molecules H2(C3Pu), with assumed higher DA
cross sections.29
C. Theoretical and experimental work on H2 formation
by DA to excited H2 molecules
(1)
(2)
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in the survival factor, which is the probability that the resonant state dissociates without autoionization. This factor is
increased because electron capture can occur at larger distance due to the larger amplitude of the vibrational motion in
excited vibrational states and to the centrifugal stretching in
excited rotational states. The dependence of the DA rate coefficients on the electron temperature is reported by Wadehra34
for all the vibrational and rotational states of H2 and D2.
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cross sections calculated by this theory are plotted for a series of initial vibrational states, v00 011.
However, the theory of Horacek et al.39 leads to a new
view on the effect of rotational excitation on the DA cross
section. Figure 8 shows the effect of rotational excitation of
the target for v 0 as obtained from this theory. It shows
that with increasing J, the rotational heating increases the
cross section more efficiently than the vibrational heating,
opposite to what is well known at low J. The highest cross
section for an endothermic DA process is obtained for
v00 2, J 23. This reaction opens at 113 meV and the cross
2 at 249 meV.
section reaches the value of 20.1 A
D. Rovibrationally excited H2 molecule populations in
low temperature plasmas
Following the above pioneering works, it was questioned what processes are generating sufficient density of
excited hydrogen molecules at higher ro-vibrational levels.
A review on the physics aspects of negative ion sources40
indicated that both electron-molecule collisions in the
plasma volume and recombinative desorption of atomic
hydrogen from wall surfaces are contributing to the
generation of ro-vibrationally excited molecules. An effective source of highly vibrationally excited molecules, generated by electron-molecule collisions, was identified in 1980
by Kunkel:41 the radiative decays from higher electronic
states excited by collisions of ground state molecules with
energetic primary electrons
H2 1 Rg ; v00 0 e ! H2 B1 Ru ; C1 Pu e;
(3)
(4)
FIG. 9. Cross section r(v00 ), for the excitation of the vibrational levels of
H2X1Rg by electron collisional excitation through the B and C states.
Reproduced with permission from J. Appl. Phys. 70, 3409 (1991). Copyright
1991 AIP Publishing LLC.
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FIG. 11. Vibrational population distribution for a volume source. The experimental points (the closed circles) were obtained at 25 A, 120 V, and 8
mTorr H2. The solid line corresponds to a vibrational temperature of
4150 K. The triangles represent the calculated values of Hiskes and Karo,53
normalized to the experimental data at v00 1. Reproduced with permission
from AIP Conf. Proc. 210, 450 (1991). Copyright 1991 AIP Publishing
LLC.
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magnetic multipole plasma source with dc filament excitation, Mosbach54 applied laser-induced fluorescence spectroscopy in the VUV (for molecules with high v00 ) and optical
emission spectroscopy (for molecules with v00 < 4). Mosbach
reports that the population distribution is non-Boltzmann.
For high vibrational states, a plateau is formed, and for small
discharge current a hump appears (see Figure 12).
E. Experimental validation of the volume production
mechanism
The existence of an afterglow peak in the extracted negative ion current from a pulsed hydrogen discharge in a multicusp ion source was used as an experimental validation of
the volume production mechanism.55 In the experiment of
Hopkins and Mellon,55 the vibrationally excited molecules
are produced by energetic electrons and they live some time
after the end of the discharge pulse. Low energy electrons
attach to these molecules in the afterglow, while electron
detachment by fast electrons is reduced. As a result, an
increase of the negative ion density and extracted current
occurs as shown in Figure 13.
An important diagnostic effort by Mosbach allowed one
to compare the H ion density measured by laser induced
photodetachment to that calculated from the measured spectrum of ro-vibrationally excited levels of hydrogen molecules (shown in Figure 12). The calculated density of the
negative ions is in good agreement with the measured H
density, as shown in Figure 14.54 This agreement proves the
validity of the volume production mechanism, on which the
model used in the calculation is based.
F. Effect of wall material
FIG. 12. Total density of vibrational states as a function of discharge current. Reproduced with permission from T. Mosbach, Plasma Sources Sci.
Technol. 14, 610 (2005). Copyright 2005 Institute of Physics.
FIG. 13. The extracted negative ion current from a pulsed hydrogen discharge. The gas pressure is 2.4 mTorr, the discharge pulse length is 2.7 ms,
the repetition rate is 87 Hz, and the discharge current is 15 A. Reproduced
with permission from M. B. Hopkins and K. N. Mellon, Phys. Rev. Lett.
67(4), 449 (1991). Copyright 1991 American Physical Society.
FIG. 14. Comparison of H ion densities measured by laser induced photodetachment (full squares) and calculated from vibrational population distributions of ground state hydrogen molecules (open squares). Reproduced
with permission from T. Mosbach, Plasma Sources Sci. Technol. 14, 610
(2005). Copyright 2005 Institute of Physics.
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FIG. 15. Variation of extracted negative ion and electron currents on plasma
electrode bias. The effect of films of tantalum, tungsten, and caesium deposited on the walls is shown. Reproduced with permission from Rev. Sci.
Instrum. 75, 1699 (2004). Copyright 2004 AIP Publishing LLC.
FIG. 17. Dissociative Attachment cross sections for various rotational levels
of the ground vibrational state of the deuterium molecule. Reproduced with
permission from J. N. Bardsley and J. M. Wadehra, Phys. Rev. A 20, 1398
(1979). Copyright 1979 American Physical Society.
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D2. See Ref. 32 for a review and Figure 18 for the experimental results of Schulz and Asundi68 in the threshold range
from 3.75 to 5 eV. The experimental results measured in
the range from 7 to 18 eV by Rapp et al.69 are shown in
Figure 19. It should be noted that the experimental curves of
Schulz and Asundi shown on the left part of Figure 18
have peak cross sections differing by orders of magnitude
(1.6 10 21 cm2 for H2, 1 1022 cm2 for HD, and 8
1024 cm2 for D2). Whereas the H/H2 cross section was
obtained with an electron energy distribution of 0.1 eV, the
curves for HD and D2 had to be taken with an energy distribution of 0.45 eV in order to gain sensitivity. This accounts
for the difference in threshold behavior.
The isotope effect was first interpreted by Demkov70,71
as the consequence of the smaller survival probability factor
for heavier atoms. More recent theoretical studies of the
A review presenting the H ion sources based on volume production by dissociative attachment (denoted Volume
Production Sources, VPS) was published in 2005.73 The
present article covers only a brief introduction to the development of VPS. We refer the readers to the mentioned
review for a detailed presentation of this development, as
well as the brief review dedicated to fusion experiment application.74 Shortly, after the early attempts (1959) to extract
directly negative ions from a duoplasmatron, three main
types of VPS became available:73 the Penning discharge ion
source9 (1965), the tandem multicusp plasma container75,76
(1980), and several versions of RF sources.60,61 Magnetic
multicusp VPS for fusion applications have been developed
in the US,75 France,76 UK,77 and Japan.78,79
A. The Penning volume negative ion source
FIG. 19. Measured total cross sections for negative-ion formation in H2,
HD, and D2 as functions of electron energy in a total-ionization tube.
Reproduced with permission from Rapp et al., Phys. Rev. Lett. 14, 533
(1965). Copyright 1965 American Physical Society.
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FIG. 20. Scheme of reflex-type ion source. (1) Heated cathode, (2) cathode
aperture, (3) anode chamber, (4) extraction electrode, (5) holes for gas supply, (6) discharge column, and (7) anticathode. Reproduced with permission
from Rev. Sci. Instrum. 67, 1622 (1996). Copyright 1996 AIP Publishing
LLC.
(b)
The magnetic filter field should be strong enough to prevent the energetic primary electrons in the driver region
from being transported into the extraction region. However,
positive and negative ions of larger Lamor radii and cold
electrons reflected at the source wall can move across the
magnetic filter. Due to the confinement by the magnetic filter
field, a relatively large concentration of fast electrons builds
up in the driver region, while a low temperature plasma fills
the extraction region. Vibrationally excited molecules can be
formed in the driver region, essentially by the E-V process
(Eqs. (3) (4)). They can be converted to negative ions by
DA in collision with slow electrons in both regions, but the
chance of the negative ions to survive is larger in the extraction region.
The first experiments with the negative ion tandem source
were performed in the early eighties at the Lawrence Berkeley
National Laboratory90 and at Ecole Polytechnique.91 The magnetic filter was of internal rod-type, i.e., was constructed by
inserting square permanent magnet rods into copper tubes
through which a square hole for the magnet was broached.
This magnetic filter was inserted into a cylindrical multicusp
ion source geometry, formed by ten columns of samariumcobalt magnets, forming continuous line cusps parallel to the
source axis. These magnets formed closed magnetic line cusp
field with four extra rows of magnets attached at the end plate.
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FIG. 21. Design of the source CAMEMBERT III equipped with: (a) 16 filaments or (b) seven ECR modules. The design of an ECR module is also shown in
(b). Fig. 21(a) was reproduced with permission from Rev. Sci. Instrum. 64, 3205 (1993). Copyright 1993 AIP Publishing LLC. Fig. 21(b) was reproduced with
permission from Phys. Plasmas 20, 101601 (2013). Copyright 2013 AIP Publishing LLC.
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FIG. 22. H ion relative density (n-/ne) in the target (extraction) chamber of
a tandem source versus the plasma electrode bias voltage. Reproduced with
permission from Rev. Sci. Instrum. 55(3), 338 (1984). Copyright 1984 AIP
Publishing LLC.
FIG. 23. Typical evolution of the extracted electron and negative-ion currents as a function of the plasma electrode bias. The plasma electrode current is also shown. Reproduced with permission from Svarnas et al., IEEE
Trans. Plasma Sci. 35, 11561162 (2007). Copyright 2007 IEEE.
FIG. 24. Dependence of the extracted negative ion (a) and electron (b) currents upon the PE bias, with different stray magnetic fields in front of the
PE: open circlehigh B, full circle medium B, and crosslow B. 50 V,
10 A, 2.5 mTorr discharge. Extraction voltage: 1 kV. Reproduced with permission from Rev. Sci. Instrum. 59, 2152 (1988). Copyright 1988 AIP
Publishing LLC.
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FIG. 25. Dependence upon the PE bias of the extracted currents (positive
ion I, negative ions I, and electron Ie) and of the current to the PE, Ib. The
range of the plasma potential variation is indicated on the top of the figure.
These results are measured for a discharge of 50 V, 5 A, 2 mTorr.
Reproduced with permission from Rev. Sci. Instrum. 59, 2152 (1988).
Copyright 1988 AIP Publishing LLC.
FIG. 26. Variation of the negative ion density n- and electron density ne versus plasma electrode bias Vb at 8 mm from the PE. The measurement is
made at 8 mm from the PE where a weak transverse magnetic field is present. The discharge is operated at 50 V, 50 A, 3 mTorr. Reproduced with permission from Rev. Sci. Instrum. 67, 2221 (1996). Copyright 1996 AIP
Publishing LLC.
FIG. 27. Variation with plasma electrode bias Vb of the ratio n/ne measured
in Camembert III at 8 mm from the PE. Same discharge operation conditions
as in Fig. 26. Reproduced with permission from Rev. Sci. Instrum. 67, 2221
(1996). Copyright 1996 AIP Publishing LLC.
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FIG. 28. Variation of extracted H and electron currents with plasma electrode bias potential in the Culham source. The current I3 is the current which
breaks through the electron suppression electrode. Reproduced with permission from Rev. Sci. Instrum. 56, 1697 (1985). Copyright 1985 AIP
Publishing LLC.
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FIG. 31. H ion density dependence upon the gas pressure in the magnetic
multipole source operated with a filament discharge measured by Mosbach.
The pressure dependence of the population of vibrationally excited molecules in the vibrationally excited state v00 10 is also shown. Open symbols
are calculated values, and solid symbols are measured values. Reproduced
with permission from Rev. Sci. Instrum. 77, 03A532 (2006). Copyright 2006
AIP Publishing LLC.
FIG. 30. Electron and H ion density dependence on the gas pressure in the
microwave driven source Camembert III. Reproduced with permission from
Rev. Sci. Instrum. 77, 03A352 (2006). Copyright 2006 AIP Publishing LLC.
FIG. 32. H yield vs RF power in pure hydrogen and in hydrogen with addition of argon. Reproduced with permission from Speth et al., Fusion Eng.
Des. 46, 383 (1999). Copyright 1999 Elsevier.
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FIG. 33. IPP RF source with extraction system. Reproduced with permission
from Vollmer et al., Fusion Eng. Des. 5657, 465 (2001). Copyright 2001
Elsevier.
operated reliably up to 150 kW RF power and at source pressure as low as 0.2 Pa. For negative ion extraction, the plasma
source was combined with a three grid extraction system,
developed by CEA Cadarache (an uncooled molybdenum
plasma grid and two cooled copper grids). The 44 extraction
holes (14 mm diameter) were arranged in an area of 13 cm
14 cm. The total net extraction area of the grid system is
67 cm2. For pure volume production with about 20% admixture of argon, up to 9 mA/cm2 H current density at 0.65 Pa
was measured.
The source described by Vollmer is still used at the
BAvarian Test MAchine for Negative ions (BATMAN) testbed and operates reliably with the input power as high as
70 kW from the 100 kW oscillator.126 In 2002, Kraus
et al.127,128 described the development at IPP of a large rf
source for negative ion production. To protect the ceramic insulator of the driver from thermal stress, an internal copper
Faraday screen has been added. This prolonged the pulse duration of the source operation up to 15 s. Because there is no
filament material covering the inner surface of the RF source,
the use of different plasma grid materials is possible.
Therefore, Kraus et al.127,128 tested eight different plasma
grid materials as potential options for caesium-free operation,
as well as the effect of the addition of several noble gases, of
which the largest improvement of the plasma density was
found with xenon. With a fast scanning Langmuir probe, the
profile of plasma density was measured from the back plate to
0.8 cm from the plasma grid in one pulse. Recently, Kraus126
pointed out that the reported Argon effect was not caused
by a higher production of negative ions, but by a higher neutralization, which increased the H ion current densities
measured using a calorimeter, while the admixture of rare
gases did not affect significantly the extracted ion current.
An overview of the RF source development program at
IPP Garching aiming at demonstration for ITER-relevant
source parameters was given in 2006 by Speth et al.129 This
implies a current density of 200 A m2 accelerated D ions
at a source filling pressure of 0.3 Pa and an electron-to-ion
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In the late 1980s, LBNL developed a small filamentdriven volume source,139 with a 75 mm inner diameter using
FIG. 34. Schematic of the small (a) filament driven and (b) RF driven volume H source developed at LBNL.
Figure (a) was reproduced with permission from Rev. Sci. Instrum. 62,
100 (1991). Copyright 1991 AIP
Publishing LLC. Figure (b) was reproduced with permission from Rev. Sci.
Instrum. 60, 531 (1989). Copyright
1989 AIP Publishing LLC.
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step process; it is the direct electron transfer from solid material to a hydrogen atom leaving the surface. A simplified
one-dimensional potential diagram of the system can be
schematically illustrated in Fig. 36. The electron affinity of
hydrogen is only 0.754 eV, while surface work functions of
refractory metals, which can be immersed in dense plasma,
exceed 4 eV. Electron transfer from the metal to the hydrogen atom is not an efficient process under this condition.
When the work function of the metal surface is reduced by
alkali or alkaline earth metal adsorption and a hydrogen
atom approaches to the surface, the hydrogen affinity level
goes below the work function at a small distance from the
metal surface. The hydrogen atom captures an electron from
the metal to the affinity level and can escape from the surface
as an H ion. Thus, reduction of work function by alkali or
alkaline earth metal adsorption was considered responsible
for the enhancement of H current from a Cs loaded surfaceplasma source. By adopting the potential geometry in
Fig. 36, Kishinevskiy has shown that the probability for a
secondary H ion to leave the surface region without losing
the electron in the affinity level depends upon two important
parameters: the surface work function and H outgoing velocity component normal to the surface.166
A theoretical model to calculate destruction probability
of a negative ion near metal surface was formulated by Janev
by introducing parabolic coordinates.167 Hiskes also used
parabolic coordinates for solving complex eigen value problem to compute how the H affinity level shifted and broadened.168 He also pointed out that not only the work function
but also the potential structure near the surface influence the
survival of H ions. Rasser et al. have also computed the
level shift and broadening of the H electron affinity for
bare tungsten (W) substrate, thick Cs case and W covered by
a partial monolayer of Cs. The fractions of H ions against
the sum of neutral hydrogen and H ions were calculated for
the three cases as functions of the H velocity component
perpendicular to the surface.169 They also had suggested that
a simple formula can be used to estimate the negative hydrogen ion yield in the low exit energy condition, which was
earlier proposed by Blandin et al. for more general electron
transfer processes at the surface.170 Yields of H ions for
conditions identical to Rasser et al. but with a simple surface
geometry were calculated by Cui.171
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FIG. 39. Measured H ion yields for low energy hydrogen incident ions.
Reprinted with permission from J. Appl. Phys. 79, 2896 (1996). Copyright
1996 AIP Publishing LLC.
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(5)
where e is the unit charge, and jHn, RNn, and gn signify incident hydrogen flux, particle reflection coefficient, and negative ion yield for incoming hydrogen of species n,
respectively. The sum has to be calculated for incident species of kind n that include H, H2, H3, and atomic hydrogen H0. Ion induced desorption process also forms the
surface produced H current density jD of H/D ions
jD eRjn Yn gn :
(6)
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FIG. 42. Structure of Penning type SPS. Reproduced from Rev. Sci.
Instrum. 83, 02A728 (2012). Copyright 2012 AIP Publishing LLC.
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FIG. 43. Extracted H ion current from JAERI 10 Amp source, in caesiated
and pure hydrogen operation regimes. Reproduced with permission from
Rev. Sci. Instrum. 85, 02B103 (2014). Copyright 2014 AIP Publishing
LLC.265
FIG. 44. Variation of the extracted H ion current with the plasma electrode
bias voltage at two values of the extraction voltage, in pure hydrogen and
caesium seeded operation. The hydrogen pressure was 0.4 Pa. Reproduced
with permission from Rev. Sci. Instrum. 69, 932934 (1998). Copyright
1998 AIP Publishing LLC.
depending upon the bias voltage to the plasma grid (see also
Refs. 103 and 257):
(a)
(b)
(c)
In the whole bias range. The H ion current enhancement due to caesium can take place in the whole range
of bias voltage due to gettering of atomic hydrogen by
caesium. The effect of gettering is the reduction in H
destruction rate by associative and non-associative
detachment by atomic hydrogen.
Bias voltage below plasma potential. The enhancement
of extracted current at bias voltage negative with
respect to Vp (Vb < Vp) is usually ascribed to the direct
production of H ions by positive ions and atoms striking the low work function caesium covered surface.
Surface produced H ions leave the surface, traverse
across the sheath, migrate into plasma, and increase
H ion density in the source plasma.
Bias voltage above plasma potential. In pure hydrogen
discharge at positive bias voltage with respect to
plasma potential (Vb > Vp), volume produced H ions
form flow to the extraction electrodes. Flow of H ions
in the same bias voltage range but with the injection of
Cs into the source was confirmed in the experiments
conducted at the National Institute for Fusion Science
(Toki, Japan). Using cavity ring down spectroscopy for
measuring the negative ion density260 and a group of
Langmuir probes for estimating the flow of ions in the
source plasma,261 they have shown the result that a
substantial part of the H ions forming the extracted
beam current measured at Vb > Vp seems to originate in
the plasma beyond the magnetic filter toward the driver
region. Indeed, the results of these experiments show
that at Vb > Vp the induction of the electric field to
extract negative ions did not affect local negative ion
density near the plasma grid, which was reduced by the
electric field formed by the plasma grid bias. Negative
ions produced at the caesiated plasma grid cannot be
extracted due to the electric field to return surface
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All source temperatures have been controlled. The temperature of the source body was kept at 3040 C; the plasma
grid temperature was in the range of 110150 C. In contrast to filament driven arc sources, the power of the rf
plasma onto the plasma grid is not sufficient for obtaining
the required temperatures so that the plasma grid has to be
actively heated. This, however, has the advantage that the
plasma grid temperature can be kept constant during and
also between the plasma pulses.
When the source is well caesiated, optimum performance
of the source was obtained when the plasma grid was biased above the floating potential. In addition, it was found
possible to realize more reliable operation by controlling
the bias current instead of the bias voltage.
FIG. 45. Negative ion density and extracted ion current for different bias
voltages applied to the plasma electrode in deuterium discharges at 53 kW
and 0.45 Pa. Shows also the density to current ratio. Reprinted with permission from Christ-Koch et al., Plasma Sources Sci. Technol. 18, 025003
(2009). Copyright 2009 Institute of Physics.
VII. CONCLUSION
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12
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97
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178
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257
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