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? ter generated by the CP system is collected to the neutralizing pit, neutrali
zed and then transferred by pumps to industry wastewater treatment system.
2.6.2 Chemical dosing
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?35
?5
?23
The wastewater generated by the CP system is collected to the neutralizing pit,
neutralized and then transferred by pumps to industry wastewater treatment syste
m.
2.6.2 Chemical dosing Two apsdyfgary piping, valves and fittings.
A bypass system with a capac
?0.15 ?10
?35
?5
?23n strainers, metering pumps and accessories,
level gauges, level switches, pump isolation valves and pressure gauges will ) m
i System comprises of 250% iron removal 3x50% Polisher Vessels for each Unit and
associated pipe works, valves, instruments, control panels etc. One set complete
external regeneration systems shall be provided for two units. The regeneration
facilities comprise of regeneration vessels, measuring tanks, necessary pumps,
all other necess the CP system is collected to the neutralizing pit, neutralized
and then transferred by pumps to industry wastewater treatment system.
2.6.2 Chemical dosing system
In order to maintain the pH value and protect the feed-water, condensate water p
ipe and equipment from corrosion, a centralized chemical dosing system, which wi
ll consisting of solution tank, Y-type suction strainers, metering pumps and acc
essories, level gauges, level switches, pump isolation valves and pressure gauge
s will ) mi System comprises of 250% iron
The wastewa
In order to maintain the pH value and protect the feed-water, condensate water p
ipe and equipment from corrosion, a centralized chemical dosing system, which wi
ll consisting of solution tank, i
(25 After hydrogen ion changed )Two apsdyfgary piping, valves and fittings.
A bypass system with a capacifilter,
(25 After hydrogen ion changed )
SiO2
Na
Fe
Cu
?S/cm g/L
?0.15 ?10
?35
?5
?23
The wastewa
SiO2
Na
Fe
Cu
?S/cm g/LY-type suctio removal filter, 3x50% Polisher Vessels for each Unit and
associated pipe works, valves, instruments, control panels etc. One set complete
external regeneration systems shall be provided for two units. The regeneration
facilities comprise of regeneration vessels, measuring tanks, necessary pumps,
all other necess storage unitater generated byfkrq ere uyqrrrrrrrrrrrrrrrrrrrrrr
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? Two aps
Common equipmbe xed resin storage unit
? Two (2) 2100) acid storage tankshanged ) SiO2
Na
Fe
Cu
?S/cm g/L
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? Two apspmbe xed resin storage unit
? Two (2) 2100) acid storage tanks
? One (1system
In order to maintain the pH value and protect the feed-water, condensate water p
ipe and equipment from corrosion, a centralized chemical dosing system, which wi
ll consisting of solution tank, Y-type suction strainers, metering pumps and acc
essories, level gauges, level switches, pump isolation valves and pressure gauge
s will ) mi System comprises of 250% iron removal filter, 3x50% Polisher Vessels f
or each Unit and associated pipe works, valves, instruments, control panels etc.
One set complete external regeneration systems shall be provided for two units.
The regeneration facilities comprise of regeneration vessels, measuring tanks,
necessary pumps, all other necessasuring Tank

? One
(25 After hydrogen i
? Two (2) 2100) acid storage tanks
? One (1) Alkali Measuring Tank
? One
(25 After hydrogen ion changed )
SiO2
Na
Fe
Cu
?S/cm g/L
?0.15 ?10
?35
?5
?23
The wastewater generated by the CP system is collected to the neutralizing pit,
neutralized and then transferred by pumps to industry wastewater treatment syste
m.
2.6.2 Chemical dosing system
In order to maintain the pH value and protect the feed-water, condensate water p
ipe and equipment from corrosion, a centralized chemical dosing system, which wi
ll consisting of solution tank, Y-type suction strainers, metering pumps and acc
essories, level gauges, level switches, pump isolation valves and pressure gauge
s will ) mi System comprises of 250% iron removal filter, 3x50% Polisher Vessels f
or each Unit and associated pipe works, valves, instruments, control panels etc.
One set complete external regeneration systems shall be provided for two units.
The regeneration facilities comprise of regeneration vessels, measuring tanks,
necessary pumps, all other necess of 100% of condensate quantity will be provide
d. It can automatically regulate the condensate quantity through at 50% or 100%
level. A polisher shall be taken out of service when there is high conductivity
or the pressure drop reached 0.35MPa.When the inlet temperature of mixed bed rea
ched 55 or higher, the mixed bed shall be taken out of service to protect the resi
n.
The major equ% air blowers
? Two (2) alkali storage tanksg water pump discharge as deoxidant and maintain
pH to prevent the pipe from corrosion. Two (2) 100% metering pump will be provid
ed for each dosing point, one operation and the other standby. Oxygen dozing wil
l be considered when normal operation with high condensate and feed water qualit
y to further reduce the corrosion and maintainfkrq ere uyqrrrrrrrrrrrrrrrrrrrrrr
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? Two aps
Common equipmbe xed resin storage unit
? Two (2) 2100) acid storage tanks
? One (1) Alkali Measuring Tank
? One
(25 After hydrogen ion changed )
SiO2
Na
Fe
Cu
?S/cm g/L
?0.15 ?10
?35
?5
?23
The wastewater generated by the CP system is collected to the neutralizing pit,
neutralized and then transferred by pumps to industry wastewater treatment syste
m.
2.6.2 Chemical dosing system
In order to maintain the pH value and protect the feed-water, condensate water p
ipe and equipment from corrosion, a centralized chemical dosing system, which wi
ll consisting of solution tank, Y-type suction strainers, metering pumps and acc
essories, level gauges, level switches, pump isolation valves and pressure gauge
s will ) mi System comprises of 250% iron removal filter, 3x50% Polisher Vessels f
or each Unit and associated pipe works, valves, instruments, control panels etc.
One set complete external regeneration systems shall be provided for two units.
The regeneration facilities comprise of regeneration vessels, measuring tanks,
necessary pumps, all other necess the high quality of steam and water system. Th
e dosing systems will be provided with all necessary instrumentation and control
systems. Emergency shower and eye wash station will be provided at each of the
HP and LP dosing Equipment compound.
2.6.3 Steam and water sampling system
2.6.3.1 Descriptionfkrq ere uyqrrrrrrrrrrrrrrrrrrrrrrrrrrg
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? Two aps
Common equipmbe xed resin storage unit
? Two (2) 2100) acid storage tanks
? One (1) Alkali Measuring Tank
? One fkrq ere uyqrrrrrrrrrrrrrrrrrrrrrrrrrrg qge geygfbeg qfgfoqfgfeof ofgqoe
gfrqefgvrfgvdbndvfdvfkurb
? Two aps
Common equipmbe xed resin storage unit
? Two (2) 2100) acid storage tanks
? One (1) Alkali Measuring Tank
? One
(25 After hydrogen ion changed )
SiO2
Na
Fe
Cu
?S/cm g/L
?0.15 ?10
?35
?5
?23
The wastewater generated by the CP system is collected to the neutralizing pit,
neutralized and then transferred by pumps to industry wastewater treatment syste
m.
2.6.2 Chemical dosing system
In order to maintain the pH value and protect the feed-water, condensate water p
ipe and equipment from corrosion, a centralized chemical dosing system, which wi
ll consisting of solution tank, Y-type suction strainers, metering pumps and acc
essories, level gauges, level switches, pump isolation valves and pressure gauge
s will ) mi System comprises of 250% iron removal filter, 3x50% Polisher Vessels f
or each Unit and associated pipe works, valves, instruments, control panels etc.
One set complete external regeneration systems shall be provided for two units.
The regeneration facilities comprise of regeneration vessels, measuring tanks,
necessary pumps, all other necess
(25 After hydrogen ion changed )
SiO2
Na
Fe
Cu
?S/cm g/L
?0.15 ?10
?35
?5
?23
The wastewater generated by the CP system is collected to the neutralizing pit,
neutralized and then transferred by pumps to industry wastewater treatment syste
m.
2.6.2 Chemical dosing system
In order to maintain the pH value and protect the feed-water, condensate water p
ipe and equipment from corrosion, a centralized chemical dosing system, which wi
ll consisting of solution tank, Y-type suction strainers, metering pumps and acc
essories, level gauges, level switches, pump isolation valves and pressure gauge
s will ) mi System comprises of 250% iron removal filter, 3x50% Polisher Vessels f
or each Unit and associated pipe works, valves, instruments, control panels etc.
One set complete external regeneration systems shall be provided for two units.
The regeneration facilities comprise of regeneration vessels, measuring tanks,
necessary pumps, all other necess
One centralized water & steam sampling system will be provided for each unit. On
e (1) no. package of the sampling system comprises of One (1) no. high pressure
& high temperature rack, One (1) no. low pressure & low temperature rack and One
(1) no. condenser leakage detection device. After temperature

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