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2
perature dependence T in the pre-exponential fac-
.
tor as the ballistic electron case, but contains the
mobility and density of states in the form reminis-
w x
cent of Schottky diffusion 5 . The proportionality to
mobility justifies the assumption by Gartstein and
w x
Conwell 8 discussed above concerning the metal-
to-organic hopping rate.
To estimate the surface recombination velocity in
materials of interest, take a mobility, at room tem-
perature, of 10
y5
cm
2
V
y1
s
y1
; then one obtains
.
y1
S 0 s0.6 cm s . As expected this is considerably
2
.
barrier lowering i.e., without the factor 4c overes-
timates the current, indicating that surface recom-
bination continues to play a role at high field.
Note that the mechanism described in this Letter
relates only to the interface, not the bulk, of organic
semiconductor devices. In particular, there is no
assumption made regarding bulk vs. injection limited
currents and the ensuing effects of space charge.
Additional calculations are needed to determine,
self-consistently, the interfacial charge density, n ,
0
and the corresponding electric field there. The ex-
pressions given here do however permit an estimate
of the maximum injection current which may help to
determine into which regime a particular device falls
at a given temperature and voltage. Nor have we
discussed tunneling injection which will add an addi-
tional component to the current at high electric fields
and may become dominant for large values of elec-
tric field andror low temperature.
In summary, we have used Langevin theory in
conjunction with the concept of image potential at a
metal interface and the principle of detailed balance
to derive the surface recombination velocity and
effective Richardson constant describing charge in-
jection at the interface between an amorphous semi-
conductor and a metal. It will be interesting to make
experimental tests of the predictions contained in the
derived expressions. The simple picture leads to an
expression for the net current that is in substantial
agreement with, and interpolates between, the two
limits of a more exact calculation.
Acknowledgements
This work was supported in part by the NSF
Materials Research Science and Engineering Center
Grant DMR-9400354 for CPIMA.
( ) J.C. Scott, G.G. MalliarasrChemical Physics Letters 299 1999 115119 119
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