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phase stability
J. Lu
a,
*
, H. Hugosson
b
, O. Eriksson
b
, L. Nordstrom
b
, U. Jansson
a
a
Department of Inorganic Chemistry, A
3
) V
calc
(A
3
) B
t
(GPa)
g-MoC
1.0
20.430
a
20.255 381
d-MoC
1.0
20.261 364
g
0
-MoC
1.0
20.391 369
g-MoC
0.75
19.838 333
d-MoC
0.75
19.614
a
19.396 337
g
0
-MoC
0.75
20.422
b
19.697 330
a
Ref. [1].
b
This study.
trations ranging from about 0.6% up to about 15% yielded
only lms consisting of d-MoC
12x
in the centre of the reac-
tor (the H
2
content was 25% in these experiments).
4.2. Deposition of nanocrystalline d-MoC
12x
As mentioned above, lms of cubic d-MoC
12x
can be
deposited in a wide deposition zone from gas mixtures
containing substantial amounts of hydrogen. The deposition
rate of this phase is favoured by a high H
2
content in the
vapour. Growth rates of about 1 mm/h can easily be attained
at 8008C using a gas mixture of 30% H
2
. No attempts,
however, have been carried out to optimize the growth
rate and it is likely that considerably higher growth rates
can be attained by a tuning of the deposition process.
XPS analyses showed that the d-MoC
12x
lms were
chlorine-free. Analysis with SAM on freshly prepared
lms showed that the oxygen content was less than about
0.5 at.% (close to the detection limit). It should be noted,
however, that the lms probably contain even less oxygen
since the samples are oxidized during transport to the analy-
sis chamber. This gives a small contribution in the oxygen
analysis also after argon ion sputtering due to e.g. shadow-
ing effects.
The XPS analysis also showed that the d-MoC
12x
lms
always contained free carbon. This can be seen in the C1s
XPS spectra showing two peaks at 284.3 and 283.2 eV. The
latter peak is due to carbidic carbon while the peak at 284.3
eV can be attributed to CC (or CH) bonds from free
carbon. The exact nature of this carbon cannot be deter-
mined from XPS spectra. It can be graphite, turbostratic
carbon, amorphous carbon or some other type of carbon
with more or less aliphatic and/or aromatic character. In
this following this carbon will be described as `free carbon'.
An interesting observation was that the surface of the lms
contained large amounts of free carbon, which could be
removed, but not completely eliminated, by prolonged in
situ argon ion sputtering. In general, a sputtering time
ranging from a few minutes to more than 10 min was
required to reduce the relative amount of free carbon to a
`steady-state' value which we have identied as the bulk
content. The bulk content of free carbon (given by the inten-
sity ratio between the peaks at 284.3 and 283.2 eV) was
estimated to vary from about 11 to 2 at.% for different
samples. The bulk content of free carbon as well as the
thickness of the carbon-rich layer were found to be depen-
dent on experimental conditions used during lm growth.
Thicker surface layers and higher bulk content of free
carbon were obtained by decreasing the C
2
H
4
partial pres-
sure or/and by decreasing the H
2
content in the vapour. The
formation of free carbon was also dependent on the substrate
position in the reactor. In general, the free carbon content
(both in the bulk and on the surface) increased further down-
stream in the reactor.
As mentioned above, the total C/Mo ratio in the bulk of
the lms was dependent on the experimental conditions. For
example, XPS analysis of a typical d-MoC
12x
lm deposited
in the centre of the reactor using a gas mixture of 33% H
2
and 17% C
2
H
4
showed a total C/Mo ratio of 0.79. The bulk
content of free carbon in this lm could be estimated to
about 5 at.% from the relative intensities of the peaks at
284.3 and 283.2 eV after sputtering of the surface. This
gives a total carbon content in the carbide of about 41
at.% corresponding to a composition of d-MoC
0.69
.
Analyses of a number of lms showed that no signicant
variation in the carbide stoichiometry is obtained at different
vapour compositions and substrate positions. The carbon
content in the carbide will affect the cell parameter of the
cubic cell and an estimation of the carbon content can be
therefore be carried out from XRD data providing that the
relationship between composition and cell axis is known.
The cell parameters for the compositions MoC
0.69
and
MoC
0.75
have been determined by Rudy et al. to 4.266 A
and 4.281 A
.
This corresponds to a composition of about MoC
0.67
(40.1
at.% C) using a linear extrapolation of the data in Ref. [1].
No signicant variation in the cell parameter was found at
different vapour compositions. However, it was found that
the cell parameter of d-MoC
12x
will increase slightly at
higher total pressures.
Fig. 4a shows an X-ray diffractogram of a typical lm
where all peaks can be attributed to d-MoC
12x
[15]. The
diffractogram show that the lms are generally almost
texture-free although a slight (110)-texture could be
observed for lms deposited at low ethene concentrations.
A general observation, however, was that the diffraction
peaks are very broad. This can be due to several factors,
such as small grain sizes, stresses in the lms and composi-
tion variations. As will be shown below most of the line-
broadening can be attributed to a small grain size. The
average grain diameter can be estimated to about 6070 A
and c 10:98 A
thick d-MoC
0.67
lm deposited at
8008C. Deposition time: 30 min.
Fig. 6. X-ray diffractograms of (a) a g
0
-MoC
0.74
lm deposited at 8008C, (b)
after annealing of the g
0
-MoC
0.74
lm in vacuum at 10008C for 1 h and (c)
annealing of the g
0
-MoC
0.74
lm in C
2
H
4
at 10008C for 3 h.
Fig. 7. Cross-section TEM micrograph of a 2500-A
thick g
0
-MoC
0.74
lm
deposited at 8008C. d and g
0
represent d-MoC
12x
and g
0
-MoC
12x
, respec-
tively.
of about 250300 A
ngstrom Consortium
for nancial support.
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