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Introduction
So far, we have treated transistors as ideal switches An ON transistor passes a finite amount of current Depends on terminal voltages Derive current-voltage (I-V) relationships Transistor gate, source, drain all have capacitance I = C (V/t) -> t = (C/I) V Capacitance and current determine speed Also explore what a degraded level really means
MOS Characteristics
MOS majority carrier device Carriers: e-- in nMOS, holes in pMOS Vt channel threshold voltage (cuts off for voltages < Vt)
I vs. V Plots
Enhancement and depletion transistors
CMOS uses only enhancement transistors nMOS uses both
MOSFET Transistors
MOSFET For given Vds & Vgs, Ids controlled by:
Distance between source & drain L Channel width W Threshold VoltageVt Gate oxide thickness tox dielectric constant of gate oxide Carrier mobility
MOS Capacitor
Gate and body form MOS capacitor Operating modes
Vg < 0
+ -
(a)
(b)
(c)
Terminal Voltages
Mode of operation depends on Vg, Vd, Vs + Vgs Vgs = Vg Vs Vgd = Vg Vd Vs Vds = Vd Vs = Vgs - Vgd Source and drain are symmetric diffusion terminals By convention, source is terminal at lower voltage Hence Vds 0 nMOS body is grounded. First assume source is 0 too. Three regions of operation Cutoff Linear Saturation
Vg + Vgd Vds + Vd
nMOS Cutoff
No channel Ids = 0
Vgs = 0
+ s n+
+ d n+
Vgd
p-type body b
nMOS Linear
Channel forms Current flows from d to s e- from s to d Ids increases with Vds Similar to linear resistor At drain end of channel, only difference between gate & drain voltages effective for channel creation
Vgs > Vt Vgd = Vgs
+ s n+
+ d n+
Vds = 0
p-type body b
Vgs > Vt
+ s n+
+ d n+
p-type body b
nMOS Saturation
Channel pinches off Ids independent of Vds We say current saturates Similar to current source
Vgs > Vt
+ -
+ -
Vgd < Vt
n+ p-type body b
n+
I-V Characteristics
In Linear region, Ids depends on
How much charge is in the channel? How fast is the charge moving?
Channel Charge
MOS structure looks like parallel plate capacitor while operating in inversion
Gate oxide channel
Qchannel =
polysilicon gate W tox n+ L p-type body n+ SiO2 gate oxide (good insulator, ox = 3.9)
gate Vg
Channel Charge
MOS structure looks like parallel plate capacitor while operating in inversion
Gate oxide channel
Qchannel = CV C=
polysilicon gate W tox n+ L p-type body n+ SiO2 gate oxide (good insulator, ox = 3.9)
gate Vg
Channel Charge
MOS structure looks like parallel plate capacitor while operating in inversion
Gate oxide channel
Cox = ox / tox
gate Vg
Channel Charge
MOS structure looks like parallel plate capacitor while operating in inversion
Gate oxide channel
Cox = ox / tox Qchannel = CV C = Cg = oxWL/tox = CoxWL V = Vgc Vt = (Vgs Vds/2) Vt
polysilicon gate W tox n+ L p-type body n+ SiO2 gate oxide (good insulator, ox = 3.9)
gate Vg
Carrier velocity
Charge is carried by e Carrier velocity v proportional to lateral Efield between source and drain v=
Carrier Velocity
Charge is carried by e Carrier velocity v proportional to lateral Efield between source and drain v = E called mobility E=
Carrier Velocity
Charge is carried by e Carrier velocity v proportional to lateral Efield between source and drain v = E called mobility E = Vds/L Time for carrier to cross channel:
t=
Carrier Velocity
Charge is carried by e Carrier velocity v proportional to lateral Efield between source and drain v = E called mobility E = Vds/L Time for carrier to cross channel:
t=L/v
V ds
W = Cox L
V dsat 2
V ( 2
gs
Vt )
Cg ins 0 WL W = K ,K = , Cg = L WL D
Activity
1) If the width of a transistor increases, the current will increase decrease not change 2) If the length of a transistor increases, the current will increase decrease not change 3) If the supply voltage of a chip increases, the maximum transistor current will increase decrease not change 4) If the width of a transistor increases, its gate capacitance will increase decrease not change 5) If the length of a transistor increases, its gate capacitance will increase decrease not change 6) If the supply voltage of a chip increases, the gate capacitance of each transistor will increase decrease not change
MOS as switch
MOS can be viewed as switches. The switches are electrically controlled.
NMOS as a switch
Gate=Vdd Vin=Vdd I Load Capacitor Ground Gate=Vdd Vin=0 I Load Capacitor Ground Vgs Vout=Vdd Vgs Vout
Gate=1, Vin=0
CL begins to discharge toward 0 Good passer of 0.
Gate 0 1
Gate 0 1
Gate
Source Drain
pMOS OFF ON
nMOS OFF ON
OUTPUT Z INPUT
INPUT
OUTPUT
0 1
Gate
CMOS Inverter
Vcc
Vin
nMOS Operation
Cutoff Vgsn < Linear Vgsn > Vdsn < Saturated Vgsn > Vdsn >
VDD Vin Idsp Idsn Vout
nMOS Operation
Cutoff
Vgsn < Vtn
Linear
Vgsn > Vtn Vdsn < Vgsn Vtn
Saturated
Vgsn > Vtn Vdsn > Vgsn Vtn
nMOS Operation
Cutoff
Vgsn < Vtn
Linear
Vgsn > Vtn Vdsn < Vgsn Vtn
Saturated
Vgsn > Vtn Vdsn > Vgsn Vtn
nMOS Operation
Cutoff
Vgsn < Vtn Vin < Vtn
Linear
Vgsn > Vtn Vin > Vtn Vdsn < Vgsn Vtn Vout < Vin - Vtn
Saturated
Vgsn > Vtn Vin > Vtn Vdsn > Vgsn Vtn Vout > Vin - Vtn
VDD Vin Idsp Idsn Vout
pMOS Operation
Cutoff
Vgsp >
Linear
Vgsp < Vdsp >
Saturated
Vgsp < Vdsp <
pMOS Operation
Cutoff
Vgsp > Vtp
Linear
Vgsp < Vtp Vdsp > Vgsp Vtp
Saturated
Vgsp < Vtp Vdsp < Vgsp Vtp
pMOS Operation
Cutoff
Vgsp > Vtp
Linear
Vgsp < Vtp Vdsp > Vgsp Vtp
Saturated
Vgsp < Vtp Vdsp < Vgsp Vtp
VDD
Vtp < 0
Vin
Idsp Idsn
Vout
pMOS Operation
Cutoff
Vgsp > Vtp Vin > VDD + Vtp
Linear
Vgsp < Vtp Vin < VDD + Vtp Vdsp > Vgsp Vtp Vout > Vin - Vtp Vtp < 0
Vin
Saturated
Vgsp < Vtp Vin < VDD + Vtp Vdsp < Vgsp Vtp Vout < Vin - Vtp
VDD
Idsp Idsn
Vout
Y=~ABC
Key Points
There is always a path from VDD or GND to the output. There is no path from the VDD to GND (for our purpose). Thus this gate has a very low power consumption. Fully restored logic (why?)
Exercises
Design an AND OR Inverter gate:
Tristate Inverter
EN 0 0 1 1 Inp 0 1 0 1 Out Z Z 1 0
Tristate Inverter