Documenti di Didattica
Documenti di Professioni
Documenti di Cultura
Diode Operation
Lecture Outline
Have looked at basic diode processing and structures Goal is now to understand and model the behavior of the device under bias
First consider the carrier exchange and interaction between p and n materials in equilibrium, and discuss concept of the depletion region Then examine carrier profiles under forward and reverse bias, and derive a model for the diode current flow in terms of applied potential and physical parameters
Concepts of 1D area and doping profiles from lecture 6 as well as GR and diffusion from lecture 7 are required for current model
David J. Walkey 97.398*, Physical Electronics: Diode Operation (8) Page 2
David J. Walkey
Page 3
David J. Walkey
Page 4
Charge Distributions at t = 0+
Just after connection, the hole and electron distributions are flat in each material (uniform doping) and discontinuous across the metalurgical junction Large concentration gradients exist, so there will be a large component of carrier flux due to diffusion, recall
dc( x ) = D dx
David J. Walkey
Page 5
David J. Walkey
Page 6
Diode Regions
Identify two distinct regions in the pn-junction structure:
The neutral regions are those which are essentially unaffected by the charge redistribution The depletion region is the transition region where charge redistribution has taken place
David J. Walkey
Page 8
Note that electrons injected into p, holes injected into n, hence the term minority carrier injection for forward bias
David J. Walkey
Page 9
David J. Walkey
Page 10
= n po e qVD / kT
David J. Walkey
Page 11
(e
qVD / kT
1)
Jp =
qD p pno Lp
(e
qVD / kT
1)
Total current is sum of individual components, this is the ideal diode equation (for current density) but illustrating the physical components of the saturation term
qDn n po qD p pno qV / kT D e JD = + 1) ( w Lp p
David J. Walkey 97.398*, Physical Electronics: Diode Operation (8) Page 12
David J. Walkey
Page 13
IS
p+n
AD
qDn n po wp
qD p pno Lp
This is only valid for a p+n junction, since it contains the width of the p-type material, wp. For an n+p junction with a thin n+-type region (e.g. an n+p implanted junction)
JS
n+ p
IS
n+ p
AD
qDn n po Ln
qD p pno wn
David J. Walkey
Page 14
David J. Walkey
Page 15
David J. Walkey
Page 16
This gives a saturation current density of (Lp was calculated last lecture)
JS
p+n
qDn n po wp
qD p pno Lp
2 4 34 . 9 21 . 10 12 . 4 2 . 6 10 19 . 10 = 16 + 4 10 2.49 10 3
= 3.27 10 11 A / cm 2
David J. Walkey 97.398*, Physical Electronics: Diode Operation (8) Page 17
Note that electrons injected into n, holes injected into p, hence the term majority carrier injection for forward bias
David J. Walkey
Page 18
ND
e injection h injection np (x) npo depletion region carrier densities: pno pn (x) equilibrium forward bias
ni2 /ND
ni2 /NA
David J. Walkey
Page 19
Note that in reverse bias for VD < -3kT/q the exponential term is negligible compared to 1, and JD -JS
David J. Walkey
Page 20
Lecture Summary
pn junction examined in equilibrium, balance between carrier diffusion and opposing electric field Neutral region basically unaffected by carrier exchange, depletion region approximated as empty of free carriers Injection under bias
Minority injection in forward bias Majority injection in reverse bias
Saturation current density JS derived as basic structure dependent parameter in ideal diode equation Computation of JS may require extraction of doping using uniform approximation
David J. Walkey 97.398*, Physical Electronics: Diode Operation (8) Page 21