Documenti di Didattica
Documenti di Professioni
Documenti di Cultura
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
Vakuum Feeding
Placement
Gravity Feeding
Alignment
number of balls limited tooling expensive, long supply time throughput ca. 4 substrates / h ball diameter : 760 300 m prototyping
unlimited umber of balls standard SMD stencil tooling throughput ca. 20 substrates / h ball diameter : 760 250 m series production
ISIT
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
Wagenbrett WB-300
application of solder spheres 300 m - 760 m wafer 4- 300 mm, PCB qualified for WLP-CSP production at Fraunhofer ISIT 52.000 solder balls per 6-wafer, 500 m Pitch, 300 m throughput: typ. 21 wafer/h Yield: 99,994 %
ISIT
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
Wagenbrett WB-300
ball attach after UBM and grinding ball fixation with stencil printed tacky flux positioned balls are tolerant to wafer handling rework is possible after flux print and ball attach
ISIT
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
Wagenbrett WB-300
Gravity Feeding works with excessive ball numbers multiple balling runs with the same balls is uncritical 3 point adjust is very effective for fast substrate exchange surplus balls run off the stencil by tilting stencil cleaning is usually not required during the processing!
ISIT
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
Wagenbrett WB-300
cameras cross hairs generator (optional) monitor stencil X,Y, adjust machine control
ISIT
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
ISIT
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
substrate preadjust
universal fixation of different substrate diameters up to 300 mm preadjust with 3 points customer specific vacuum plates on request cavity for vacuum tweezer ESD-conform design
ISIT
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
wafer
flux deposit
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
ISIT
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
machine setup
easy machine setup with precision height adjust gauge available as option
ISIT
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
ISIT
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
Yield
99,990 % 99,992 % 99,994 % 99,996 % 99,998 %
3 2 1 0
W1 W2 W3 W4 W5 W6 W7 W8 W9 W10 W11 W12 W13 W14 W15 W16 W17 W18 W19 W20 W21 W22 W23 W24
100 %
Wafer Nummer
ISIT
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
FR4 substrate
silicon die
ISIT
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie
ISIT
Fraunhofer Institut
www.wagenbrett.de
Siliziumtechnologie