MATERIALS ANALYSIS I

EXERCISES

SEM1SCANNINGELECTRONMICROSCOPY

The lecture reviews different SEM techniques of imaging and materials analysis. Examples for the application of these techniques are given with particular emphasis on applications in the area of semiconductordevicetechnology. 1. Introduction. Motivation: surface imaging, scanning beam techniques, SEM in development and fabricationofdevices. 2. Instrumental aspects. Electron sources, lenses, deviation and focusing of electron beams, magnification,spatialresolution,depthoffocus. 3. Electron beamspecimen interaction. Interaction volume, energy distribution of emitted electrons, beamdamage,electricalchargingofspecimens. 4. Imaging modes and types of image contrast. Overview: secondary (SE) and backscatter (BS) electrons, dependence on energy and on atomic number (Z), orientation characteristics, contrast formation,detectionofSEandBSelectrons,detectors.SecondaryelectronandBSimagingmodes: orientationcontrast,materialorZcontrast,potentialcontrast,magneticcontrast.
The focus of the SEM2 groupwillbeondiscussingfurthertechniques,suchaselectronchannelingandEBSDfordetermining crystalorientation distributionof polycrystalline materials,EBICandcathodoluminescence(CL)mode,energydispersiveXray microanalysisofmaterials,andothers.

5. Applications to semiconductor technology: Process control, failure analysis, line width analysis of interconnectsindevices,characterisation.Pleasefindalsoexamplesofapplicationsinwebsources. 6. Summary.
References
1. E.Fuchs,H.Oppolzer,H.Rehme,ParticleBeamMicroanalysisFundamentals,MethodsandApplicationsVCH1990 2. MaterialsScienceandTechnology,Eds.R.W.Cahn,P.Haasen,E.J.KramerVol.2ACharacterizationofMaterialsCh.3 3. L.ReimerScanningElectronMicroscopySpringer1995 4. DebbieJStokes,Environmentalscanningelectronmicroscopyforbiologyandpolymerscience MicroscopyandAnalysis(2012)

Pleasefindalsoexamplesofapplicationsintheinternet.

ma mikrostrukturanalytik

Prof. Dr. Wolfgang Jger

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