WATER CHEMISTRY IN POWER PLANT

BY
P. SRIVASTAVA
SR. MANAGER(CHEM.)
1

November 13, 201

WATER CHEMISTRY IN POWER PLANT

WATER CHEMISTRY IS A VERY IMPORTANT

DISCIPLINE IN POWER SECTOR.
TO ACHIEVE HIGHER OPERATION
EFFICIENCY AND TO REDUCE PLANT
DOWNTIME,
HIGH
WATER
QUALITY
STANDARDS ARE TO BE MAINTAINED
2

November 13, 201

WATER CHEMISTRY IN
POWER PLANT
PRODUCTION OF : --- D.M. WATER FOR BOILER MAKE-UP.
--- FILTER WATER FOR SOFTENING PLANT, D.M.
PLANT, DRINKING WATER AND A.C. COOLING
SYSTEM.
MONITORING OF STEAM/ WATER PARAMETERS

H.P./L.P. DOSING.

TESTING OF COAL.
TESTING OF LUB OIL.

November 13, 201

WATER CHEMISTRY IN
POWER PLANT
CIRCULATING

WATER TREATMENT
POLLUTION MONITORING

STACK MONITORING
AMBIENT AIR
WATER EFFLUENT

EFFLUENT

TREATMENT PLANT
COMMISSIONING ACTIVITES
4

November 13, 201

WATER FLOW DIAGRAM

RAW
WATER

CLARIFLOCC
ULATOR

D.M.
PLANT

U/G STORAGE
TANK

SOFTENING
PLANT
DRINKING
WATER
5

COOLING
WATER

November 13, 201

GRAVITY
FILTER

BOILER
MAKEUP
C.W.
MAKEUP

D.M. PLANT

ACF

WEAK
BASE
ANION

WEAK
ACID
CATION

STRONG
ACID
CATION

STRONG
BASE
ANION

MIXED
BED

November 13, 201

DEGASSER

D.M.
WATER
STORAGE
TANK

D.M. WATER QUALITY

pH
CONDUCTIVITY
TDS
SiO2

November 13, 201

- 7.0 0.2
< 0.2 mho
- NIL
< 20 ppb

WATER STEAM CYCLE

(GAS PROJECT)
L.P. DOSING

D.M. WATER

LP TURBINE

RFT

LP STEAM

CONDENSER

D/A

LP BOILER

LP BFP
H.P. DOSING

HP TURBINE

HP STEAM

HP BOILER

HP BFP
8

November 13, 201

WATER STEAM CYCLE

(THERMAL PROJECT)
HYDRAZINE
DOSING

AMMONIA
DOSING

CEP

D.M. WATER

TURBINE

CST

STEAM

CONDENSER

D/A

BOILER
BFP
T.S.P. DOSING

November 13, 201

WATER/STEAM CHEMISTRY
PARAMETERS MONITORED

10

pH
Silica
Conductivity
After Cation Conductivity
Dissolved Oxygen
Sodium
Copper
Iron
November 13, 201

WATER QUALITY
FEED

11

WATER

ACC
pH
Total Iron+Copper
Silica
Dissolved Oxygen

November 13, 201

<0.2 uS/cm
8.8-9.2
<0.02 ppm
<0.02 ppm
<7 ppb

WATER QUALITY
CONDENSATE

12

WATER

ACC

<0.2 uS/cm

pH

8.8-9.2

Silica

<0.02 ppm

Dissolved Oxygen

<40 ppb

November 13, 201

WATER QUALITY

13

BOILER WATER

Conductivity

<30 uS/cm

pH

9.2-9.6

Silica

<0.300 ppm

Phosphate

2-4 ppm

November 13, 201

WATER QUALITY
STEAM

14

ACC
pH
Total Iron+Copper
Silica
Sodium

November 13, 201

<0.2 uS/cm
8.8-9.2
<0.02 ppm
<0.02 ppm
<10 ppb

DISTRIBUTION RATIO BETWEEN

STEAM & BOILER WATER AT pH 9.5
Drum Pressure

15

Silica in Boiler Water

194 Kg/Cm2
130 ppb
176 Kg/Cm2
220 ppb
159 Kg/Cm2
290 ppb
134 Kg/Cm2
500 ppb
117 Kg/Cm2
1000 ppb
100 Kg/Cm2
2220 ppb
65 Kg/Cm2
4000 ppb
Boiller Drum Pressure is to be maintined as
such,Silica value in Main Steam maintain
bellow November
20 ppb.13, 201

--

PARTITION COEFFICIENT Kp

PARTITION COEFFICIENT AT
DIFFERENT PRESSURES
100

10-1

SiO
2

10-2

10-3

Na
OH

10-4

Na
Cl

10-5

10-6

10-7
226

16

220

200

180

160

140

120

100

PRESSURE ( BAR)

November 13, 201

50

40

30

SOURCES OF IMPURITIES IN STEAM

By

evaporation from the boiler drum

By entrainment of boiler water droplets in
saturated steam.
As impurity present in feed water used in
desuper heater spray.

17

November 13, 201

EFFECTS OF SILICA

Silica

has high partition coefficient, so it has

tendency to deposit from steam onto turbine.

Silica

can deposit on turbine blades specially

on LP turbine, which can lead to significant
loss of output.

18

November 13, 201

H.P. DOSING
COORDINATED PHOSPHATE CONTROL
Na3PO4+H2O
Na2HPO4+H2O

Na2HPO4 + NaOH
NaH2PO4 + NaOH

NaOH + HCl (As Impurity)

19

November 13, 201

NaCl + H2O

L.P.DOSING
AMMONIA & HYDRAZINE HYDRATE DOSING

AMMONIA IS USED TO INCREASE THE

pH OF THE SYSTEM AND HYDRAZINE
IS USED TO REMOVE THE OXYGEN
N2H4 + O2
N2 + H2O
3N2H4
4NH3 + N2
20

November 13, 201

CHEMICAL CONTROL OF GENERATOR

STATOR WATER COOLING CIRCUITS
GENERATOR STATOR COOLANT
--- D.M. WATER
STATOR WATER PARAMETER TO BE MAINTAINED
- pH
6.8 + .2
-K
< 1.0 s/cm
- Copper
< 50 PPb
- D.O.
< 10 PPb in low D.O. regime
2.0 to 5.0 PPM in high D.O. regime
21

November 13, 201

CORROSION OF COPPER

There are two methods where the copper is

best passivated and minimum corrosion is
found.
1. Low dissolved oxygen regime.
2. High dissolved oxygen regime.

22

November 13, 201

LOW D.O. REGIME

- Limits

below 10 PPb

With low D.O. concentration, copper

corrosion is inhibited by a passive film of
Cuprous Oxide(Cu2O).

23

November 13, 201

HIGH D.O. REGIME

- Limits

2 to 5 PPM

With high D.O. concentration, copper

corrosion is inhibited by a passive film of
Cupric Oxide(CuO).

24

November 13, 201

25

November 13, 201