Rev.

BACKGROUND ION LIST

Page 1 OF 4

ESI+ Common Background Ions

m/z 33 42 59 64 65 74 79 83 85 88 101 102 104/106 105 115 120 122 123 130 137 144 145/147 146 149 150 153 157 159 163 167 169 171 179 186 195 214 225 231 236 239/241 242 (2M+H)
+ + +

Ion (M+H) (M+H)

+ + +

Compound methanol acetonitrile acetonitrile acetonitrile methanol dimethyl formamide DMSO

Source of Unknown

(M+NH4) (M+Na) (2M+H) (M+H) (M+H) (M+H)

+ + + + +

(2M+H)
+

Acetonitrile d6-DMSO
+

(M+Formic Acid+H) (M+Na) (M+H)

+ + + +

acetonitrile DMSO triethylamine (TEA) acetonitrile acetonitrile acetonitrile

(M+Cu)

(2M+Na)

(M+dimethyl + formamide+H) (M+Na+CH3CN) (M+H) (M+H) (M+H) (M+H)

+ + + +

DMSO tris, tris(hydroxymethyl)aminomethane dimethylaminopyridine (DMAP) diisopropylethyl amine (DIPEA) DMSO tripropylamine (TPA) acetonitrile acetonitrile phthalic anhydride phenyldiethylamine 1,8-diazabicyclo[5.4.0]undec-7-ene (DBU)

(M+CH3CN+NH4)+
+ + +

(2M+Cu) (3M+Na) (M+H) (M+H) (M+H)

+ +

+ + +

(2M+H)

DMSO sodium trifluoroacetate dimethyl phthalate dioctyl phthalate d6-DMSO phthalic anhydride DMSO tributylamine dimethyl phthalate n-butyl benzenesulfonamide (plastisizer) dicyclohexyl urea (DCU) n-butyl benzenesulfonamide (plastisizer) n-butyl benzenesulfonamide (plastisizer)
+

(M+Na)

(M+Na) (M+H) (M+H) (M+H) (M+H)

+ + + +

(2M+Na)

(M+NH3)+ (M+Na) M
+ +

[(M.HCl)2-Cl]

triethylamine tetrabutylammonium (C4H9)4N

+

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BACKGROUND ION LIST

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ESI+ Common Background Ions

m/z 243 257 267 273 279 279 282 284 288 301 303 317 336 338 355 360 371 388 391 413 425 429 445 449 454 462 503 519 522 531 536 538 550 553 555 569 587 593 609 610 (M+Na) (M+K)
+ + + + +

Ion M
+ +

Compound trityl cation DMSO tributylphosphate monomethoxytrityl cation (MMT) triphenylphosphine oxide dibutylphthalate (plasticiser)

Source of Unknown

(3M+H) M M M
+ + + + + +

(M+H)+

(M+H) (M+H) (M+H)

oleamide stearamide n,n-bis(2-hydroxyethyl) dodecanamide

+ +

slip agent in polyethylene films slip agent in polyethylene films anti-static agent slip agent in polyethylene films

(M+Na) (M+Na) (M+K)

+

dibutylphthalate (plasticiser) oleamide dibutylphthalate (plasticiser) tributyl tin formate erucamide slip agent in polyethylene films siloxane from silica column slip agent in polyethylene films

(M+H)+ (M+H)
+

(M+Na) (M+H) (M+H)

+

erucamide decamethylcyclopentasiloxane decamethylcyclopentasiloxane diisooctyl phthalate (plasticiser)

+ + +

(M+Na) (M+Na) (M+K)

+

diisooctyl phthalate (plasticiser) unidentified contaminant (plasticiser) diisooctyl phthalate (plasticiser) dodecamethylcyclohexasiloxane dicyclohexyl urea (DCU)
+

seen w/ silica capillary NanoSprayer seen w/ silica capillary NanoSprayer also observed w/ high conc. of formic acid seen w/ silica capillary NanoSprayer

(M+H)+ (2M+H)
+

(M+Na+CH3CN)

diisooctyl phthalate (plasticiser) dodecamethylcyclohexasiloxane

(M+H)

tetradecamethylcycloheptasiloxane

seen w/ silica capillary NanoSprayer Derived from rubber tip from disposable syringe plunger

(M+H)

seen w/ Nunc polypropylene tubes seen w/ silica capillary NanoSprayer

(acetate)n+(Fe)n+

observed w/ high conc. of acetic acid Derived from rubber tip from disposable syringe plunger seen w/ Nunc polypropylene tubes observed w/ high conc. of acetic acid seen w/ Nunc polypropylene tubes seen w/ Vanguard polypropylene tubes hexadecamethylcyclooctasiloxane seen w/ Vanguard polypropylene tubes seen w/ silica capillary NanoSprayer

(acetate)n+(Fe)n+ (M+H) (M+H)

(M+Na)

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BACKGROUND ION LIST

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ESI+ Common Background Ions

m/z 625 638 667 675 679 684 696 701 741 786 798 803 (M+NH4) (M+Na) (M+H)
+ + + + +

Ion (M+K)
+

Compound

Source of Unknown seen w/ Vanguard polypropylene tubes seen w/ silica capillary NanoSprayer

(M+H) (M+H)

octadecamethylcyclononasiloxane seen w/ new PEEK tubing from purified water and solvent filters seen w/ silica capillary NanoSprayer from purified water and solvent filters from purified water and solvent filters eicosamethylcyclodecasiloxane titanium adduct diisooctyl phthalate (plasticiser) diisooctyl phthalate (plasticiser)
+

(M+Ti)

(2M+NH4) (2M+Na)

ESI- Common Background Ions

m/z 26 45 59 69 79 80 95 97 97 113 127 227 249 (CF3CO2Na) (CF3CO2Na) (CF3CO2Na)
-

Ion CN
-

Compound acetonitrile formate acetate sodium trifluoracetate, TFA phosphate sulfate

(HCOO)

(CH3CO2) PO3 SO3

-

(CF3CO2Na)

CH3SO3 HSO4
-

methanesulfonate

H2PO4

sodium trifluoracetate, TFA sodium trifluoracetate, TFA sodium trifluoracetate, TFA sodium trifluoracetate, TFA

ESI+ Clusters
m/z 18 32 41 44 50 53 58 58 63 68 water methanol acetonitrile PEG, HO-(CH2CH2On-H)+ perfluoro, CF2 NH4Cl PPG NaCl NH4Cl salts NaFA salts Compound

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BACKGROUND ION LIST

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ESI+ Clusters
m/z 72 74 74 77 78 82 136 162 KCl Si(CH3)2O (from rubber) NH4Ac salts DMSO NaAc NaTFA Polysaccharides Compound Replacement of OH by OSi(CH3)3

ESI+ Common Adducts

m/z (M+1) (M+18) (M+23) (M+39) (M+33) (M+42) (M+64) (M+79) (M+83) Ion (M+H)
+ +

(M+NH4) (M+Na) (M+K)

+ +

(M+CH3OH+H) (M+ACN+H)
+ + +

(M+ACN+Na) (M+2ACN+H)

(M+DMSO+H)

ESI+ Common Ion Series

m/z 79, 157, 235 101, 179, 257 231, 522, 550 267, 289, 330 371, 388, 445, 462 355, 429, 503, 593, 667, 741, 815 Compound (nDMSO+H)+ (nDMSO+Na)+ plastisizer tributylphosphate cyclosiloxane plastisizer